Patents by Inventor Sachiko Nakao

Sachiko Nakao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11978959
    Abstract: An object is to provide a ?/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that has higher radio wave absorption performance. The object is achieved by a ?/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that satisfies formula (1): ?0.375x+1086.9<y<?0.375x+1140 wherein x represents a resistance value of the resistive film, and y=the thickness of the support×(the relative permittivity of the support)0.5+the thickness of the dielectric layer×(the relative permittivity of the dielectric layer)0.5.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: May 7, 2024
    Assignee: SEKISUI CHEMICAL CO., LTD.
    Inventors: Katsunori Mutou, Sachiko Nakao
  • Publication number: 20220181948
    Abstract: This vehicle-mounted electric compressor is provided with a compressor body including a motor for compressing a refrigerant, and an inverter including a power element for supplying the motor with electric current. The power element is provided with: a metal substrate having an electrically conductive layer in a partial region of the surface thereof; a heat-generating element having a metal layer solder-fixed to the electrically conductive layer; and a resin substrate which is disposed in parallel with the metal substrate in a plate thickness direction of the metal substrate, and has a metal pattern printed on the surface thereof, the metal pattern having an electronic component mounted thereon. The electronic component and a terminal of the heat-generating element are connected by means of the metal pattern.
    Type: Application
    Filed: April 16, 2020
    Publication date: June 9, 2022
    Applicant: MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD.
    Inventors: Masato ITO, Hiroto HIGUCHI, Kyohei WATANABE, Sachiko NAKAO, Koji NAKANO
  • Publication number: 20220069474
    Abstract: An object of the present invention is to provide a radio wave absorber that has excellent radio wave absorption against oblique incidence, particularly against oblique incidence of radio waves at around 60 GHz. The object can be achieved by a radio wave absorber that has an absorption range with absorption performance of 15 dB or more within the frequency band of 55 to 65 GHz of 4 GHz or more in a circular polarization measurement at 45° incidence.
    Type: Application
    Filed: December 25, 2019
    Publication date: March 3, 2022
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Katsunori MUTOU, Sachiko NAKAO, Hideki HAYASHI
  • Publication number: 20220071071
    Abstract: An object of the present invention is to provide a radio wave absorber having excellent radio wave absorption against oblique incidence, particularly against oblique incidence of radio waves at around 79 GHz. The object can be achieved by a radio wave absorber having characteristic A: an absorption range with absorption performance of 15 dB or more within the frequency band of 75 to 85 GHz of 4 GHz or more in a TM polarization measurement at 45° incidence and/or characteristic B: an absorption range with absorption performance of 15 dB or more within the frequency band of 75 to 85 GHz of 4 GHz or more in a TB polarization measurement at 45° incidence.
    Type: Application
    Filed: December 25, 2019
    Publication date: March 3, 2022
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Katsunori MUTOU, Sachiko NAKAO, Hideki HAYASHI
  • Publication number: 20220007553
    Abstract: A conductive nonwoven fabric comprising a metal layer on at least one surface thereof, the conductive nonwoven fabric having a sheet resistance of 200 to 600 ?/? and a density of 2.0×104 to 8.×105 g/m3. The conductive nonwoven fabric has higher radio wave absorption properties (high absorption and low reflectivity), even against high-frequency radio waves.
    Type: Application
    Filed: November 28, 2019
    Publication date: January 6, 2022
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Takefumi KOYAMA, Katsunori MUTOU, Sachiko NAKAO, Kazuyuki YAHARA
  • Publication number: 20210265738
    Abstract: An object is to provide a ?/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that has higher radio wave absorption performance. The object is achieved by a ?/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that satisfies formula (1): -0.375x+1086.9<y<?0.375x+1140 wherein x represents a resistance value of the resistive film, and y=the thickness of the support×(the relative permittivity of the support)0.5+the thickness of the dielectric layer×(the relative permittivity of the dielectric layer)0.5.
    Type: Application
    Filed: September 25, 2019
    Publication date: August 26, 2021
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Katsunori MUTOU, Sachiko NAKAO
  • Publication number: 20210010107
    Abstract: The present invention aims to provide a ?/4 type radio wave absorber having excellent durability. Provided is a ?/4 type radio wave absorber including: a resistive film containing molybdenum; a resistive film; a dielectric layer; and a reflective layer, in the stated order.
