Abstract: The present invention has the object of supplying an alkali-based treating liquid capable of reducing the amount used for treatment and the amount of liquid wastes produced, having an excellent solubility with respect to an exposed organic film such as a photoresist, and an equipment for supplying the same. In a developing liquid supplying equipment of the present invention, a receiving bath is connected to a development treating equipment via a line, and a pre-treating portion such as a filter, an adjusting bath and a leveling bath are sequentially provided in the following stages of the receiving bath. A liquid supplying system and a control device are connected to the adjusting bath, and the concentrations of the dissolved photoresist component and the alkali component in a used liquid can be adjusted to certain values, based on actually measured values obtained with a densitometer. The obtained regenerated liquid is supplied to the development treating equipment through a line.

Abstract: The non-water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a non-water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the MEA concentration in the non-water-based resist stripping liquid and an analyzer that measures the degraded component concentration in the non-water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, an MEA stock liquid, a resist stripping reclaimed liquid, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the non-water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.

Abstract: The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.

Abstract: The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment.

Abstract: The developer producing equipment of the present invention is equipped with a preparation tank to which a developer stock solution and pure water are supplied, and in which these ingredients are agitated, and a leveling tank which is connected to this preparation tank. The leveling tank is connected via piping to working equipment in which electronic circuits are formed. Furthermore, the preparation tank and leveling tank have first and second alkali concentration measuring means for measuring the alkali concentrations of the alkali type developer inside the respective tanks. In the preparation tank, either the amount of developer stock solution that is supplied to the tank or the amount of pure water that is supplied to the tank, or both, are adjusted on the basis of the measured value obtained by the first alkali concentration measuring means, so that an alkali type developer is prepared.

Abstract: A position adjusting apparatus of a control console for a work vehicle in which the control console moves in a state of substantially keeping a relative position with respect to the operator seat prior to a rotation in accordance with the rotation of the operator seat, thereby maintaining a suitable operability, and a maintenance of the vehicle can be performed in an improved manner. Accordingly, a floor frame (20) and a mounting table (26) which mounts a control console (10) are connected to each other via an irregular four section link, and a turn table (12) which is rotatably supported to the floor frame or the operator seat and the mounting table are connected by an interlocking link (15). Accordingly, when an operator seat (11) which is mounted to the turn table rotates, the control console substantially maintains a relative position with respect to the operator seat before the rotation automatically, and can move in a horizontal direction.

Abstract: The modulation characteristic (static characteristic or dynamic characteristic) of a clutch and a brake are changed according to various operating conditions of a vehicle such as a high load driving state, slope traveling state, low engine speed state, and high speed driving state, to enable optimum steering performance that matches each operating condition of the tracklaying vehicle.