Abstract: A negative-working lithographic printing plate precursor includes a support and a coating containing a photopolymerisable layer; characterised in that the coating includes a compound including at least one moiety having a structure according to Formula (I) at a level above 10% wt and below 40% wt relative to the total dry weight of the ingredients of the coating: wherein n represents an integer equal to 0 or 1; L1 represents a divalent linking group; with the proviso that the carbonyl groups in Formula (I) are bonded to a carbon atom.

Abstract: A method of making a lithographic printing plate comprising the steps of a) image-wise exposing a lithographic printing plate precursor, including a support including a hydrophilic surface or a hydrophilic layer and, thereon, a light or heat sensitive coating including a photopolymerisable composition, b) processing the precursor, consecutively, with a first solution and a second solution, to remove the coating from the support in the non-printing areas, wherein the first and second solutions are provided by a cascade system, the second solution overflows into the first solution and the first solution overflows into a container to be further treated as waste, the second solution is regenerated by adding a replenishing solution or a mixture of replenishing solutions at a rate of at least 5 ml/m2 of treated precursor and at most 100 ml/m2 of treated precursor, the first and second solutions are circulated respectively by a first and second liquid conveying system, the first solution present in the first liquid

Abstract: A negative-working lithographic printing plate precursor includes a coating containing a photopolymerizable layer and optionally an intermediate layer between the photopolymerizable layer and the support, wherein the coating further includes a polysiloxane, the polysiloxane being present in the photopolymerizable layer and/or in the optional intermediate layer, and the polysiloxane is obtained by reacting at least one organosilicon compound represented by the general Formula (I) and at least one organosilicon compound represented by the general Formula (II):

Abstract: A polymeric stabilizer is produced by copolymerizing an unsaturated polyether with an unsaturated low molecular weight monomer in a controlled radical polymerization. The polymeric stabilizer is useful for producing polymer polyol products via a mechanical dispersion process or an in situ polymerization process.

Abstract: A process For the production of a thermoplastic polymer including carbon and sulphur in an atomic ration of C:S of at least 4 and at most 36 using thiol-ene addition polymerization, preferably with feedstocks obtained from renewable resources such as fatty acids from vegetable origin. The product is preferably aliphatic, meaning that at most 70% of the protons are present as aromatic hydrogen atoms and, if oxygen atoms are present in ester functions, the atomic ratio of the oxygen atoms present in ester functions relative to the number of sulphur atoms in the polymer is less than 1.0. The polymer may be used to produce a shaped article.

Abstract: The present application relates to methods for producing materials having viable micro-organisms incorporated therein. More particularly, the materials are produced under high temperature and/or high pressure conditions, and the microganisms are incorporated in the material before or during these conditions. Also provided are micro-organisms that remain viable under these conditions and have different applications, depending on the nature of the material.