Abstract: The present invention provides positive-tone and negative-tone photoresists including a photoinitiator comprising a compound of Formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are independently selected from C.sub.1 -C.sub.6 alkyl; n is a number from 2 to 5, and An.sup.- is an anion. The photoinitiator comprising the compound of Formula (I) being soluble in water. Methods of preparing positive-tone and negative-tone photoresists are also provided.

Abstract: A photoresist composition comprises a polymer of the following formula (1): ##STR1## wherein R.sup.1 is a substituted or unsubstituted aromatic group or --(CH.sub.2).sub.p --SiR.sup.3 wherein R.sup.3 is a methyl or ethyl group and p is equal to 0 or 1, R.sup.2 is a hydrogen atom or methyl group, t-Bu is a tertiary-butyl group, and n/(m+n) is in the range of from 0.1 to 0.9.The polymer of formula (1) can form a positive working two-component photoresist composition with a photoacid generator. The polymer of formula (1) can also be used as an alkali soluble resin and in this regard, form a positive working three-component photoresist composition with a photoacid generator and a dissolution inhibitor having at least one group which is unstable to acid. Alternatively, the polymer of formula (1) can be used as a dissolution inhibitor and in this regard, form a positive working three-component photoresist composition with another alkali soluble resin and a photoacid generator.