Abstract: A detection element includes an exposed electrode on the first surface of an insulating substrate, the exposed electrode including first exposed electrode, second exposed electrode, third exposed electrode, and fourth exposed electrode provided; a first electrode pattern provided on a side opposite to the first surface, the first electrode pattern including a pattern connected to the first exposed electrode and the second exposed electrode, a pattern connected to the third exposed electrode and the fourth exposed electrode, a second electrode pattern having a first exposed portion and a pattern provided along the second direction, and a third electrode pattern having a second exposed portion and a pattern provided along the third direction, provided so as to sandwich the third electrode pattern between the first electrode pattern and the second electrode pattern.

Abstract: A Detection element includes a substrate having a first surface and a second surface opposing the first surface, substrate comprising: a substrate provided with a through hole having inner diameters that differ from each other at two points along the thickness of substrate; a through electrode disposed in through hole; a first electrode connected to through electrode and disposed on the first surface; a patterned electrode connected to through electrode and disposed on the second surface; and a second electrode disposed on the first surface and spaced apart from the first electrode.

Abstract: A Detection element includes a substrate having a first surface and a second surface opposing the first surface, substrate comprising: a substrate provided with a through hole having inner diameters that differ from each other at two points along the thickness of substrate; a through electrode disposed in through hole; a first electrode connected to through electrode and disposed on the first surface; a patterned electrode connected to through electrode and disposed on the second surface; and a second electrode disposed on the first surface and spaced apart from the first electrode.

Abstract: A detection element includes an exposed electrode on the first surface of an insulating substrate, the exposed electrode including first exposed electrode, second exposed electrode, third exposed electrode, and fourth exposed electrode provided; a first electrode pattern provided on a side opposite to the first surface, the first electrode pattern including a pattern connected to the first exposed electrode and the second exposed electrode, a pattern connected to the third exposed electrode and the fourth exposed electrode, a second electrode pattern having a first exposed portion and a pattern provided along the second direction, and a third electrode pattern having a second exposed portion and a pattern provided along the third direction, provided so as to sandwich the third electrode pattern between the first electrode pattern and the second electrode pattern.

Abstract: A Detection element includes a substrate having a first surface and a second surface opposing the first surface, substrate comprising: a substrate provided with a through hole having inner diameters that differ from each other at two points along the thickness of substrate; a through electrode disposed in through hole; a first electrode connected to through electrode and disposed on the first surface; a patterned electrode connected to through electrode and disposed on the second surface; and a second electrode disposed on the first surface and spaced apart from the first electrode.

Abstract: A sensor module is provided in which a sensor which can be more easily attached to a structure than conventionally and can also suppress variation in attachment quality. The sensor module includes an elastic layer, a sensor arranged above at last one part of the elastic layer and configured to detect a physical quantity related to the properties of a structure, and a film layer arranged above the elastic layer and attached with the sensor.

Abstract: A microchip for forming an emulsion has a first glass substrate, a second glass substrate and a silicon substrate. The silicon substrate has formed therein a first fluid flow path through which a first fluid flows and a second fluid flow path through which a second fluid that is not mixed with the first fluid flows. The first fluid flow path has a plurality of branched flow paths that join at a joint portion. The second fluid flow path communicates with the joint portion. The silicon substrate has formed therein an emulsion formation flow path that faces an edge portion of the second fluid flow path at the joint portion. An emulsion composed of the first fluid and the second fluid that is surrounded by the first fluid is formed in the emulsion formation flow path.

Abstract: A microchip for forming an emulsion has a first glass substrate, a second glass substrate and a silicon substrate. The silicon substrate has formed therein a first fluid flow path through which a first fluid flows and a second fluid flow path through which a second fluid that is not mixed with the first fluid flows. The first fluid flow path has a plurality of branched flow paths that join at a joint portion. The second fluid flow path communicates with the joint portion. The silicon substrate has formed therein an emulsion formation flow path that faces an edge portion of the second fluid flow path at the joint portion. An emulsion composed of the first fluid and the second fluid that is surrounded by the first fluid is formed in the emulsion formation flow path.

Abstract: A microchip for forming an emulsion has a first glass substrate, a second glass substrate and a silicon substrate. The silicon substrate has formed therein a first fluid flow path through which a first fluid flows and a second fluid flow path through which a second fluid that is not mixed with the first fluid flows. The first fluid flow path has a plurality of branched flow paths that join at a joint portion. The second fluid flow path communicates with the joint portion. The silicon substrate has formed therein an emulsion formation flow path that faces an edge portion of the second fluid flow path at the joint portion. An emulsion composed of the first fluid and the second fluid that is surrounded by the first fluid is formed in the emulsion formation flow path.

Abstract: A microchip for forming an emulsion has a first glass substrate, a second glass substrate and a silicon substrate. The silicon substrate has formed therein a first fluid flow path through which a first fluid flows and a second fluid flow path through which a second fluid that is not mixed with the first fluid flows. The first fluid flow path has a plurality of branched flow paths that join at a joint portion. The second fluid flow path communicates with the joint portion. The silicon substrate has formed therein an emulsion formation flow path that faces an edge portion of the second fluid flow path at the joint portion. An emulsion composed of the first fluid and the second fluid that is surrounded by the first fluid is formed in the emulsion formation flow path.

Abstract: There are provided an apparatus for fine pattern formation, which can form a fine pattern with high accuracy by direct writing with ink, a production process of fine nozzles provided in the apparatus for fine pattern formation, and a method for fine pattern formation.

Abstract: There are provided an apparatus for fine pattern formation, which can form a fine pattern with high accuracy by direct writing with ink, a production process of fine nozzles provided in the apparatus for fine pattern formation, and a method for fine pattern formation.

Abstract: The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating the plasma beam toward the vacuum chamber and a converging coil which is provided so as to surround a short-tube portion of the vacuum chamber projecting toward an outlet of the plasma gun and which reduces a cross section of the plasma beam. This vacuum coating forming device further comprises an insulating tube provided at the outlet so as to surround the plasma beam and project in electric floating state, and an electron return electrode which surrounds the insulating tube within the short-tube portion and which is higher in electric potential than the outlet.