Patents by Inventor Sang-II Han

Sang-II Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8592099
    Abstract: A membrane-electrode assembly for a fuel cell includes an anode and a cathode facing each other and a polymer electrolyte membrane interposed therebetween. At least one of the anode and the cathode includes a conductive electrode substrate and a catalyst layer formed thereon, and the catalyst layer includes a first catalyst layer including a first metal catalyst that grows from the polymer electrolyte membrane toward the electrode substrate and a second catalyst layer including a second metal catalyst covering the first catalyst layer.
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: November 26, 2013
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sang-II Han, In-Hyuk Son
  • Publication number: 20130059210
    Abstract: An electrolyte for a rechargeable lithium battery and rechargeable lithium battery including the same is provided. The electrolyte includes a film-forming compound; a lithium salt; and an organic solvent.
    Type: Application
    Filed: May 2, 2012
    Publication date: March 7, 2013
    Applicant: SAMSUNG SDI CO., LTD.
    Inventors: Jung-Yi YU, Woo-Cheol SHIN, Sang-II HAN, Mi-Hyun LEE, Tae-Hyun BAE
  • Publication number: 20130017461
    Abstract: An electrode for a fuel cell is disclosed. The electrode may include an electrode substrate with a conductive substrate, carbon particles, and a catalyst layer disposed on the electrode substrate. The electrode substrate may include a pore having an average diameter of about 20 ?m to about 40 ?m and porosity of about 30 volume % to about 80 volume % based on the total volume of the electrode substrate. A membrane-electrode assembly including the electrode and a fuel cell system including the membrane electrode assembly are also disclosed.
    Type: Application
    Filed: December 29, 2011
    Publication date: January 17, 2013
    Applicant: SAMSUNG SDI CO., LTD.
    Inventors: Sang-II HAN, Kah-Young SONG, Hee-Tak KIM, Sung-Yong CHO, Tae-Yoon KIM, Myoung-Ki MIN, Geun-Seok CHAI
  • Publication number: 20110305968
    Abstract: A fuel cell stack includes: a plurality of membrane-electrode assemblies; first and second end plates respectively positioned outside outermost ones of the membrane-electrode assemblies; and a plurality of separators respectively positioned between the membrane-electrode assemblies and between the outermost ones of the membrane-electrode assemblies and the first and second end plates. The first end plate includes an oxidizing agent inlet, an oxidizing agent outlet, and a moisture supplying flow path connecting the oxidizing agent inlet and the oxidizing agent outlet. The moisture supplying flow path includes a first end portion adjacent to the oxidizing agent outlet and a second end portion adjacent to the oxidizing agent inlet, the first end portion being larger than the second end portion and being a different distance away from a surface of the first end plate facing away from the second end plate than the second end portion.
    Type: Application
    Filed: December 29, 2010
    Publication date: December 15, 2011
    Inventors: Jin-Hwa LEE, Chi-Seung Lee, Seong-Jin An, Sang-II Han, Kah-Young Song
  • Patent number: 6667253
    Abstract: An alignment mark and an exposure alignment system and method using the alignment mark for aligning wafers are described. The alignment mark is formed of a plurality of mesa or trench type unit marks that are aligned in an inline pattern within an underlying layer under a layer to which a chemical mechanical polishing process is applied to form an alignment signal during an alignment process, thereby preventing a dishing phenomenon caused by the chemical mechanical process.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: December 23, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won Song, Seong-II Kim, Sang-II Han, Chang-Hoon Lee, Choung-Hee Kim
  • Publication number: 20020094679
    Abstract: An alignment mark and an exposure alignment system and method using the alignment mark for aligning wafers are described. The alignment mark is formed of a plurality of mesa or trench type unit marks that are aligned in an inline pattern within an underlying layer under a layer to which a chemical mechanical polishing process is applied to form an alignment signal during an alignment process, thereby preventing a dishing phenomenon caused by the chemical mechanical process.
    Type: Application
    Filed: July 16, 2001
    Publication date: July 18, 2002
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Won Song, Seong-II Kim, Sang-II Han, Chang-Hoon Lee, Choung-Hee Kim