Patents by Inventor Sachio Ido
Sachio Ido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11322310Abstract: A photochemical electrode includes: an electrically conductive layer; and a photoexcitation material layer provided over the electrically conductive layer and including a photoexcitation material, wherein the photoexcitation material layer is one of a first photoexcitation material layer in which a potential of the conduction band minimum decreases from a second surface opposite to a first surface on the side of the electrically conductive layer toward the first surface and a second photoexcitation material layer in which a potential of the valence band maximum decreases from the second surface toward the first surface.Type: GrantFiled: June 16, 2020Date of Patent: May 3, 2022Assignee: FUJITSU LIMITEDInventors: Yoshihiko Imanaka, Hideyuki Amada, Toshio Manabe, Toshihisa Anazawa, Sachio Ido, Naoki Awaji
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Patent number: 11313046Abstract: A photochemical electrode includes: an electrically-conductive layer; and a photo-excited material layer including a photo-excited material provided over the electrically-conductive layer, wherein in a surface of the photo-excited material layer, a lattice plane having highest atomic density in a crystal structure of the photo-excited material is oriented in a surface direction of the surface of the photo-excited material layer.Type: GrantFiled: October 9, 2019Date of Patent: April 26, 2022Assignee: FUJITSU LIMITEDInventors: Yoshihiko Imanaka, Hideyuki Amada, Toshio Manabe, Toshihisa Anazawa, Sachio Ido, Naoki Awaji
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Publication number: 20200312575Abstract: A photochemical electrode includes: an electrically conductive layer; and a photoexcitation material layer provided over the electrically conductive layer and including a photoexcitation material, wherein the photoexcitation material layer is one of a first photoexcitation material layer in which a potential of the conduction band minimum decreases from a second surface opposite to a first surface on the side of the electrically conductive layer toward the first surface and a second photoexcitation material layer in which a potential of the valence band maximum decreases from the second surface toward the first surface.Type: ApplicationFiled: June 16, 2020Publication date: October 1, 2020Applicant: FUJITSU LIMITEDInventors: Yoshihiko IMANAKA, Hideyuki AMADA, Toshio MANABE, Toshihisa ANAZAWA, Sachio IDO, Naoki AWAJI
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Publication number: 20200040472Abstract: A photochemical electrode includes: an electrically-conductive layer; and a photo-excited material layer including a photo-excited material provided over the electrically-conductive layer, wherein in a surface of the photo-excited material layer, a lattice plane having highest atomic density in a crystal structure of the photo-excited material is oriented in a surface direction of the surface of the photo-excited material layer.Type: ApplicationFiled: October 9, 2019Publication date: February 6, 2020Applicant: FUJITSU LIMITEDInventors: Yoshihiko Imanaka, Hideyuki AMADA, Toshio MANABE, Toshihisa Anazawa, Sachio IDO, Naoki AWAJI
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Patent number: 10328419Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing t gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.Type: GrantFiled: June 13, 2018Date of Patent: June 25, 2019Assignee: FUJITSU LIMITEDInventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio Manabe, Hideyuki Amada, Sachio Ido, Fumiaki Kumasaka, Naoki Awaji
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Publication number: 20180290130Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing t gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.Type: ApplicationFiled: June 13, 2018Publication date: October 11, 2018Applicant: FUJITSU LIMITEDInventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio MANABE, Hideyuki AMADA, Sachio IDO, Fumiaki KUMASAKA, Naoki AWAJI
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Patent number: 10016746Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.Type: GrantFiled: April 28, 2017Date of Patent: July 10, 2018Assignee: FUJITSU LIMITEDInventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio Manabe, Hideyuki Amada, Sachio Ido, Fumiaki Kumasaka, Naoki Awaji
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Publication number: 20170341062Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.Type: ApplicationFiled: April 28, 2017Publication date: November 30, 2017Applicant: FUJITSU LIMITEDInventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio MANABE, Hideyuki AMADA, Sachio IDO, Fumiaki KUMASAKA, Naoki AWAJI
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Publication number: 20170316886Abstract: A photochemical electrode includes: an electrically conductive layer; and a photoexcitation material layer provided over the electrically conductive layer and including a photoexcitation material, wherein the photoexcitation material layer is one of a first photoexcitation material layer in which a potential of the conduction band minimum decreases from a second surface opposite to a first surface on the side of the electrically conductive layer toward the first surface and a second photoexcitation material layer in which a potential of the valence band maximum decreases from the second surface toward the first surface.Type: ApplicationFiled: April 14, 2017Publication date: November 2, 2017Applicant: FUJITSU LIMITEDInventors: Yoshihiko Imanaka, Hideyuki AMADA, Toshio MANABE, Toshihisa Anazawa, Sachio IDO, Naoki AWAJI
