Patents by Inventor Rong Pan
Rong Pan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7817556Abstract: Various improvements are provided for prior art policing methods, including token bucket methods and virtual time policing methods. Some preferred methods of the invention involve assigning a non-zero drop probability even when the packet would otherwise have been transmitted according to a prior art policing method. For example, a non-zero drop probability may be assigned even when there are sufficient tokens in a token bucket to allow transmission of the packet. A non-zero drop probability may be assigned, for example, when a token bucket level is at or below a predetermined threshold or according to a rate at which a token bucket is being emptied. Some implementations involve treating a token bucket as a virtual queue wherein the number of free elements in the virtual queue is proportional to the number of remaining tokens in the token bucket.Type: GrantFiled: April 20, 2006Date of Patent: October 19, 2010Assignee: Cisco Technology, Inc.Inventors: Rong Pan, Flavio Bonomi, George Varghese
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Publication number: 20100220592Abstract: Embodiments are described herein such as a method for providing media-aware congestion control for the transmission of video streams, the method comprising: estimating congestion price information for one or more network nodes; responding to the congestion price information by calculating optimal rates for one or more end hosts; adapting the sending rates of the one or more end hosts according to the calculated optimal rates; and determining an amount of FEC to be inserted into the video streams based on the congestion price information.Type: ApplicationFiled: February 24, 2010Publication date: September 2, 2010Applicant: Cisco Technology, Inc.Inventors: Rong Pan, Xiaoqing Zhu, Nandita Dukkipati, Vijaynarayanan Subramanian
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Publication number: 20100205146Abstract: A method for utilizing the resources of a digital display device (“DDD”) for use by a computer comprises the steps of: connecting the DDD to the computer; displaying one or more images on the DDD, wherein the images are transmitted from the computer to the DDD; updating and storing PIM information on the DDD, wherein the PIM information is retrieved from the computer; and generating by the DDD one or more alerts based on the updated PIM information to be displayed on the DDD.Type: ApplicationFiled: January 7, 2010Publication date: August 12, 2010Applicant: AMLOGIC CO., LTD.Inventors: Yong Wan, Jinsong Han, Qiang Wang, Zhao Rong Pan, Michael Yip
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Publication number: 20100191694Abstract: A collaborative filtering method for evaluating a group of items to aid in predicting utility of items for a particular user comprises assigning an item value of either known or missing to each item of the group of items, and applying a modification scheme to the item values of the missing items to assign a confidence value to each of the item values of the missing items to thereby generate a group of modified item values. The group of items having modified item values and the group known items are evaluated to generate a prediction of utility of items for a particular user.Type: ApplicationFiled: January 23, 2009Publication date: July 29, 2010Inventors: Rong Pan, Rajan Lukose, Martin B. Scholz
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Patent number: 7754282Abstract: A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations.Type: GrantFiled: July 30, 2008Date of Patent: July 13, 2010Assignee: Applied Materials, Inc.Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kun Victor Wang
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Patent number: 7642171Abstract: A method of annealing a substrate comprising a trench containing a dielectric material, the method including annealing the substrate at a first temperature of about 200° C. to about 800° C. in a first atmosphere comprising an oxygen containing gas, and annealing the substrate at a second temperature of about 800° C. to about 1400° C. in a second atmosphere lacking oxygen. In addition, a method of annealing a substrate comprising a trench containing a dielectric material, the method including annealing the substrate at a first temperature of about 400° C. to about 800° C. in the presence of an oxygen containing gas, purging the oxygen containing gas away from the substrate, and raising the substrate to a second temperature from about 900° C. to about 1100° C. to further anneal the substrate in an atmosphere that lacks oxygen.Type: GrantFiled: November 16, 2004Date of Patent: January 5, 2010Assignee: Applied Materials, Inc.Inventors: Nitin K. Ingle, Zheng Yuan, Vikash Banthia, Xinyun Xia, Hali J. L. Forstner, Rong Pan
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Publication number: 20090113069Abstract: Example embodiments of a system and method for providing a congestion measurement in a network are disclosed. In an example embodiment information is received at an information transfer rate, from a source network device. A sample of the information may be taken before the information is transmitted to a destination network device. In an example embodiment, a congestion measurement value is computed that corresponds to the sample and represented with at least two bits. A multi-bit indicator of the congestion measurement value is then transmitted to control the information transfer rate of information arriving in the future.Type: ApplicationFiled: October 25, 2007Publication date: April 30, 2009Inventors: Balaji Prabhakar, Rong Pan
