Abstract: A source for feeding one or more gaseous precursors onto a surface of a substrate and an arrangement for processing the substrate by way of subjecting the surface of the substrate to alternately repetitive surface reactions of the precursors, the source including a gas feed member for feeding at least one or more precursors onto the surface of the substrate. The gas feed member is adapted rotatable about a rotation axis, the rotation axis being arranged to extend substantially parallel to the surface of the substrate.

Abstract: A source for feeding one or more gaseous precursors onto a surface of a substrate and an arrangement for processing the substrate by way of subjecting the surface of the substrate to alternately repetitive surface reactions of the precursors, the source including a gas feed member for feeding at least one or more precursors onto the surface of the substrate. The gas feed member is adapted rotatable about a rotation axis, the rotation axis being arranged to extend substantially parallel to the surface of the substrate.

Abstract: A multilayer coating and a method for fabricating a multilayer coating on a substrate (3). The coating is arranged to minimize diffusion of atoms through the coating, the method comprising the steps of introducing a substrate (3) to a reaction space, depositing a layer of first material (1) on the substrate (3), and depositing a layer of second material (2) on the layer of first material (1). Depositing the layer of first material (1) and the layer of second material (2) comprises alternately introducing precursors into the reaction space and subsequently purging the reaction space after each introduction of a precursor. The first material being selected from the group of titanium oxide and aluminum oxide, the second material being the other from the group of titanium oxide and aluminum oxide. An interfacial region is formed in between titanium oxide and aluminum oxide.a.

Abstract: A micro-optical element is produced through vapor deposition techniques, such as atomic layer deposition. An optical structure having a surface with uneven structures is exposed to one or more precursor vapors to create a self-limiting film growth on the surface of the optical structure. The film thickness may be increased and controlled by subsequent exposures. The resulting film conforms to surface structures having varying complex dimensions.

Abstract: The present invention concerns an insulating film of a thin film structure deposited on an essentially alkali metal-free glass substrate, comprising alternating layers of aluminium oxide and titanium oxide and thin film electriluminescent device wherein said insulating film is incorporated as an insulating layer between the phosphor layer and the electrode layers. In the insulating film, the ratio between the cumulative thicknesses of said titanium oxide and said aluminium oxide is less than 0.75, and due to the ratio lower than that of prior art, good resistance against cracking of the film is obtained.

Abstract: The present invention concerns a method of growing a cerium-doped SrS phosphor layer by the Atomic Layer Epitaxy-method. According to the invention an organometallic cerium compound containing at least one cyclopentadienyl type ligand is used as a precursor for the dopant cerium. The cyclopentadienyl type cerium compounds can be used as ALE precursors at about 400° C. substrate temperatures without any observable thermal decomposition during processing.

Abstract: The invention relates to a method of growing a ZnS:Mn phosphor layer suitable for use in thin-film electroluminescent components. According to the method, the ZnS:Mn phosphor layer is grown on a substrate by means of the ALE method using volatile zinc, sulfur and manganese compounds as the precursors. According to the invention, an organozinc compound such as diethylzinc or dimethylzinc is used as precursor for zinc, hydrogen sulfide or an organosulfur compound is used as precursor for sulfur, and an organomanganese compound or organic manganese complex compound is used as precursor for manganese. The invention provides a display component with drive-voltage-symmetrical light emission and stable characteristics of luminance level and turn-on voltage.

Abstract: The present invention relates to a thin-film matrix structure particularly suitable for electroluminescent displays, said structure comprising a substrate (7) capable of supporting the thin-film structure to be fabricated, a first electrode structure (9) formed onto the substrate (1), said structure being comprised of elongated parallel electrode conductors, a luminescent multilayered thin-film structure (10, 11, 12) formed onto the first electrode structure (9), and a second, transparaent electrode structure (13, 14) formed on said luminescent multilayered thin-film structure (10, 11, 12), said second electrode structure comprising elongated parallel electrode conductors which are aligned essentially orthogonally to the electrode conductors of the first electrode structure (9).