Patents by Inventor Ryousuke Minami

Ryousuke Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microchip, analysis apparatus, and analysis method
    Patent number: 10919035
    Abstract: According to some aspects, a microfluidic device is provided, comprising a sample holding chamber; and at least one flow path connected to the sample holding chamber configured to supply liquid into the sample holding chamber, wherein the sample holding chamber includes a first inner surface; and a light irradiation region intersecting the first inner surface and configured to receive light from outside of the sample holding chamber to irradiate liquid inside the sample holding chamber, wherein the first inner surface includes at least one recess shaped so as to contain gas bubbles present within the liquid, and wherein the at least one recess is located outside of the light irradiation region.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: February 16, 2021
    Assignee: Sony Corporation
    Inventors: Shin Masuhara, Yoshiaki Kato, Ryousuke Minami, Toshio Watanabe
  • MICROCHIP, ANALYSIS APPARATUS, AND ANALYSIS METHOD
    Publication number: 20180065119
    Abstract: According to some aspects, a microfluidic device is provided, comprising a sample holding chamber; and at least one flow path connected to the sample holding chamber configured to supply liquid into the sample holding chamber, wherein the sample holding chamber includes a first inner surface; and a light irradiation region intersecting the first inner surface and configured to receive light from outside of the sample holding chamber to irradiate liquid inside the sample holding chamber, wherein the first inner surface includes at least one recess shaped so as to contain gas bubbles present within the liquid, and wherein the at least one recess is located outside of the light irradiation region.
    Type: Application
    Filed: February 24, 2016
    Publication date: March 8, 2018
    Applicant: Sony Corporation
    Inventors: Shin Masuhara, Yoshiaki Kato, Ryousuke Minami, Toshio Watanabe