Patents by Inventor Saswati Ghosal

Saswati Ghosal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070259860
    Abstract: The present invention is directed to novel compounds, to a process for their preparation, their use in therapy and pharmaceutical compositions comprising the novel compounds.
    Type: Application
    Filed: April 25, 2007
    Publication date: November 8, 2007
    Applicants: AstraZeneca AB, NPS PHARMACEUTICALS, INC.
    Inventors: Andreas Wallberg, Karolina Nilsson, Kenneth Granberg, Saswati Ghosal, Abdelmalik Slassi, Louise Edwards, Methvin Isaac, Tao Xin, Tomislav Stefanac, Peter Dove
  • Patent number: 7129008
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: October 31, 2006
    Assignee: Laser Photonics Technology Inc.
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Publication number: 20040033423
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMS) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Application
    Filed: June 12, 2003
    Publication date: February 19, 2004
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Publication number: 20020068225
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Application
    Filed: November 16, 2001
    Publication date: June 6, 2002
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Patent number: 6344297
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: February 5, 2002
    Assignee: Laser Photonics Technology Inc.
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka