Patents by Inventor Satoru Hanyu

Satoru Hanyu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8992740
    Abstract: An IBAD apparatus includes, a target, a sputter ion source irradiating the target with sputter ions to sputter some of constituent particles of the target, a film formation region in which a base material for depositing thereon the particles sputtered from the target is disposed, and an assist ion beam irradiation device irradiating assist ion beams from a direction oblique to the direction of a normal of the film formation surface of the base material disposed in the film formation region, where the sputter ion source includes a plurality of ion guns arranged so as to be able to irradiate the target from an end portion on one side to an end portion on the other side with sputter ion beams, and current values for generating the sputter ion beams of the plurality of ion guns are set respectively.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: March 31, 2015
    Assignee: Fujikura Ltd.
    Inventors: Satoru Hanyu, Yasuhiro Iijima
  • Patent number: 8420575
    Abstract: A method of forming an underlying layer of an alignment film for an oxide superconducting conductor, includes arranging two or more kinds of targets along a lengthwise direction of a base material so as to face a surface of the base material; simultaneously irradiating an ion beam on surfaces of the two or more kinds of targets to deposit constituent particles of the targets on the surface of the base material in the order of the arrangement of the two or more kinds of targets; and forming a laminate in which two or more kinds of thin films are repeatedly laminated on the surface of the base material by passing the base material through a deposition region of the constituent particles a plurality of times so that the constituent particles of the targets are repeatedly deposited on the surface of the base material at each passage.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: April 16, 2013
    Assignee: Fujikura Ltd.
    Inventors: Satoru Hanyu, Yasuhiro Iijima
  • Patent number: 8299363
    Abstract: An object of the invention is to provide a polycrystalline thin film which includes an intermediate layer that is made thinner while keeping high crystal orientation so as to prevent warpage of a substrate resulting from internal stress of the film. A polycrystalline thin film according to the invention includes an intermediate layer formed by a first layer and a second layer laminated in this order and provided on a metal substrate. The first layer has a rock-salt crystal structure and the second layer has a fluorite crystal structure.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: October 30, 2012
    Assignees: Fujikura Ltd., The Juridical International Superconductivity Technology Center
    Inventors: Yasuhiro Iijima, Satoru Hanyu
  • Publication number: 20120228130
    Abstract: An IBAD apparatus includes, a target, a sputter ion source irradiating the target with sputter ions to sputter some of constituent particles of the target, a film formation region in which a base material for depositing thereon the particles sputtered from the target is disposed, and an assist ion beam irradiation device irradiating assist ion beams from a direction oblique to the direction of a normal of the film formation surface of the base material disposed in the film formation region, where the sputter ion source includes a plurality of ion guns arranged so as to be able to irradiate the target from an end portion on one side to an end portion on the other side with sputter ion beams, and current values for generating the sputter ion beams of the plurality of ion guns are set respectively.
    Type: Application
    Filed: April 5, 2012
    Publication date: September 13, 2012
    Applicant: FUJIKURA LTD.
    Inventors: Satoru Hanyu, Yasuhiro Iijima
  • Publication number: 20120196752
    Abstract: A method of forming an underlying layer of an alignment film for an oxide superconducting conductor, includes arranging two or more kinds of targets along a lengthwise direction of a base material so as to face a surface of the base material; simultaneously irradiating an ion beam on surfaces of the two or more kinds of targets to deposit constituent particles of the targets on the surface of the base material in the order of the arrangement of the two or more kinds of targets; and forming a laminate in which two or more kinds of thin films are repeatedly laminated on the surface of the base material by passing the base material through a deposition region of the constituent particles a plurality of times so that the constituent particles of the targets are repeatedly deposited on the surface of the base material at each passage.
    Type: Application
    Filed: April 5, 2012
    Publication date: August 2, 2012
    Applicant: FUJIKURA LTD.
    Inventors: Satoru HANYU, Yasuhiro IIJIMA
  • Publication number: 20100012349
    Abstract: An object of the invention is to provide a polycrystalline thin film which includes an intermediate layer that is made thinner while keeping high crystal orientation so as to prevent warpage of a substrate resulting from internal stress of the film. A polycrystalline thin film according to the invention includes an intermediate layer formed by a first layer and a second layer laminated in this order and provided on a metal substrate. The first layer has a rock-salt crystal structure and the second layer has a fluorite crystal structure.
    Type: Application
    Filed: September 29, 2009
    Publication date: January 21, 2010
    Applicants: Fujikara Ltd., International Superconductivity Technology Center
    Inventors: Yasuhiro IIJIMA, Satoru Hanyu