Patents by Inventor Sang-Wha Lee

Sang-Wha Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8457014
    Abstract: Provided is a method for configuring a control tunnel and a direct tunnel in an IPv4 network-based IPv6 service providing system. To provide IPv6 service, when a random request terminal receives a tunnel response message from a control server by using service information downloaded from a portal server at the time of initialization, the request terminal configures a control tunnel with the control server, and is registered to the control server. The request terminal transmits and receives a direct tunnel request message and a direct tunnel response message with a counterpart terminal by using its terminal information learned during the control tunnel configuration, i.e., network position information and status information, thereby configuring a direct tunnel. Thus, IPv6 communication is made through IPv4 based IPv6 tunneling, so that IPv6 application services that are not yet widely used can easily come into wide use.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: June 4, 2013
    Assignees: Electronics and Telecommunications Research Institute, Mobileconvergence Co., Ltd.
    Inventors: Sun Cheul Kim, Sung Back Hong, Kyeong Ho Lee, Kyung Pyo Jun, Sang Wha Lee
  • Publication number: 20100008260
    Abstract: Provided is a method for configuring a control tunnel and a direct tunnel in an IPv4 network-based IPv6 service providing system. To provide IPv6 service, when a random request terminal receives a tunnel response message from a control server by using service information downloaded from a portal server at the time of initialization, the request terminal configures a control tunnel with the control server, and is registered to the control server. The request terminal transmits and receives a direct tunnel request message and a direct tunnel response message with a counterpart terminal by using its terminal information learned during the control tunnel configuration, i.e., network position information and status information, thereby configuring a direct tunnel. Thus, IPv6 communication is made through IPv4 based IPv6 tunneling, so that IPv6 application services that are not yet widely used can easily come into wide use.
    Type: Application
    Filed: November 30, 2007
    Publication date: January 14, 2010
    Inventors: Sun Cheul Kim, Sung Back Hong, Kveong Ho Lee, Kyung Pyo Jun, Sang Wha Lee
  • Publication number: 20040248085
    Abstract: The presence of diverse human Papillomavirus genotypes in a sample can be detected by 1 cycle of polymerase chain reaction using primers. The primers used in the method are general primers which can bind complementarily to specific nucleic acid sequences of all HPV genotypes related to cervical carcinoma and its pre-stage lesions and can be used to amplify cervical-neoplasia related HPV genotypes including oncogenic high-risk groups and low-risk groups.
    Type: Application
    Filed: November 24, 2003
    Publication date: December 9, 2004
    Inventors: Sang-Wha Lee, Yeon-Soo Kim, Kang-Yeol Yu, Seung-Jo Kim, Kwang-Yul Cha, Jung-Jae Ko
  • Patent number: 6748672
    Abstract: A wafer dryer for use in a semiconductor cleaning apparatus includes an internal bath, an external bath, a solution supply line, a solution drain line, a pump, and drying means. The solution drain line has a first drain line and a second drain line. A pump for constantly maintaining a speed of a drained solution is installed on the first drain line. The drying means has an isopropyl alcohol (IPA) nozzle, a first gas spray nozzle for spraying N2 gas, and a second spray nozzle. The second spray nozzle is installed on all inner sidewalls of the external bath and has a plurality of holes. Thus, no wave is produced at a surface of the drained solution.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: June 15, 2004
    Assignee: DNS Korea Co., Ltd.
    Inventors: Sung-Hee Lee, Sang-Wha Lee
  • Publication number: 20030101618
    Abstract: A wafer dryer for use in a semiconductor cleaning apparatus includes an internal bath, an external bath, a solution supply line, a solution drain line, a pump, and drying means. The solution drain line has a first drain line and a second drain line. A pump for constantly maintaining a speed of a drained solution is installed on the first drain line. The drying means has an isopropyl alcohol (IPA) nozzle, a first gas spray nozzle for spraying N2 gas, and a second spray nozzle. The second spray nozzle is installed on all inner sidewalls of the external bath and has a plurality of holes. Thus, no wave is produced at a surface of the drained solution.
    Type: Application
    Filed: November 27, 2002
    Publication date: June 5, 2003
    Applicant: DNS KOREA CO., LTD
    Inventors: Sung-Hee Lee, Sang-Wha Lee