    Type: Application
    Filed: March 20, 2019
    Publication date: January 14, 2021
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Sachiko NAKAO, Katsunori MUTOU, Tetsuro SAWADAISHI
  • Patent number: 8692153
    Abstract: Provided is a method for manufacturing a photoelectric-conversion-device capable of controlling the groove depth of a processed groove to a desired value. The method for manufacturing a photoelectric conversion device (10) includes a groove forming step of irradiating an intermediate-contact-layer separating groove (15) constituting a photoelectric conversion device (10) with a picosecond laser and of moving the picosecond laser relative to the intermediate-contact-layer separating groove (93), thereby forming a processed groove (15) in a predetermined scanning direction. In the groove forming step, interference fringes arranged in parallel in one direction are formed in an irradiated area corresponding to a beam diameter of the picosecond laser, and the picosecond laser is relatively moved such that the interference fringes are joined in the scanning direction.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: April 8, 2014
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Kohei Kawazoe, Kazutaka Uda, Tomoyoshi Baba, Takashi Ishide, Sachiko Nakao
  • Publication number: 20130084408
    Abstract: A vacuum processing apparatus includes a discharge chamber with a ridge waveguide having an exhaust-side ridge electrode and a substrate-side ridge electrode between which a plasma is formed; a pair of converters, which convert high-frequency power into TE mode, which represents the basic transmission mode of rectangular waveguides, for transmission to the discharge chamber, and form a plasma between the exhaust-side ridge electrode and the substrate-side ridge electrode; a uniform heating temperature controller, which is disposed on the outer surface of the substrate-side ridge electrode and heats the electrode uniformly; and a heat-absorbing temperature control unit, which is disposed on the outer surface of the exhaust-side ridge electrode and controls thermal flux through the thickness direction of a substrate undergoing plasma processing. The substrate is disposed between the exhaust-side ridge electrode and the substrate-side ridge electrode, and subjected to plasma processing.
    Type: Application
    Filed: May 9, 2011
    Publication date: April 4, 2013
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sachiko Nakao, Eishiro Sasakawa, Yoshiaki Takeuchi, Naoyuki Miyazono, Eiichiro Ohtsubo
  • Publication number: 20110308735
    Abstract: A discharge chamber formed of a ridge waveguide having ridge electrodes that are disposed facing each other and that generate plasma therebetween; a gas supplying portion that is disposed adjacent to the discharge chamber and that supplies source gas, which is used to form the plasma, toward the ridge electrodes; a substrate that is disposed at a position such that the gas supplying portion is flanked by the substrate and the discharge chamber and that is subjected to the processing by the plasma; a low-pressure vessel that accommodates thereinside at least the discharge chamber, the gas supplying portion, and the substrate; and an exhaust portion that is communicated at a position in the low-pressure vessel such that this position and the gas supplying portion are disposed on either side of the discharge chamber, and that reduces the pressure inside the low-pressure vessel are provided.
    Type: Application
    Filed: February 15, 2010
    Publication date: December 22, 2011
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Yoshiaki Takeuchi, Tatsuyuki Nishimiya, Hiroomi Miyahara, Sachiko Nakao
  • Publication number: 20110226748
    Abstract: Provided is a method for manufacturing a photoelectric-conversion-device capable of controlling the groove depth of a processed groove to a desired value. The method for manufacturing a photoelectric conversion device (10) includes a groove forming step of irradiating an intermediate-contact-layer separating groove (15) constituting a photoelectric conversion device (10) with a picosecond laser and of moving the picosecond laser relative to the intermediate-contact-layer separating groove (93), thereby forming a processed groove (15) in a predetermined scanning direction. In the groove forming step, interference fringes arranged in parallel in one direction are formed in an irradiated area corresponding to a beam diameter of the picosecond laser, and the picosecond laser is relatively moved such that the interference fringes are joined in the scanning direction.
    Type: Application
    Filed: August 25, 2009
    Publication date: September 22, 2011
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Kohei Kawazoe, Kazutaka Uda, Tomoyoshi Baba, Takashi Ishide, Sachiko Nakao
  • Patent number: 4917483
    Abstract: An f..theta. lens system used in a laser beam scanning device and being capable of varying a focal length thereof. The f..theta. lens system is provided between a deflector and a photosensitive medium and comprises from the deflector side a first lens unit of negative refractive power and a second lens unit of positive refractive power which are relatively moved to vary the focal length of the f..theta. lens system.
    Type: Grant
    Filed: December 12, 1988
    Date of Patent: April 17, 1990
    Assignee: Minolta Camera Kabushiki Kaisha
    Inventor: Sachiko Nakao