Patents by Inventor Sachiko Kato

Sachiko Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11941657
    Abstract: An information processing system includes an identification information receiving unit for receiving user identification information presented by a user, a determining unit for determining whether the user identification information that has been received is first user identification information for performing first processing relating to the user, or second user identification information for performing second processing that is executed following the first processing, and an user identifying unit for, in a case of determining that the user identification information that has been received is the second user identification information, identifying a user that is an object of third processing relating to the user, with the third processing being executed following the second processing, on the basis of the second user identification information.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: March 26, 2024
    Assignee: Rakuten Group, Inc.
    Inventors: Tsuneo Tsuchiya, Sachiko Fukushima, Nanase Kato
  • Patent number: 10252933
    Abstract: Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0×10?7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20° C. to 50° C. is 4.0×10?7/K or less.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: April 9, 2019
    Assignee: COORSTEK KK
    Inventors: Yuji Fukasawa, Sachiko Kato
  • Publication number: 20170349477
    Abstract: Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0?10?7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20° C. to 50° C. is 4.0×10?7/K or less.
    Type: Application
    Filed: May 30, 2017
    Publication date: December 7, 2017
    Applicant: CoorsTek KK
    Inventors: Yuji FUKASAWA, Sachiko KATO
  • Publication number: 20100267778
    Abstract: The present invention relates to a compound represented by formula (I): wherein ring A, ring B and ring D each independently represents a cyclic group which may have a substituent(s); W is a spacer having 1 to 8 atom(s) in its main chain; X is a spacer having 1 to 2 atom(s) in its main chain; Y is a binding bond or a spacer having 1 to 8 atom(s) in its main chain; and Z is an acidic group, or a salt thereof, a solvate thereof or a prodrug thereof. The compound represented by formula (I) has a PPAR ? agonistic action and is useful as a preventive and/or treating agent for diseases where sugar and lipid metabolisms are abnormal (diabetes, hyperlipemia, arteriosclerosis, cardiovascular diseases, obesity and metabolic syndrome or the like), hypertension, circulatory diseases and skin inflammation diseases.
    Type: Application
    Filed: August 3, 2004
    Publication date: October 21, 2010
    Inventors: Shinya Kusuda, Yoshisuke Nakayama, Masaki Ima, Hisao Tajima, Sachiko Kato
  • Patent number: 7485593
    Abstract: To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability. Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
    Type: Grant
    Filed: October 18, 2007
    Date of Patent: February 3, 2009
    Assignee: Covalent Materials Corporation
    Inventors: Masanobu Ezaki, Masashi Kobata, Sachiko Kato
  • Publication number: 20080096756
    Abstract: To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability. Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
    Type: Application
    Filed: October 18, 2007
    Publication date: April 24, 2008
    Inventors: Masanobu Ezaki, Masashi Kobata, Sachiko Kato
  • Publication number: 20070105959
    Abstract: A compound represented by formula (I) (wherein all the symbols are as defined in the specification) or a salt thereof Since the compound represented by formula (I) or a salt thereof has a regulatory activity for peroxisome proliferator activated receptor, the compound represented by formula (I) is useful as a hypoglycemic agent, a hypolipidemic agent, a preventive and/or therapeutic agent for diseases associating metabolic disorders (e.g., diabetes, adiposity, metabolic syndrome, hypercholesterolemia, hyperlipoproteinemia, etc.), hyperlipidemia, atherosclerosis, hypertension, circulatory diseases, overeating, ischemic heart diseases, etc., a HDL cholesterol-elevating agent, a LDL cholesterol and/or VLDL cholesterol-lowering agent and a drug for relief from risk factors of diabetes or metabolic syndrome.
    Type: Application
    Filed: March 10, 2004
    Publication date: May 10, 2007
    Inventors: Shinya Kusuda, Yoshisuke Nakayama, Hisao Tajima, Sachiko Kato
  • Publication number: 20050209477
    Abstract: (wherein R1, R2, R3, R4 and R5 may be the same or different and each represents a hydrogen atom, substituted or unsubstituted lower alkyl, substituted or unsubstituted lower alkoxy, or the like; R17 represents trifluoromethyl or the like; R18, R19, R20, R21 and R22 may be the same or different and each represents a hydrogen atom, substituted or unsubstituted lower alkyl, or the like). An easy and simple process for producing a vinyl perfluoroalkanesulfonate derivative represented by general formula (IV) which is a useful intermediate in synthesis of medicines, natural products, or the like, at a low cost, is provided. The process is characterized by, for example, reacting a carbonyl compound represented by general formula (I) described above with a perfluoroalkanesulfonic anhydride represented by general formula (II) described above in the presence of a pyridine derivative represented by general formula (III) described above in an amount of 0.1 to 1.0 equivalent to the perfluoroalkanesulfonic anhydride.
    Type: Application
    Filed: June 20, 2003
    Publication date: September 22, 2005
    Inventors: Sachiko Kato, Iwao Chujo, Koji Suzuki
  • Patent number: 5756823
    Abstract: The present invention relates to glutathione monoester sulfonate represented by formula (I): ##STR1## (wherein R.sup.1 represent lower alkyl, and R.sup.2 represents lower alkyl, or substituted or unsubstituted aryl) which readily crystallizes and has high stability, and a simple process for producing the same. According to the process, the product having high purity can be obtained in high yields.
    Type: Grant
    Filed: May 6, 1997
    Date of Patent: May 26, 1998
    Assignee: Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Sachiko Kato, Iwao Chujo, Takehiro Ogasa, Masaji Kasai, Yukiteru Mimura