Patents by Inventor Sarah L. WHITE

Sarah L. WHITE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for calibrating concentration sensors for precursor delivery
    Patent number: 11718912
    Abstract: Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor; a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.
    Type: Grant
    Filed: July 17, 2020
    Date of Patent: August 8, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sarah L. White, Elaina Noelle Babayan, Weize Hu
  • Methods and apparatus for calibrating concentration sensors for precursor delivery
    Patent number: 11668007
    Abstract: Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor; a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.
    Type: Grant
    Filed: July 17, 2020
    Date of Patent: June 6, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sarah L. White, Elaina Noelle Babayan, Weize Hu
  • METHODS AND APPARATUS FOR CALIBRATING CONCENTRATION SENSORS FOR PRECURSOR DELIVERY
    Publication number: 20210032751
    Abstract: Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.
    Type: Application
    Filed: July 17, 2020
    Publication date: February 4, 2021
    Inventors: Sarah L. WHITE, Elaina Noelle BABAYAN, Weize HU