Patents by Inventor Rudolf D. Steinmetz

Rudolf D. Steinmetz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photographic elements containing matte particles of bimodal size distribution
    Patent number: 5595862
    Abstract: In accordance with the present invention, a photographic element comprises a support, at least one light-sensitive layer, and a protective overcoat comprising a hydrophilic binder and permanent matte particles, the permanent matte particles comprising a polymer of methyl methacrylate and having a size distribution of a first and a second mode, with the first mode being composed of particles having a mean particle size of from 0.2 to 1.2 micrometers in a coating weight of from 10 to 200 mg/m.sup.2 and the second mode having a mean particle size of from 1.5 to 10 micrometers in a coating weight of from 5 to 150 mg/m.sup.2, the total coating weight of the particle of the first and the second modes being greater than 100 mg/m.sup.2.
    Type: Grant
    Filed: September 25, 1995
    Date of Patent: January 21, 1997
    Assignee: Eastman Kodak Company
    Inventors: Alfred B. Fant, Yongcai Wang, Dennis E. Smith, Melvin M. Kestner, Rudolf D. Steinmetz