Abstract: In one embodiment, a pattern forming method includes forming a first film on a substrate. The method further includes supplying energy to the first film to form a first region to which the energy have been supplied, and a second region including at least a region to which the energy has not been supplied. The method further includes impregnating at least the first region out of the first and second region with metal atoms. The method further includes developing the first film after impregnating the first region with the metal atoms to remove the second region while leaving the first region.

Abstract: Provided is a supporting structure for an induction heating coil and an induction heating device in which a surface of an induction heating coil is not formed of a coating film for insulation that generates a gas, and movement of the induction heating coil when the induction heating coil is energized can be suppressed. A supporting structure 4 of an induction heating device 1 includes a supporting column 20 and a plurality of restricting members 21. The supporting column 20 is disposed at an outer side in a radial direction of winding portions 13 of the induction heating coil 3, and extends in an axial direction S1. The restricting members 21 receive the induction heating coil 3 to restrict movement of the induction heating coil 3 in the axial direction S1 in an insulated state, and are supported by the supporting column 20.

Abstract: A robot controlling method for operating an arm using a motor includes: performing, before the arm stops, addition to add a backlash compensation value to a position command which is input to the motor; and performing, in a period during which the robot arm is not in motion, subtraction to reduce the backlash compensation value added to the position command.

Abstract: A robot control method of controlling motion of a robot arm by using a servo motor includes adding d-axis electric current to a motor electric current command (steps 15-6, 15-8) if external temperature is less than or equal to a predetermined value (step 15-3), and if an absolute value of the motor electric current command is less than or equal to a predetermined value (step 15-4), and if a value of detected overload is less than or equal to a predetermined value (step 15-5).

Abstract: An electronic control apparatus includes: a circuit board; a holder provided to an upper side of the circuit board; a loudspeaker mounted on the holder; a cushioning member that i) is elastic and ii) is mounted on an upper side of the loudspeaker; and a case that i) is in contact with the cushioning member and ii) houses the circuit board, the holder and the loudspeaker. Thus, the electronic control apparatus including the loudspeaker outputs sound at a high volume.

Abstract: A motor control device includes a movement command generation unit, a movement command processing unit, and a control unit. The movement command generation unit outputs a movement command of a motor. The movement command processing unit includes a buffer, a filter, and a processing unit. The buffer holds the movement command. The filter performs filter processing of a constant and generates a new constant. The processing unit performs arithmetic processing based on the movement command held in the buffer and the new constant generated by the filter, and generates and outputs a new movement command proportional to the new constant.

Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.

Abstract: An induction heating coil includes a coil section configured to heat a treatment target by induction, a power supply section configured to supply power to the coil section, and a cooling medium passage that is arranged in the power supply section and the coil section, and is configured to supply a cooling medium to the coil section. The coil section, the power supply section, and the cooling medium passage are formed using a metal additive fabrication method.

Abstract: According to one embodiment, a substrate processing apparatus comprises a chamber for a substrate that has a target film thereon. The apparatus includes a first gas introducing unit to introduce a precursor gas into the chamber, a second gas introducing unit that introduces a etching gas for etching the target film into the chamber, and a controller configured to control the first gas introducing unit and the second gas introducing unit to cause the first gas and the second gas to be alternately introduced to the chamber.

Abstract: In a robot having a first rotary shaft and a second rotary shaft driven by respective motors and extending in the same direction, the second rotary shaft is rotated while vibrating the first rotary shaft that is holding a load directly or indirectly, thereby rotating the first rotary shaft relative to a load. This enables calculating the gravitational torque of the load applied to the first rotary shaft.

Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.

Abstract: A pattern-forming method includes forming a first film above a material to be processed, processing the first film into a pattern to be formed in the material to be processed, providing a second film on the first film and the material to be processed, supplying a precursor containing at least one of a metal material or a semiconductor material to the second film, removing the first film, and processing the material to be processed using the second film impregnated with at least one of the metal material and the semiconductor material, as a mask.

Abstract: A disclosed motor control device includes: a PI controller which controls a velocity of a motor; an input unit which receives specification information including information of a weight and a center of mass of a tool; a calculation unit which calculates a gravitational torque based on the specification information; a storage which stores the gravitational torque output from the calculation unit and an integral value output from the PI controller, and outputs the gravitational torque and the integral value in response to a break signal; and a selection unit which sets, to the PI controller, the integral value output from the storage, according to a collision sensitivity input from the input unit.

Abstract: An induction heating coil includes a coil section configured to heat a treatment target by induction, a power supply section configured to supply power to the coil section, and a cooling medium passage that is arranged in the power supply section and the coil section, and is configured to supply a cooling medium to the coil section. The coil section, the power supply section, and the cooling medium passage are formed using a metal additive fabrication method.

Abstract: An induction heating coil includes a coil section configured to heat a treatment target by induction, a power supply section configured to supply power to the coil section, and a cooling medium passage that is arranged in the power supply section and the coil section, and is configured to supply a cooling medium to the coil section. The coil section, the power supply section, and the cooling medium passage are formed using a metal additive fabrication method.

Abstract: A battery pack includes a secondary battery, a discharge controlling circuit configured to discharge the secondary battery and control an output current supplied to battery driven equipment, a wake-up current detection circuit configured to, in a power saving state in which the output current supplied to the battery driven equipment by the discharge controlling circuit is reduced from a normal non-power saving state, detect that the output current exceeds a wake-up current threshold to make the battery pack transition from the power saving state to the non-power saving state, and a calibration member configured to calibrate a reference point of the wake-up current detection circuit. The wake-up current detection circuit is configured to operate in the power saving state and stop its operation in the non-power saving state, and the calibration member is configured to execute a calibration operation at a predetermined timing in the power saving state.

Abstract: A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.

Abstract: A motor control device includes a movement command generator that outputs a movement command of a motor, a filter that performs filter processing of the movement command and outputs the filtered movement command, and a position controller that performs a position control of the motor. The filter is an infinite impulse response digital filter that is represented by a transfer function H(z): H(z)=(b0+b1·z?1+b2·z?2)/{1?(a1·z?1+a2·z?2)} with filter coefficients a1, a2, b0, b1, and b2. The filter is configured to change the filter coefficient b0 in a first sample period, to change the filter coefficients a1 and b1 in a second sample period which follows the first sample period, and to change the filter coefficients a2 and b2 in a third sample period which follows the second sample period.

Abstract: An electronic control apparatus includes: a circuit board; a holder provided to an upper side of the circuit board; a loudspeaker mounted on the holder; a cushioning member that i) is elastic and ii) is mounted on an upper side of the loudspeaker; and a case that i) is in contact with the cushioning member and ii) houses the circuit board, the holder and the loudspeaker. Thus, the electronic control apparatus including the loudspeaker outputs sound at a high volume.

Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.