Abstract: Single-chip solutions and related methods that result in much higher capacitance densities than is achievable with current on-chip solutions and which reduce consumption of planar area of a mounting structure. Embodiments of the present invention use vertical stacking to affix one or more discrete embeddable capacitors to an IC chip superstructure or base structure, and either sequentially or concurrently form electrical connections between the discrete embeddable capacitors and the IC chip. The inventive processes are compatible with CMOS fabrication temperatures for the IC chip while allowing use of capacitors that are fabricated using other processes that may involve much higher temperatures. The inventive processes allow connection of relatively large capacitances (e.g., ˜0.5 ?F-1 ?F) to an IC chip without increasing the 2-D footprint of the IC chip.

Abstract: Methods for simultaneous generation of a buried oxide (BOX) layer and a trap-rich layer in a silicon substrate are presented. According to one aspect, oxygen is implanted in the silicon substrate such as to form a region of oxygen concentration according to a concentration profile with a peak at a target depth of the BOX layer. According to another aspect, the concentration profile includes a leading-edge profile that is shorter than a trailing-edge profile. According to another aspect, the substrate is annealed to form the BOX layer and a damaged layer immediately below the BOX layer, the damaged layer having a functionality of a trap-rich layer.

Abstract: Semiconductor devices and methods of forming thereof by post layer transfer fabrication of device isolation structures are described. A substrate with first and second major surfaces is provided. Circuit components may be formed on the first major surface of the substrate and a back-end-of-line (BEOL) dielectric layer is formed over the first major surface of the substrate which covers the circuit components. A single layer transfer is performed to expose the second major surface of the substrate for processing. The second major surface of the semiconductor substrate is processed to thin down the wafer, followed by a wafer thickness uniformity improvement process. One or more device isolation structures are formed through the semiconductor substrate from the second major surface of the semiconductor substrate.

Abstract: Semiconductor devices and methods of forming thereof by post layer transfer fabrication of device isolation structures are described. A substrate with first and second major surfaces is provided. Circuit components may be formed on the first major surface of the substrate and a back-end-of-line (BEOL) dielectric layer is formed over the first major surface of the substrate which covers the circuit components. A single layer transfer is performed to expose the second major surface of the substrate for processing. The second major surface of the semiconductor substrate is processed to thin down the wafer, followed by a wafer thickness uniformity improvement process. One or more device isolation structures are formed through the semiconductor substrate from the second major surface of the semiconductor substrate.

Abstract: Methods of forming a SOI PA and RF switch device having a thin BOX layer in the PA power cell region and a thick metal layer directly under the thin BOX layer and the resulting device are provided. Embodiments include providing a SOI structure having a substrate, BOX, device and metallization layers; bonding a handling layer to the metallization layer; removing the substrate; forming a passivation oxide layer over the BOX; forming first and second trenches through the passivation, BOX, and device layers down to the metallization layer; forming a third trench through the passivation layer and a portion of the BOX above a PA power cell region of the SOI structure, a thin portion of the BOX remaining; forming a first backside contact in the first trench; and forming a second backside contact in the second and third trenches and over a portion of the passivation oxide layer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A fuel battery cell covered with a hydrophilic polymer layer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.