Abstract: A surrogate addition device is described that adds a surrogate compound at a uniform transport rate to a flowing sample stream. The surrogate addition device includes a surrogate reservoir, a flow chamber, and a diffusion barrier. The surrogate reservoir can be configured to contain a surrogate solution where the surrogate solution includes a surrogate compound. The flow chamber includes an inlet port and an outlet port. At least a portion of the diffusion barrier is disposed in between the surrogate reservoir and the flow chamber. The diffusion barrier may include an inner surface that forms a wall of the surrogate reservoir, and an outer surface that forms a wall of the flow chamber. The flow chamber can be configured to receive a flowing sample solution across the outer surface of the diffusion barrier and also to diffuse the surrogate compound from the surrogate reservoir to the flow chamber.

Abstract: A surrogate addition device is described that adds a surrogate compound at a uniform transport rate to a flowing sample stream. The surrogate addition device includes a surrogate reservoir, a flow chamber, and a diffusion barrier. The surrogate reservoir can be configured to contain a surrogate solution where the surrogate solution includes a surrogate compound. The flow chamber includes an inlet port and an outlet port. At least a portion of the diffusion barrier is disposed in between the surrogate reservoir and the flow chamber. The diffusion barrier may include an inner surface that forms a wall of the surrogate reservoir, and an outer surface that forms a wall of the flow chamber. The flow chamber can be configured to receive a flowing sample solution across the outer surface of the diffusion barrier and also to diffuse the surrogate compound from the surrogate reservoir to the flow chamber.