Abstract: A quantum circuit includes: a qubit, a resonant cavity, and a feeder, the resonant cavity being coupled to the qubit, and the feeder being coupled to the qubit. The feeder is configured to feed an initialization signal to the qubit, the initialization signal being a modulation signal used for causing a frequency of the qubit to generate a vibration. The vibration causes an equivalent state exchange to occur between the qubit and the resonant cavity, and an excited state of the qubit is initialized to a ground state by using the resonant cavity.

Abstract: A parity checking method and apparatus for a qubit, a superconducting quantum chip, an electronic device, and a storage medium are provided. The method includes: configuring a measurement system for a qubit excited state measurement environment, the measurement system including: a first data qubit, a second data qubit, and an auxiliary qubit; determining a first operational frequency parameter of the first data qubit; determining a second operational frequency parameter of the second data qubit; determining a third operational frequency parameter of the auxiliary qubit; determining a logic gate matching the qubit excited state measurement environment based on the first operational frequency parameter, the second operational frequency parameter, and the third operational frequency parameter; and checking parity of a qubit in the qubit excited state measurement environment according to the logic gate.

Abstract: This application provides a method for preparing a quantum chip. The method includes the following steps: determining an initial eigenfrequency of a chip substrate; performing, based on a numerical comparison result between the initial eigenfrequency and a quantum operating frequency, pattern etching on a first surface of the chip substrate to obtain a chip substrate with an intact second surface and the first surface with a target pattern, wherein the quantum operating frequency is an operating frequency of a quantum bit of a quantum circuit, the second surface is opposite to the first surface, and the target pattern is a pattern when a difference between the initial eigenfrequency of the chip substrate and the quantum operating frequency is maximum; and etching, on the second surface of the pattern-etched chip substrate, the quantum circuit to form the quantum chip.

Abstract: A parity checking method and apparatus for a qubit, a superconducting quantum chip, an electronic device, and a storage medium are provided. The method includes: configuring a measurement system for a qubit excited state measurement environment, the measurement system including: a first data qubit, a second data qubit, and an auxiliary qubit; determining a first operational frequency parameter of the first data qubit; determining a second operational frequency parameter of the second data qubit; determining a third operational frequency parameter of the auxiliary qubit; determining a logic gate matching the qubit excited state measurement environment based on the first operational frequency parameter, the second operational frequency parameter, and the third operational frequency parameter; and checking parity of a qubit in the qubit excited state measurement environment according to the logic gate.

Abstract: This application relates to a photoresist removal method, including: acquiring a target wafer, a photoresist being provided on a surface of the target wafer, a surface of a photoresist layer of the photoresist being plated with a metal overhead layer; immersing the target wafer in a first organic solvent at a first temperature in a water bath for a first duration; rinsing the target wafer with a new first organic solvent in response to an end of the first duration; performing, in the first organic solvent, ultrasonic cleaning on the rinsed target wafer for a second duration based on a target ultrasonic power; removing the residual first organic solvent on the surface of the target wafer in response to an end of the second duration; and drying the target wafer with the solvent removed by simultaneous centrifugal drying and gas purging to obtain the target wafer with the photoresist removed.

Abstract: A quantum circuit includes: a qubit, a resonant cavity, and a feeder, the resonant cavity being coupled to the qubit, and the feeder being coupled to the qubit. The feeder is configured to feed an initialization signal to the qubit, the initialization signal being a modulation signal used for causing a frequency of the qubit to generate a vibration. The vibration causes an equivalent state exchange to occur between the qubit and the resonant cavity, and an excited state of the qubit is initialized to a ground state by using the resonant cavity.

Abstract: A superconducting quantum hybrid system includes: a silicon carbide (SiC) epitaxial layer; and a superconducting qubit line, the superconducting qubit line corresponding to a superconducting qubit, where a designated region of the SiC epitaxial layer includes a nitrogen vacancy (NV) center, the NV center being formed by implanting nitrogen ions into the designated region of the SiC epitaxial layer, and where the superconducting qubit line is located on a surface of the SiC epitaxial layer, the superconducting qubit is coupled to a solid-state defect qubit, and the solid-state defect qubit is a qubit corresponding to the NV center in the designated region.

Abstract: A manufacturing method for an air bridge structure includes forming a first photoresist structure on a substrate. The first photoresist structure includes a first opening that reveals the substrate. The manufacturing method further includes forming a bridge supporting structure on the substrate by depositing an inorganic bridge supporting material on the substrate based on the first opening in the first photoresist structure, and stripping the first photoresist structure after the deposition. Then, the manufacturing method includes forming a second photoresist structure on the substrate. The second photoresist structure includes at least a second opening that reveals at least a portion of the bridge supporting structure on the substrate. Then, the method include forming the air bridge structure by depositing an air bridge material on the substrate based on the second opening and stripping the second photoresist structure after the deposition. Further, the bridge supporting structure can be removed.

Abstract: This disclosure includes a method for fabricating an air bridge, an air bridge structure, and a superconducting quantum chip, and relates to the field of circuit structures. In some examples, a method for fabricating an air bridge includes forming an air bridge brace structure on a substrate, and forming, on the air bridge brace structure and the substrate, an air bridge material layer with one or more openings in the air bridge material layer that reveal the air bridge brace structure. The air bridge material layer with the one or more openings is formed based on a patterned photoresist layer with patterns corresponding to the one or more openings. The method further includes removing, based on the one or more openings in the air bridge material layer, the air bridge brace structure to obtain the air bridge having the one or more openings.

Abstract: This application discloses methods and devices for a quantum chip, a quantum processor and a quantum computer, and relates to the field of quantum technology. The quantum chip includes a bottom sheet and a top sheet; a qubit array disposed on the top sheet, the qubit array comprising a plurality of qubits distributed in an array structure of M rows by N columns, and M and N being both integers greater than 1; a reading cavity disposed on the bottom sheet, and the reading cavity being configured to acquire status information of a qubit in the qubit array; and the bottom sheet and the top sheet being electrically connected.