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Patent number: 7484542Abstract: A tire tread has at least three rows of tread elements, each tread element in the at rows has at least one sipe and at least one sipe in each tread element row has a tie bar therein. Each tie bar in the sipes has a volume, and the volume of the sipe tie bar in each tread element in each row is not more than 10% different than the volume of the sipe tie bar in each tread element in any other tread row. Several of the tread rows have transverse grooves having groove tie bars therein.Type: GrantFiled: September 30, 2005Date of Patent: February 3, 2009Assignee: The Goodyear Tire & Rubber CompanyInventors: Karl Eric Sundkvist, Eddy Dong-Rong Pan, Tooney Raymond Jones, David Allen Griffin, John Russell Shaffer, Charles Kenneth Schmalix, Keith Eric Grabo
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Publication number: 20080311754Abstract: A method of improving pattern loading in a deposition of a silicon oxide film is described. The method may include providing a deposition substrate to a deposition chamber, and adjusting a temperature of the deposition substrate to about 250° C. to about 325° C. An ozone containing gas may be introduced to the deposition chamber at a first flow rate of about 1.5 slm to about 3 slm, where the ozone concentration in the gas is about 6% to about 12%, by wt. TEOS may also be introduced to the deposition chamber at a second flow rate of about 2500 mgm to about 4500 mgm. The deposition rate of the silicon oxide film is controlled by a reaction rate of a reaction of the ozone and TEOS at a deposition surface of the substrate.Type: ApplicationFiled: June 11, 2008Publication date: December 18, 2008Applicant: Applied Materials, Inc.Inventors: BALAJI CHANDRASEKARAN, Douglas E. Manning, Nitin K. Ingle, Rong Pan, Zheng Yuan, Sidharth Bhatia
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Publication number: 20080286444Abstract: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate.Type: ApplicationFiled: July 30, 2008Publication date: November 20, 2008Applicant: Applied Materials, Inc.Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kung Victor Wang
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Patent number: 7413612Abstract: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate.Type: GrantFiled: July 10, 2003Date of Patent: August 19, 2008Assignee: Applied Materials, Inc.Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kung Victor Wang
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Patent number: 7324442Abstract: In a packet-queue management system, a bandwidth allocation approach fairly addresses each of n flows that share the outgoing link of an otherwise congested router. According to an example embodiment of the invention, a buffer at the outgoing link is a simple FIFO, shared by packets belonging to the n flows. A packet priority-reduction (e.g., packet dropping) process is used to discriminate against the flows that submit more packets/sec than is allowed by their fair share. This packet management process therefore attempts to approximate a fair queuing policy. The embodiment is advantageously easy to implement and can control unresponsive or misbehaving flows with a minimum overhead.Type: GrantFiled: February 14, 2001Date of Patent: January 29, 2008Assignee: The Board of Trustees of the Leland Stanford Junior UniversityInventors: Rong Pan, Balaji Prabhakar, Konstantinos Psounis
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Publication number: 20070248005Abstract: Various improvements are provided for prior art policing methods, including token bucket methods and virtual time policing methods. Some preferred methods of the invention involve assigning a non-zero drop probability even when the packet would otherwise have been transmitted according to a prior art policing method. For example, a non-zero drop probability may be assigned even when there are sufficient tokens in a token bucket to allow transmission of the packet. A non-zero drop probability may be assigned, for example, when a token bucket level is at or below a predetermined threshold or according to a rate at which a token bucket is being emptied. Some implementations involve treating a token bucket as a virtual queue wherein the number of free elements in the virtual queue is proportional to the number of remaining tokens in the token bucket.Type: ApplicationFiled: April 20, 2006Publication date: October 25, 2007Applicant: Cisco Technology, Inc., A corporation of CaliforniaInventors: Rong Pan, Flavio Bonomi, George Varghese
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Publication number: 20070212847Abstract: A method of annealing a substrate that has a trench containing a dielectric material formed on a silicon nitride layer between the dielectric material and the substrate, where the method includes annealing the substrate at a first temperature of about 800° C. or more in a first atmosphere comprising an oxygen containing gas, and annealing the substrate at a second temperature of about 800° C. to about 1400° C. in a second atmosphere lacking oxygen.Type: ApplicationFiled: April 5, 2007Publication date: September 13, 2007Applicant: Applied Materials, Inc.Inventors: Nitin Ingle, Zheng Yuan, Vikash Banthia, Xinyun Xia, Hali Forstner, Rong Pan
