Abstract: A wafer chuck assembly includes a puck, a shaft and a base. An insulating material defines a top surface of the puck, a heater element is embedded within the insulating material, and a conductive plate lies beneath the insulating material. The shaft includes a housing coupled with the plate, and electrical connectors for the heater elements and the electrodes. A conductive base housing couples with the shaft housing, and the connectors pass through a terminal block within the base housing. A method of plasma processing includes loading a workpiece onto a chuck having an insulating top surface, providing a DC voltage differential across two electrodes within the top surface, heating the chuck by passing current through heater elements, providing process gases in a chamber surrounding the chuck, and providing an RF voltage between a conductive plate beneath the chuck, and one or more walls of the chamber.

Abstract: The present invention relates to alumina flakes having a defined thickness and particle size distribution and to their use in varnishes, paints, automotive coatings printing inks, masterbatches, plastics and cosmetic formulations and as substrate for effect pigments. and organic dyes.

Abstract: Alpha-Alumina flakes having a particle thickness of 550-1000 nm, a D50-value of 15-30 ?m, a D90-value of 30-45 ?m and a D10-value of ?9.0 ?m. Use of the alumina flakes in varnishes, paints, automotive coatings printing inks, masterbatches, plastics and cosmetic formulations. Also, use of the alumina flakes as a substrate for effect pigments and in organic dyes.

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

Abstract: The present invention relates to alumina flakes having a defined thickness and particle size distribution and to their use in varnishes, paints, automotive coatings printing inks, masterbatches, plastics and cosmetic formulations and as substrate for effect pigments. and organic dyes.

Abstract: A rotating microwave is established for any resonant mode TEmnl or TMmnl of a cavity, where the user is free to choose the values of the mode indices m, n and l. The fast rotation, the rotation frequency of which is equal to an operational microwave frequency, is accomplished by setting the temporal phase difference ?Ø and the azimuthal angle ?? between two microwave input ports P and Q as functions of m, n and l. The slow rotation of frequency ?a (typically 1-1000 Hz), is established by transforming dual field inputs ? cos ?at and ±? sin ?at in the orthogonal input system into an oblique system defined by the angle ?? between two microwave ports P and Q.

Abstract: A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.

Abstract: A method, system, and apparatus for reducing particle generation on a showerhead during an ion bombarding process in a process chamber are provided. First and second RF signals are supplied from an RF generator to an electrode embedded in a substrate support in the process chamber. The second RF signal is adjusted relative to the first RF signal in response to a measurement of a first RF amplitude, a second RF amplitude, a first RF phase, and a second RF phase. Ion bombardment on a substrate is maximized and the quantity of particles generated on the showerhead is minimized. Methods and systems described herein provide for improved ion etching characteristics while reducing the amount of debris particles generated from the showerhead.

Abstract: A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first conductive plate, and a second conductive plate, coupled with the housing, between the waveguide cavity and the process chamber. Electromagnetic radiation can propagate from the waveguide cavity into the process chamber through apertures in the second conductive plate. The system also includes a dielectric plate that seals off the process chamber from the waveguide cavity, and one or more electronics sets that transmit the electromagnetic radiation into the waveguide cavity. A plasma forms when at least one process gas is within the chamber, and the electromagnetic radiation propagates into the process chamber from the waveguide cavity.

Abstract: Exemplary magnetic induction plasma systems for generating plasma products are provided. The magnetic induction plasma system may include a first plasma source including a plurality of first sections and a plurality of second sections arranged in an alternating manner and fluidly coupled with each other such that at least a portion of plasma products generated inside the first plasma source may circulate through at least one of the plurality of first sections and at least one of the plurality of second sections inside the first plasma source. Each of the plurality of second sections may include a dielectric material. The system may further include a plurality of first magnetic elements each of which may define a closed loop. Each of the plurality of second sections may define a plurality of recesses for receiving one of the plurality of first magnetic elements therein.

