Abstract: A composite fabric is provided. The composite fabric includes a fabric substrate and a material layer. The material layer, which includes a mixture, is on the fabric substrate. The mixture includes an amine-containing polymer and a powder. The powder is in the amine-containing polymer. The amine-containing polymer includes polyethylenimine, derivatives of polyethylenimine, or a combination thereof. The powder includes doped zinc oxide, indium tin oxide, doped indium tin oxide, or a combination thereof. The amine-containing polymer has an amount of 0.1 to 40 parts by weight base on 100 parts by weight of the powder.

Abstract: An improved method for preparing multiple-exposure photomasks having at least three levels of transmissivity is disclosed. A conventional bi-exposure photomask is first formed which contains a macroscopically exposed area, a microscopically exposed area, and a masked area on a transparent substrate. Then a diffractive-refractive light-scattering optical element is formed above the microscopically exposed area so as to provide an exposure area with an intermediate light transmissivity. In a preferred embodiment, the diffractive-refractive light-scattering optical element above the microscopically exposed area is formed by first forming a transparent positive photoresist above the bi-exposure photomask. The transparent positive photoresist is exposed to an irradiation from the bottom of the transparent substrate, and is developed. Finally, the transparent positive photoresist is heated to cause a melt-flow thereof which forms a concave optical element above the microscopically exposed area.

Abstract: A wet etching process for forming vias or pre-designed patterns in organic polymeric layers such as fully or substantially fully cured polyimide layers which are used as circuit carriers in laminated integrated circuits by placing said organic polymeric layer in an etching bath containing two electrodes immersed in an etching solution and applying an alternating current having a voltage of about 0.3 to 1.0 volt and a frequency of about 60 Hz, or a direct current of about 0.8 to 20 volt to the electrodes. The etching solution contains acid or metallic hydroxide and, optionally, 3-15 wt % N-methyl-2-pyrrolidone. The present invention provides a fast and safe etching technique without the need to use the toxic and explosive etching chemicals such as hydrazine hydrate or ethylene diamine.

Abstract: Disclosed herein are a high-refractive plastic lens resin consisting of a polymeric reaction product obtained by an addition reaction under heat of at least one polyisocyanate represented by the following general formula (I): ##STR1## wherein X is a hydrogen, chlorine or bromine atom or a methyl or ethyl group, Z is a hydrogen atom or a methyl group, 1.ltoreq.a.ltoreq.4, 2.ltoreq.b.ltoreq.4, and a+b.ltoreq.6, with at least one allyl group compound represented by the following general formula (II): ##STR2## wherein R.sub.1 is a phenol, hydroxyl, or amine group, in such amounts that the --NCO/--OH+--NH.sub.2 molar ratio fall within the range from 0.45 to 0.50.

Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.

Abstract: A photosensitive composition which is suitable for free radical polymerization systems initiated by ultraviolet light, particularly useful in UV-curing coating and image transfer systems such as printing plates and photoresists. Among the above mentioned applications, systems in which the photosensitive layer has no protective film to insulate it from the air shows the greatest improvement in photosensitivity.