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Publication number: 20070169694Abstract: A method of film deposition in a sub-atmospheric chemical vapor deposition (CVD) process includes (a) providing a model for sub-atmospheric CVD deposition of a film that identifies one or more film properties of the film and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of said one or more film properties for the deposited film of step (b); (d) calculating an updated deposition model based upon the measured film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control a film property other than film thickness.Type: ApplicationFiled: February 2, 2007Publication date: July 26, 2007Applicant: Applied Materials, Inc.Inventors: Alexander Schwarm, Arulkumar Shanmugasundram, Rong Pan, Manuel Hernzndez, Amna Mohammed
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Publication number: 20070091802Abstract: Class-based bandwidth partitioning of a sequence of packets of varying packet classes is performed, such as, but not limited to determining whether or not to admit a packet to a queue based on a probability corresponding to a class of packets associated with the packet, with this probability being based on measured arrival traffic and a fair share based on the length of the queue. Data path processing is performed on each packet to determine whether to admit or drop the packet, and to record the measured received traffic. Control path processing is periodically performed to update these probabilities based on determined arrival rates and fair shares for each class of packets. In this manner, a relatively small amount of processing and resources are required to partition bandwidth for a scalable number of classes of packets.Type: ApplicationFiled: October 24, 2005Publication date: April 26, 2007Applicant: CISCO TECHNOLOGY, INC., A CALIFORNIA CORPORATIONInventors: Rong Pan, Stanley Trimble, Flavio Bonomi
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Publication number: 20070081454Abstract: The present invention provides improved methods and devices for managing network congestion. Preferred implementations of the invention allow congestion to be pushed from congestion points in the core of a network to reaction points, which may be edge devices, host devices or components thereof. Preferably, rate limiters shape individual flows of the reaction points that are causing congestion. Parameters of these rate limiters are preferably tuned based on feedback from congestion points, e.g., in the form of backward congestion notification (“BCN”) messages. In some implementations, such BCN messages include congestion change information and at least one instantaneous measure of congestion. The instantaneous measure(s) of congestion may be relative to a threshold of a particular queue and/or relative to a threshold of a buffer that includes a plurality of queues.Type: ApplicationFiled: October 11, 2005Publication date: April 12, 2007Applicant: Cisco Technology, Inc. A corporation of CaliforniaInventors: Davide Bergamasco, Andrea Baldini, Valentina Alaria, Flavio Bonomi, Rong Pan
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Patent number: 7201936Abstract: A method of film deposition in a sub-atmospheric chemical vapor deposition (CVD) process includes (a) providing a model for sub-atmospheric CVD deposition of a film that identifies one or more film properties of the film and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of said one or more film properties for the deposited film of step (b); (d) calculating an updated deposition model based upon the measured film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control a film property other than film thickness.Type: GrantFiled: June 18, 2002Date of Patent: April 10, 2007Assignee: Applied Materials, Inc.Inventors: Alexander T. Schwarm, Arulkumar P. Shanmugasundram, Rong Pan, Manuel Hernandez, Amna Mohammad
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Publication number: 20070000897Abstract: A method of annealing a substrate comprising a trench containing a dielectric material, the method including annealing the substrate at a first temperature of about 200° C. to about 800° C. in a first atmosphere comprising an oxygen containing gas, and annealing the substrate at a second temperature of about 800° C. to about 1400° C. in a second atmosphere lacking oxygen. In addition, a method of annealing a substrate comprising a trench containing a dielectric material, the method including annealing the substrate at a first temperature of about 400° C. to about 800° C. in the presence of an oxygen containing gas, purging the oxygen containing gas away from the substrate, and raising the substrate to a second temperature from about 900° C. to about 1100° C. to further anneal the substrate in an atmosphere that lacks oxygen.Type: ApplicationFiled: June 12, 2006Publication date: January 4, 2007Applicant: Applied Materials, Inc.Inventors: Nitin Ingle, Zheng Yuan, Vikash Banthia, Xinyun Xia, Hali Forstner, Rong Pan
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Patent number: D535611Type: GrantFiled: November 28, 2005Date of Patent: January 23, 2007Assignee: The Goodyear Tire & Rubber CompanyInventors: Karl Eric Sundkvist, Michael Joseph Weber, Eddy Dong-Rong Pan, Kevin Lee Burnworth, Robert Allen Losey