Patents by Inventor Sanghuck Jeon

Sanghuck Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay variance stabilization methods and systems
    Patent number: 10691028
    Abstract: Methods and systems for providing overlay corrections are provided. A method may include: selecting an overlay model configured to perform overlay modeling for a wafer; obtaining a first set of modeled results from the overlay model, the first set of modeled results indicating adjustments applicable to a plurality of term coefficients of the overlay model; calculating a significance matrix indicating the significance of the plurality of term coefficients; identifying at least one less significant term coefficient among the plurality of term coefficients based on the calculated significance matrix; obtaining a second set of modeled results from the overlay model, the second set of modeled results indicating adjustments applicable to the plurality of term coefficients except for the identified at least one less significant term coefficient; and providing the second set of modeled results to facilitate overlay correction.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: June 23, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Hoyoung Heo, William Pierson, Jeremy Nabeth, Sanghuck Jeon, Onur N. Demirer, Miguel Garcia-Medina, Soujanya Vuppala
  • Overlay Variance Stabilization Methods and Systems
    Publication number: 20170219928
    Abstract: Methods and systems for providing overlay corrections are provided. A method may include: selecting an overlay model configured to perform overlay modeling for a wafer; obtaining a first set of modeled results from the overlay model, the first set of modeled results indicating adjustments applicable to a plurality of term coefficients of the overlay model; calculating a significance matrix indicating the significance of the plurality of term coefficients; identifying at least one less significant term coefficient among the plurality of term coefficients based on the calculated significance matrix; obtaining a second set of modeled results from the overlay model, the second set of modeled results indicating adjustments applicable to the plurality of term coefficients except for the identified at least one less significant term coefficient; and providing the second set of modeled results to facilitate overlay correction.
    Type: Application
    Filed: September 2, 2016
    Publication date: August 3, 2017
    Inventors: Hoyoung Heo, William Pierson, Jeremy Nabeth, Sanghuck Jeon, Onur N. Demirer, Miguel Garcia-Medina, Soujanya Vuppala