Abstract: A multi-nozzle device includes a nozzle body having a chamber into which fluid enters, a reference nozzle and a specific nozzle. The reference nozzle and the specific nozzle are each provided in the nozzle body. The inflow ends of the nozzles are communicated to the chamber. The outflow ends of the nozzles protrude from an end surface of the nozzle body. A length of the specific nozzle and a length of the reference nozzle differ from each other depending on the target discharge amount of the reference nozzle and the target discharge amount of the specific nozzle. An inner diameter of the specific nozzle and an inner diameters and of the reference nozzles and may be different from each other.

Abstract: A method of manufacturing a base plate, after deburring and heat-treating a half-finished base plate, cuts off a scrap section at the ends of the scrap section from a half-finished actuator attaching area so that cutting surfaces left in a finished actuator attaching area are positioned onto the inner perimeter of the finished actuator attaching area and are oriented to at least partly face an actuator attaching position inside the finished actuator attaching area.

Abstract: A terminal structure includes an insulating layer hole formed through an insulating layer, a ground via that passes through the insulating layer hole and electrically connects a wiring layer formed on the insulating layer and a metal layer formed under the insulating layer to each other, and a terminal face defined on a surface of the metal layer and bonded through a conductive adhesive to an electrode of a piezoelectric element.

Abstract: A method of manufacturing a base plate, after deburring and heat-treating a half-finished base plate, cuts off a scrap section at the ends of the scrap section from a half-finished actuator attaching area so that cutting surfaces left in a finished actuator attaching area are positioned onto the inner perimeter of the finished actuator attaching area and are oriented to at least partly face an actuator attaching position inside the finished actuator attaching area.

Abstract: A load beam of a head suspension has a rigid part and a resilient part supported with a base to be attached to a carriage arm. The load beam applies a load onto a head supported at a front end of the rigid part. The load beam includes a load bend formed in each of a pair of legs that extend from widthwise sides of a base end of the rigid part and form the resilient part. The load bend is formed by bending the leg along a bend line that is defined on the leg and extends in a width direction of the load beam. The bend lines on the legs are positionally shifted from each other in a length direction of the load beam.

Abstract: A terminal structure includes an insulating layer hole formed through an insulating layer, a ground via that passes through the insulating layer hole and electrically connects a wiring layer formed on the insulating layer and a metal layer formed under the insulating layer to each other, and a terminal face defined on a surface of the metal layer and bonded through a conductive adhesive to an electrode of a piezoelectric element.

Abstract: A load beam of a head suspension has a rigid part and a resilient part supported with a base to be attached to a carriage arm. The load beam applies a load onto a head supported at a front end of the rigid part. The load beam includes a load bend formed in each of a pair of legs that extend from widthwise sides of a base end of the rigid part and form the resilient part. The load bend is formed by bending the leg along a bend line that is defined on the leg and extends in a width direction of the load beam. The bend lines on the legs are positionally shifted from each other in a length direction of the load beam.

Abstract: A head suspension 15 includes a base plate 27, a load bend 35, a load beam 37, a flexure 39, and a slider 25 that are assembled together through several processes including a pressing process. In such a head suspension 15 that is a finished product in a conventional sense, a front end 30 of the base plate 27 is twisted so that the front end 30 inclines toward one of inner and outer circumferences of a disk-like recording medium 33. The twisting process is carried out before attaching the head suspension 15 to an arm 13 of a carriage to be installed in a hard disk drive. The head suspension 15 with the twisted front end 30 prevents off-track errors even when it is used for a multi-arm assembly involving a plurality of head suspensions.

Abstract: A head suspension 15 includes a base plate 27, a load bend 35, a load beam 37, a flexure 39, and a slider 25 that are assembled together through several processes including a pressing process. In such a head suspension 15 that is a finished product in a conventional sense, a front end 30 of the base plate 27 is twisted so that the front end 30 inclines toward one of inner and outer circumferences of a disk-like recording medium 33. The twisting process is carried out before attaching the head suspension 15 to an arm 13 of a carriage to be installed in a hard disk drive. The head suspension 15 with the twisted front end 30 prevents off-track errors even when it is used for a multi-arm assembly involving a plurality of head suspensions.

Abstract: A cleaning apparatus in which cleaning and drying can be carried out without the risk of reverse contamination of the cleaned object after the drying process. The cleaning apparatus includes a supporting device for supporting an object to be cleaned, and a cleaning cup surrounding the supporting device to prevent splashing of a cleaning liquid. The cleaning apparatus includes a cleaning device for cleaning an inner wall of the cleaning cup with a cleaning liquid.

Abstract: A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the drying process. The cleaning apparatus includes a supporting device for supporting an object to be cleaned, and a cleaning cup surrounding the supporting device to prevent splashing of a cleaning liquid. The cleaning apparatus includes a cleaning device for cleaning an inner wall of the cleaning cup with a cleaning liquid.

Abstract: A substrate cleaning apparatus is used for cleaning and drying a substrate such as a semiconductor wafer used in a semiconductor fabricating process or the like. The substrate cleaning apparatus includes a substrate holding mechanism (10) configured to hold the substrate (W), and a rotating mechanism (20) configured to rotate the substrate holding mechanism (10). At least one of components of the substrate cleaning apparatus has a surface structure to which droplets are hardly attached.

Abstract: In order to provide a cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without risk of reverse contamination of the cleaned object after the drying process, a cleaning apparatus comprises a supporting device for supporting an object to be cleaned, and a cleaning cup surrounding said supporting device to prevent splashing of a cleaning liquid, said cleaning apparatus comprising: a cleaning device for cleaning an inner wall of said cleaning cup with a cleaning liquid.