Patents by Inventor Ronnie Florentius Van T Westeinde

Ronnie Florentius Van T Westeinde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optimal rasterization for maskless lithography
    Patent number: 8009269
    Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: August 30, 2011
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T Westeinde
  • Optimal Rasterization for Maskless Lithography
    Publication number: 20080224251
    Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 18, 2008
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T. Westeinde