Patents by Inventor Rudolf Von Buenau
Rudolf Von Buenau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090190208Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: March 23, 2009Publication date: July 30, 2009Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20080310014Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: August 22, 2008Publication date: December 18, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Patent number: 7463422Abstract: A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.Type: GrantFiled: January 25, 2007Date of Patent: December 9, 2008Assignee: Carl Zeiss SMT AGInventors: Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Toralf Gruner, Aurelian Dodoc, David Shafer, Wilhelm Ulrich, Rudolf von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080297889Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: August 1, 2008Publication date: December 4, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080285121Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: April 9, 2008Publication date: November 20, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080212170Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: April 9, 2008Publication date: September 4, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080195086Abstract: A method and device for modifying optical system properties by means of a continuously multifocal profile, wherein said profile comprises a component for increasing the optical system focal depth and is calculated according to a fourth-order Zernike polynom. The aim of said invention is to avoid the eye base refraction and, for this purpose, said focal depth increasing component is also calculated according to the second-order Zernike polynom.Type: ApplicationFiled: March 23, 2006Publication date: August 14, 2008Applicant: CARL ZEISS MEDITEC AGInventors: Eckhard Schroeder, Matthias Wottke, Rudolf Von Buenau
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Publication number: 20080186567Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: April 9, 2008Publication date: August 7, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080151364Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: March 11, 2008Publication date: June 26, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080151365Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: March 11, 2008Publication date: June 26, 2008Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20080143984Abstract: A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mirror segments, which can be displaced independently in relation to one another with the aid of piezoelectric drive elements. The mirror can be used as a phase-shifting pupillar filter, whereby the filtration function can be adjusted by the relative displacement of the mirror elements in relation to one another.Type: ApplicationFiled: February 25, 2008Publication date: June 19, 2008Applicant: Carl Zeiss SMT AGInventors: Hubert HOLDERER, Christian Hembd-Soellner, Rudolf Von Buenau, Ulrich Haag
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Patent number: 7385756Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: GrantFiled: January 14, 2005Date of Patent: June 10, 2008Assignee: Carl Zeiss SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Patent number: 7336342Abstract: A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mirror segments, which can be displaced independently in relation to one another with the aid of piezoelectric drive elements. The mirror can be used as a phase-shifting pupillar filter, whereby the filtration function can be adjusted by the relative displacement of the mirror elements in relation to one another.Type: GrantFiled: October 29, 2004Date of Patent: February 26, 2008Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Christian Hembd-Soellner, Rudolf Von Buenau, Ulrich Haag
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Patent number: 7277157Abstract: A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mirror segments, which can be displaced independently in relation to one another with the aid of piezoelectric drive elements. The mirror can be used as a phase-shifting pupillar filter, whereby the filtration function can be adjusted by the relative displacement of the mirror elements in relation to one another.Type: GrantFiled: October 29, 2004Date of Patent: October 2, 2007Assignee: Carl Zeis SMT AGInventors: Hubert Holderer, Christian Hembd-Soellner, Rudolf Von Buenau, Ulrich Haag
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Patent number: 7031069Abstract: A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.Type: GrantFiled: April 26, 2004Date of Patent: April 18, 2006Assignee: Carl Zeiss Smt AGInventors: Toralf Gruner, Manfred Maul, Rudolf Von Buenau
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Publication number: 20050190435Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: ApplicationFiled: January 14, 2005Publication date: September 1, 2005Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20050002111Abstract: A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.Type: ApplicationFiled: April 26, 2004Publication date: January 6, 2005Inventors: Toralf Gruner, Manfred Maul, Rudolf Von Buenau
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Patent number: 6784977Abstract: A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle.Type: GrantFiled: April 25, 2002Date of Patent: August 31, 2004Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AGInventors: Rudolf von Bünau, Christian Hembd-Söllner, Hubert Holderer
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Patent number: 6781668Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter having at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.Type: GrantFiled: December 29, 2000Date of Patent: August 24, 2004Assignee: Carl-Zeiss-StiftungInventors: Karl-Heinz Schuster, Hubert Holderer, Rudolf Von Bünau, Christian Wagner, Jochen Becker, Stefan Xalter, Wolfgang Hummel
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Patent number: 6728043Abstract: A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.Type: GrantFiled: May 17, 2002Date of Patent: April 27, 2004Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AGInventors: Toralf Gruner, Manfred Maul, Rudolf Von Buenau