Patents by Inventor Rudolf Geurink
Rudolf Geurink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240161999Abstract: The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.Type: ApplicationFiled: November 11, 2022Publication date: May 16, 2024Inventors: Rudolf Geurink, Hugo Cornelis Van Leeuwen, Gerard Nicolass Anne Van Veen, Pleun Dona, Stephan Kujawa, Maarten Bischoff
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Patent number: 11810751Abstract: The disclosure relates to a method of imaging a specimen using a transmission charged particle microscope, said method comprising providing a specimen, and providing a charged particle beam and directing said charged particle beam onto said specimen for generating a flux of charged particles transmitted through the specimen. The method comprises the step of generating and recording a first energy filtered flux of charged particles transmitted through the specimen, wherein said first energy filtered flux of charged particles substantially consists of non-scattered and elastically scattered charged particles. The method as disclosed herein comprises the further step of generating and recording a second energy filtered flux of charged particles transmitted through the specimen, wherein said second energy filtered flux of charged particles substantially consists of inelastically scattered charged particles.Type: GrantFiled: June 22, 2021Date of Patent: November 7, 2023Assignee: FEI CompanyInventors: Peter Tiemeijer, Evgeniia Pechnikova, Rudolf Geurink, Abhay Kotecha, Jamie McCormack
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Publication number: 20230101644Abstract: A modular ultra-high vacuum (UHV) electron microscope for investigating a sample, according to the present disclosure includes a UHV chamber configured to reach and maintain an ultra-high vacuum within the UHV chamber, a UHV stage to hold the sample being investigated, a charged particle source configured to emit an electron beam toward the sample, and an optical column configured to direct the plurality of electrons to be incident on the sample. The modular UHV electron microscopes further include a carousel vacuum bay configured to reach and maintain an UHV independently of the UHV chamber, and which is connected to the UHV chamber via a port and contains at least one device manipulator. Each of the device manipulators comprise an attachment site for a microscope device, and are configured to, selectively translate attached microscope devices between the carousel vacuum bay and the UHV chamber via the valve.Type: ApplicationFiled: September 30, 2022Publication date: March 30, 2023Applicant: FEI CompanyInventors: Rudolf GEURINK, Hugo Cornelis VAN LEEUWEN
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Publication number: 20210407762Abstract: The disclosure relates to a method of imaging a specimen using a transmission charged particle microscope, said method comprising providing a specimen, and providing a charged particle beam and directing said charged particle beam onto said specimen for generating a flux of charged particles transmitted through the specimen. The method comprises the step of generating and recording a first energy filtered flux of charged particles transmitted through the specimen, wherein said first energy filtered flux of charged particles substantially consists of non-scattered and elastically scattered charged particles. The method as disclosed herein comprises the further step of generating and recording a second energy filtered flux of charged particles transmitted through the specimen, wherein said second energy filtered flux of charged particles substantially consists of inelastically scattered charged particles.Type: ApplicationFiled: June 22, 2021Publication date: December 30, 2021Applicant: FEI CompanyInventors: Peter TIEMEIJER, Evgeniia PECHNIKOVA, Rudolf GEURINK, Abhay KOTECHA, Jamie MCCORMACK
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Patent number: 9991087Abstract: An imaging system for directing a flux of charged particles transmitted through a specimen onto a spectroscopic apparatus, wherein the flux is dispersed by a dispersing device into an energy-resolved array of spectral sub-beams propagating substantially parallel to a propagation axis. An adjustable aperture device defines an aperture in a path of the array so as to select a subset of the array to be admitted to a detector, which aperture is delimited in a dispersion direction perpendicular to the propagation axis to allow independent adjustment of both of: a width of the aperture parallel to the dispersion direction; and a position of a center of the aperture relative to the propagation axis.Type: GrantFiled: September 21, 2015Date of Patent: June 5, 2018Assignee: FEI CompanyInventors: Erwin Fernand de Jong, Sorin Lazar, Peter Christiaan Tiemeijer, Rudolf Geurink
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Patent number: 9524851Abstract: A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising: a specimen holder; a source, for producing a beam of charged particles; an illuminator, for directing said beam so as to irradiate the specimen; an imaging system, for directing a flux of charged particles transmitted through the specimen onto a spectroscopic apparatus comprising a dispersing device for dispersing said flux into an energy-resolved array of spectral sub-beams, the method comprising: using an adjustable aperture device to admit a first portion of said array to a detector, while blocking a second portion of said array; providing; using a radiation sensor in said flux upstream of said aperture device to perform localized radiation sensing in a selected region of said second portion of the array, simultaneous with detection of said first portion by said detector; using a sensing result from said sensor to adjust a detection result from said detector.Type: GrantFiled: September 3, 2015Date of Patent: December 20, 2016Assignee: FEI COMPANYInventors: Erwin Fernand de Jong, Sorin Lazar, Peter Christiaan Tiemeijer, Rudolf Geurink
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Publication number: 20160086762Abstract: A Transmission Charged-Particle Microscope includes an imaging system, for directing a flux of charged particles transmitted through the specimen onto a spectroscopic apparatus including: a dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams propagating substantially parallel to a propagation axis; a detector; an adjustable aperture device for defining an aperture in a path of said array, so as to select a subset of said array to be admitted to the detector, which aperture is delimited in a dispersion direction perpendicular to said propagation axis by first and second opposed edges, each of which edges is independently positionable relative to said propagation axis, thereby allowing independent adjustment of both of: a width of said aperture parallel to said dispersion direction; and a position of a center of said aperture relative to said propagation axis.Type: ApplicationFiled: September 21, 2015Publication date: March 24, 2016Applicant: FEI CompanyInventors: Erwin Fernand de Jong, Sorin Lazar, Peter Christiaan Tiemeijer, Rudolf Geurink
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Publication number: 20160071689Abstract: A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising: a specimen holder; a source, for producing a beam of charged particles; an illuminator, for directing said beam so as to irradiate the specimen; an imaging system, for directing a flux of charged particles transmitted through the specimen onto a spectroscopic apparatus comprising a dispersing device for dispersing said flux into an energy-resolved array of spectral sub-beams, the method comprising: using an adjustable aperture device to admit a first portion of said array to a detector, while blocking a second portion of said array; providing; using a radiation sensor in said flux upstream of said aperture device to perform localized radiation sensing in a selected region of said second portion of the array, simultaneous with detection of said first portion by said detector; using a sensing result from said sensor to adjust a detection result from said detector.Type: ApplicationFiled: September 3, 2015Publication date: March 10, 2016Applicant: FEI CompanyInventors: Erwin Fernand de Jong, Sorin Lazar, Peter Christiaan Tiemeijer, Rudolf Geurink