Abstract: Cathodic/anodic vacuum arc sources with plasma ion implantation deposition system for depositing high quality thin film coatings of complex compounds on a workpiece. Both cathodic and anodic vacuum arc deposition sources, CAVAD, are used to create a plasma vapor from solid materials composing the cathode and/or anode in the cathodic and/or anodic arc respectively. Gases, e.g., hydrogen or nitrogen can be in the deposited films by creating a background plasma of the desired gas using either RF energy, thermionic emission, or consequential ionization of the gas passing through the arc or around the substrate. Application of highly negative pulses to the substrate to extract the ions and provide them with the appropriate energy to interact with the other species in the thin film formation on the substrate to form the desired films. The substrate is bombarded with the ionized particles to form carbon nitrides with variable [N]/[C] ratios, referred to as CN.sub.x.

Abstract: An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to deposition-coat a large area and/or to sequentially deposit a series of layers each of a different material. In one embodiment, a low current triggered anodic vacuum arc with a continuous wire feed mechanism provides the user with a self-contained high differential metal plasma spray. This apparatus provides coatings with properties similar to coatings from a basic anodic arc deposition source but can be self-ignited, continuously run, and made highly mobile for greater coverage control.

Abstract: An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to coat a large area and/or to simultaneously deposit two or more different materials for multi-layer or alloy coating. Several material recovery systems including both methods and devices for recovery of the undeposited anodic arc coating material minimize the anode source waste such that selective coatings may be applied with virtually all excess coating material recovered for reuse. In one embodiment, an anode shield is made of the same material as the anode source material. After the deposition process is complete, captured material is recovered for future reuse by removing the anode shield and reprocessing it into anode source material.

Abstract: A system of localized low velocity laminar air flow in a recirculation path through filtering mechanisms for removing dust mites, waste and other particulate contaminants from the stream of air. That stream of air has a downwardly directed external portion in which a patient's head (particularly its mouth and nose) is adapted to be received.