Abstract: The present disclosure is directed to a vertical-channel semiconductor device. For manufacturing the vertical-channel semiconductor device, starting from a work wafer having a first side and a second side opposite to the first side along a direction, a first doped region is formed in the work wafer, from the second side of the work wafer. The work wafer has a first conductivity type and a first doping level, the first doped region has the first conductivity type and a second doping level higher than the first doping level. A device active region having a channel region extending in the direction is formed in the work wafer, on the first side of the work wafer. The first doped region and the device active region delimit, in the work wafer, a drift region. The first doped region is formed before the device active region.

Abstract: An integrated electronic device forming a power device and including: a semiconductor body; a first conductive region and a second conductive region, which extend over the semiconductor body, the second conductive region surrounding the first conductive region at a distance; and an edge termination structure, which is arranged between the first and second conductive regions and includes a dielectric region, which delimits an active area of the power device, and a semiconductive structure, which extends over the dielectric region and includes a plurality of diode chains, each diode chain including a plurality of first semiconductive regions of a first conductivity type and a plurality of second semiconductive regions of a second conductivity type, the first and second semiconductive regions being arranged in alternating fashion so as to form a series circuit including a plurality of first and second diodes, which are spaced apart from one another and have opposite orientations.

Abstract: An integrated electronic device forming a power device and including: a semiconductor body; a first conductive region and a second conductive region, which extend over the semiconductor body, the second conductive region surrounding the first conductive region at a distance; and an edge termination structure, which is arranged between the first and second conductive regions and includes a dielectric region, which delimits an active area of the power device, and a semiconductive structure, which extends over the dielectric region and includes a plurality of diode chains, each diode chain including a plurality of first semiconductive regions of a first conductivity type and a plurality of second semiconductive regions of a second conductivity type, the first and second semiconductive regions being arranged in alternating fashion so as to form a series circuit including a plurality of first and second diodes, which are spaced apart from one another and have opposite orientations.

Abstract: A vertical channel semiconductor device including: a semiconductor body including a substrate having a first conductivity type and a front layer having a second conductivity type; a first portion of trench and a second portion of trench; and, within the first and second portions of trench, a corresponding conductive region and a corresponding insulating layer. The first and second portions of trench delimit laterally a first semiconductor region and a second semiconductor region, the first semiconductor region having a maximum width greater than the maximum width of the second semiconductor region. The device further includes an emitter region having the first conductivity type, which extends in the front layer and includes: a full portion, which extends in the second semiconductor region; and an annular portion, which extends in the first semiconductor region. The annular portion laterally surrounds a top region having the second conductivity type.

Abstract: A vertical channel semiconductor device including: a semiconductor body including a substrate having a first conductivity type and a front layer having a second conductivity type; a first portion of trench and a second portion of trench; and, within the first and second portions of trench, a corresponding conductive region and a corresponding insulating layer. The first and second portions of trench delimit laterally a first semiconductor region and a second semiconductor region, the first semiconductor region having a maximum width greater than the maximum width of the second semiconductor region. The device further includes an emitter region having the first conductivity type, which extends in the front layer and includes: a full portion, which extends in the second semiconductor region; and an annular portion, which extends in the first semiconductor region. The annular portion laterally surrounds a top region having the second conductivity type.

Abstract: A field-effect transistor is integrated in a chip of semiconductor material of a first type of conductivity, which has a first main surface and a second main surface, opposite to each other. The transistor includes a plurality of body regions of a second type of conductivity, each one extending from the second main surface in the chip. A plurality of drain columns of the second type of conductivity are provided, each one extending from a body region towards the first main surface, at a pre-defined distance from the first main surface. A plurality of drain columns are defined in the chip, each one extending longitudinally between a pair of adjacent drain columns. The transistor includes a plurality of source regions of the first type of conductivity, each one of them extending from the second main surface in a body region; a plurality of channel areas are defined, each one in a body region between a source region of the body region and each drain channel adjacent to the body region.

Abstract: An insulated gate semiconductor device, comprising: a semiconductor body having a front side and a back side opposite to one another; a drift region, which extends in the semiconductor body and has a first type of conductivity and a first doping value; a body region having a second type of conductivity, which extends in the drift region facing the front side of the semiconductor body; a source region, which extends in the body region and has the first type of conductivity; and a buried region having the second type of conductivity, which extends in the drift region at a distance from the body region and at least partially aligned to the body region in a direction orthogonal to the front side and to the back side.

Abstract: An insulated gate semiconductor device, comprising: a semiconductor body having a front side and a back side opposite to one another; a drift region, which extends in the semiconductor body and has a first type of conductivity and a first doping value; a body region having a second type of conductivity, which extends in the drift region facing the front side of the semiconductor body; a source region, which extends in the body region and has the first type of conductivity; and a buried region having the second type of conductivity, which extends in the drift region at a distance from the body region and at least partially aligned to the body region in a direction orthogonal to the front side and to the back side.

Abstract: A MOS-type power device having a drain terminal, a source terminal, and a gate terminal; and a protection circuit having a first conduction terminal connected to the gate terminal, via a diffused resistor, and a second conduction terminal connected to the source terminal. The protection circuit has a resistance variable between a first value and a second value according to the operating condition of the power device. In a first embodiment of the protection circuit, an ON-OFF switch made by means of a horizontal MOS transistor has a control terminal connected to the drain terminal of the power device. In a second embodiment of the protection circuit, the ON-OFF switch is replaced with a gradual-intervention switch made by means of a P-channel JFET transistor having a control terminal connected to the gate terminal of the power device.

Abstract: A MOS-type power device having a drain terminal, a source terminal, and a gate terminal; and a protection circuit having a first conduction terminal connected to the gate terminal, via a diffused resistor, and a second conduction terminal connected to the source terminal. The protection circuit has a resistance variable between a first value and a second value according to the operating condition of the power device. In a first embodiment of the protection circuit, an ON-OFF switch made by means of a horizontal MOS transistor has a control terminal connected to the drain terminal of the power device. In a second embodiment of the protection circuit, the ON-OFF switch is replaced with a gradual-intervention switch made by means of a P-channel JFET transistor having a control terminal connected to the gate terminal of the power device.