Abstract: The invention is directed to a construction material and to the use of modified layered inorganic material. The construction material of the invention comprises a layered inorganic material, which layered inorganic material comprises an ionic organic modifier compound and a biocide. The construction material of the invention has increased resistance against microbial fouling.

Abstract: The invention is directed to a method for recycling an organic-matrix composite material. The organic-matrix composite material comprises a first component comprising at least one organic matrix polymer and at least one solid second component being compatible with said first component and being structurally different from said first component, wherein said at least one organic polymer has thermosetting properties at room temperature and wherein said polymer comprises thermally reversible cross-links The method of the invention comprises —heating the organic-matrix composite material to a temperature at which at least part of the thermally reversible cross-links cleave and at which temperature the first component as a viscosity of at most 500 Pa·s, as measured by oscillatory measurements on an Anton Paar MCR 301 rheometer using parallel plate geometry; and —separating the at least part of said first component from said second component.

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

Abstract: The invention is directed to a method for recycling an organic-matrix composite material. The organic-matrix composite material comprises a first component comprising at least one organic matrix polymer and at least one solid second component being compatible with said first component and being structurally different from said first component, wherein said at least one organic polymer has thermosetting properties at room temperature and wherein said polymer comprises thermally reversible cross-links The method of the invention comprises -heating the organic-matrix composite material to a temperature at which at least part of the thermally reversible cross-links cleave and at which temperature the first component as a viscosity of at most 500 Pa·s, as measured by oscillatory measurements on an Anton Paar MCR 301 rheometer using parallel plate geometry; and -separating the at least part of said first component from said second component.

Abstract: The invention is directed to a construction material and to the use of modified layered inorganic material. The construction material of the invention comprises a layered inorganic material, which layered inorganic material comprises an ionic organic modifier compound and a biocide. The construction material of the invention has increased resistance against microbial fouling.

Abstract: The present invention provides a method for preparing an inorganic crystalline ceramic material having an organized structure, comprising the steps of: (a) providing nanoparticles of one or more inorganic crystalline ceramic materials; (b) reacting metal hydroxide groups that are present on the nanoparticles with molecules of a chemical compound which molecules each comprisea first and a second reactive moiety, whereby a covalent bond is formed between the first reactive moieties of the molecules and the respective metal hydroxide groups; and (c) subjecting the nanoparticles obtained in step (b) to a treatment which enables the formation of a bond between at least two nanoparticles, whereby the bond is formed directly or indirectly between the second reactive moieties of the covalenty bonded molecules of the chemical compound as obtained in step (b), thereby forming an organized structure.

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

Abstract: The invention relates to a polymeric material having an anisotropic shape and comprising multiple cavities, wherein said cavities comprise a functional liquid. The invention also relates to a process of making the polymeric material from an emulsion of a functional liquid with a polymer in solution, in the melt or a polymer precursor which reacts to obtain the polymeric material having cavities filled with functional liquid.

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.