Abstract: An image processing apparatus configured to detect a moving subject region includes a likelihood generation unit, a similarity detection unit, and a correction unit. The likelihood generation unit detects a motion of a region in an image and, based on at least two input images, generates a moving subject likelihood for each region. The similarity detection unit detects a similarity between a target region and a peripheral region of the target region for at least one of the input images. The correction unit corrects the moving subject likelihood of the target region based on the detected similarity and the generated moving subject likelihood of the peripheral region. The moving subject region is detected based on the corrected moving subject likelihood.

Abstract: A liquid ejecting apparatus includes: a liquid ejecting unit that ejects, to a target, a liquid which is supplied from a liquid supply source via a liquid supply channel; a carriage on which the liquid ejecting unit is mounted and which moves with respect to the target; a gas containing chamber mounted on the carriage; and a pump that is disposed outside the carriage of the liquid ejecting apparatus and sends gas out to one system of a gas channel connected to the gas containing chamber and suctions gas from the gas channel.

Abstract: A rotating microwave is established for any resonant mode TEmnl or TMmnl of a cavity, where the user is free to choose the values of the mode indices m, n and l. The fast rotation, the rotation frequency of which is equal to an operational microwave frequency, is accomplished by setting the temporal phase difference ?Ø and the azimuthal angle ?? between two microwave input ports P and Q as functions of m, n and l. The slow rotation of frequency ?? (typically 1-1000 Hz), is established by transforming dual field inputs ? cos ??t and ±? sin ??t in the orthogonal input system into an oblique system defined by the angle ?? between two microwave ports P and Q.

Abstract: Plasma is generated in a semiconductor process chamber by a plurality of microwave inputs with slow or fast rotation. Radial uniformity of the plasma is controlled by regulating the power ratio of a center-high mode and an edge-high mode of the plurality of microwave inputs into a microwave cavity. The radial uniformity of the generated plasma in a plasma chamber is attained by adjusting the power ratio for the two modes without inputting time-splitting parameters for each mode.

Abstract: The present invention provides an agent for the prophylactic or treatment of diabetes, diabetic complications, insulin resistance syndrome, metabolic syndrome, hyperglycemia, dyslipidemia, atherosclerosis, cardiac failure, cardiomyopathy, myocardial ischemia, brain ischemia, cerebral apoplexy, pulmonary hypertension, hyperlactacidemia, mitochondrial disease, mitochondrial encephalomyopathy or cancer, namely, a PDHK inhibitor and the like. A compound represented by the following formula [I] or a pharmaceutically acceptable salt thereof, or a solvate thereof: wherein each symbol is as defined in the specification.

Abstract: An image processing apparatus comprises: a colored level calculation unit configured to calculate, for a first region in an image, an index indicating a strength of color; a feature amount calculation unit configured to calculate a first feature amount relating to luminance components in each of the first region and a second region, and a second feature amount relating to color components in the regions; an interest level calculation unit configured to calculate an interest level for the first region based on a difference for the first feature amount between the regions, a difference for the second feature amount between the regions, and an importance for each of the differences; and a region of interest detection unit; wherein the interest level calculation unit determines the importance for the differences based on the index.

Abstract: A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.

Abstract: Materials and methods for treatment of pulmonary bulla are provided. A peptide comprising between about 7 amino acids and about 32 amino acids in a solution may be introduced to a target site. A hydrogel barrier may be provided at the target site in order to treat the pulmonary bulla.

Abstract: Methods and materials for mitigating biological tissue adhesion are described herein. One method for mitigating adhesion to a biological tissue includes administering an effective amount of a self-assembling peptide solution to the biological tissue, wherein the self-assembling peptide is between about 7 amino acids and 32 amino acids in length and the self-assembling peptide solution forms a hydrogel under physiological conditions.

Abstract: [Problem] To provide a composition for hemostasis that can be applied uniformly to a bleeding site and exerts a high hemostatic effect. [Solution] Provided is a composition to be applied to the subject as a spray, wherein the composition is characterized in that the spray is for hemostasis, and the composition includes a self-assembling peptide, the self-assembling peptide gelling due to self-assembly when the composition is applied to the bleeding site of the subject, and the self-assembling peptide being included in the composition in a concentration having an improved hemostatic capacity in comparison to direct application.