Abstract: A liquid personal cleansing composition comprising: (a) from about 1% to about 15% by weight of short chain alkyl sulphate surfactant having an average from 8 to 10 carbon atoms on the alkyl chain and mixtures thereof; (b) from about 1% to about 15% by weight of C.sub.12 to C.sub.22 alkyl ethoxy sulphate surfactant having an average degree of ethoxylation of from about 1 to about 6; (c) from about 0.1% to about 10% of water-soluble auxiliary surfactant selected from anionic surfactant other than C.sub.8 to C.sub.10 alkyl sulphate, nonionic, zwitterionic and amphoteric and mixtures thereof; and optionally (d) from about 0.01% to about 5% of cationic conditioning polymer; and (e) water; wherein the ratio of short chain alkyl sulphate to alkyl ethoxy sulphate is in the range of from about 1:3 to about 3:1, more preferably from about 2:1 to about 1:2.