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Publication number: 20170314147Abstract: A photochemical electrode includes: an electrically-conductive layer; and a photo-excited material layer including a photo-excited material provided over the electrically-conductive layer, wherein in a surface of the photo-excited material layer, a lattice plane having highest atomic density in a crystal structure of the photo-excited material is oriented in a surface direction of the surface of the photo-excited material layer.Type: ApplicationFiled: March 23, 2017Publication date: November 2, 2017Applicant: FUJITSU LIMITEDInventors: Yoshihiko Imanaka, Hideyuki AMADA, Toshio MANABE, Toshihisa Anazawa, Sachio IDO, Naoki AWAJI
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Patent number: 7989559Abstract: The present invention provides a plant resin composition containing a polylactic acid, a thermoplastic resin, and a compatibilizer, in which the compatibilizer is a polymeric material formed from an alkyl methacrylate monomer and has a weight-average molecular weight of not less than 950,000 and not more than 4,100,000. The alkyl methacrylate monomer preferably is at least one selected from methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate. By forming a plant resin molded product with this plant resin composition, the impact resistance and the heat resistance of the plant resin molded product can be enhanced.Type: GrantFiled: September 10, 2007Date of Patent: August 2, 2011Assignee: Fujitsu LimitedInventor: Sachio Ido
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Patent number: 7897700Abstract: The present invention provides a plant resin composition containing a polylactic acid, a thermoplastic resin, and a compatibilizer, in which the compatibilizer is a polymeric material formed from an alkyl methacrylate monomer and has a weight-average molecular weight of not less than 950,000 and not more than 4,100,000. The alkyl methacrylate monomer preferably is at least one selected from methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate. By forming a plant resin molded product with this plant resin composition, the impact resistance and the heat resistance of the plant resin molded product can be enhanced.Type: GrantFiled: September 10, 2007Date of Patent: March 1, 2011Assignee: Fujitsu LimitedInventor: Sachio Ido
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Publication number: 20090043034Abstract: A plant-based resin-containing composition according to the present invention includes polyamide 11 and an amorphous resin. The amorphous resin is at least one resin selected from the group consisting of ABS resin, AS resin, ASA resin, polyvinyl chloride, polystyrene, polycarbonate, polymethylmethacrylate, modified polyphenylene ether, polysulfone, polyethersulfone and polyarylate. A plant-based resin-containing molded product according to the present invention is formed from the aforementioned plant-based resin-containing composition of the present invention.Type: ApplicationFiled: March 21, 2008Publication date: February 12, 2009Inventors: Masanobu ISHIDUKA, Sachio IDO, Koichi KIMURA, Takamitsu NAKAMURA, Takayuki FUJIWARA
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Publication number: 20080071038Abstract: The present invention provides a plant resin composition containing a polylactic acid, a thermoplastic resin, and a compatibilizer, in which the compatibilizer is a polymeric material formed from an alkyl methacrylate monomer and has a weight-average molecular weight of not less than 950,000 and not more than 4,100,000. The alkyl methacrylate monomer preferably is at least one selected from methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate. By forming a plant resin molded product with this plant resin composition, the impact resistance and the heat resistance of the plant resin molded product can be enhanced.Type: ApplicationFiled: September 10, 2007Publication date: March 20, 2008Inventor: Sachio Ido
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Patent number: 6889163Abstract: A system for assessing an environmental load includes an image acquisition unit which acquires image data of an image of a component-implemented circuit board subjected to assessment, a component database which includes matching-purpose data and environmental load data with respect to a plurality of components, and a matching unit which matches the image data with the matching-purpose data of the component database to identify individual components on the component-implemented circuit board subjected to assessment, and extracts the environmental load data belonging to the identified individual components from the component database, thereby obtaining the environmental load of the component-implemented circuit board subjected to assessment.Type: GrantFiled: June 18, 2003Date of Patent: May 3, 2005Assignee: Fujitsu LimitedInventors: Takafumi Hashitani, Sachio Ido, Tsuyoshi Mita, Shigeharu Suzuki
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Publication number: 20040039529Abstract: A system for assessing an environmental load includes an image acquisition unit which acquires image data of an image of a component-implemented circuit board subjected to assessment, a component database which includes matching-purpose data and environmental load data with respect to a plurality of components, and a matching unit which matches the image data with the matching-purpose data of the component database to identify individual components on the component-implemented circuit board subjected to assessment, and extracts the environmental load data belonging to the identified individual components from the component database, thereby obtaining the environmental load of the component-implemented circuit board subjected to assessment.Type: ApplicationFiled: June 18, 2003Publication date: February 26, 2004Applicant: FUJITSU LIMITEDInventors: Takafumi Hashitani, Sachio Ido, Tsuyoshi Mita, Shigeharu Suzuki