Patents by Inventor Satoru Tani

Satoru Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240175823
    Abstract: Provided is a method for inspecting surface deformation of a structure which enables easy measurement of the amount of deformation of the surface of a structure protection sheet attached to the surface of a structure such as concrete. The method for inspecting surface deformation of a structure includes: identifying a structure protection sheet attached to a surface of a structure using an individual identification means; digitally photographing a surface of a resin layer on an outermost surface of the structure protection sheet using a digital photography means; measuring a dimension of the surface of the resin layer based on image data obtained in the digital photography using a dimension measuring means; and calculating an amount of deformation of the surface of the resin layer based on data of the measured dimension using a calculation means.
    Type: Application
    Filed: March 25, 2022
    Publication date: May 30, 2024
    Applicant: KEIWA Incorporated
    Inventors: Satoru Tani, Takahiro Tsuji, Yuki Matsuno, Kosuke Yasuno, Satoshi Shiba, Yu Kariya
  • Publication number: 20190301777
    Abstract: A heat source system includes a heat source machine, a cooling tower side outward path and a cooling tower side return path that are connected to the heat source machine, a load side outward path and a load side return path that are connected to the heat source machine, a heat exchange path provided in one of the load side return path and the cooling tower side outward path, a heat exchanger that performs heat exchange between the heat exchange path and the other one of the load side return path and the cooling tower side outward path, and a heat exchange adjustment valve capable of adjusting a flow rate of the heat exchange path.
    Type: Application
    Filed: December 7, 2017
    Publication date: October 3, 2019
    Applicant: MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD.
    Inventors: Masanobu SAKAI, Satoru TANI, Kiyokazu TSUJI
  • Patent number: 6283903
    Abstract: Disclosed is a conductive rubber roller, comprising a core metal shaft, an ionic conductive layer formed to surround the outer circumferential surface of the core metal shaft and consisting of a high molecular weight elastomer containing an ionic conducting agent or a foamed body of such a high molecular weight elastomer, an electron conductive layer formed to surround the outer circumferential surface of the ionic conductive layer and consisting of a high molecular weight cellular elastomer containing an electron conducting agent or a high molecular weight cellular elastomer containing an electron conducting agent, a toner contamination preventing layer formed to surround the outer circumferential surface of the electron conductive layer, and an insulating annular sealing member mounted to each of both edges of the ionic conductive layer and the electron conductive layer both extending in the longitudinal direction of the metal core wherein a relationship R1>R2>R3, where R1, R2 and R3 denote, respectiv
    Type: Grant
    Filed: December 14, 1999
    Date of Patent: September 4, 2001
    Assignee: Kinoyosha Co., Ltd.
    Inventors: Akio Onuki, Saburo Sonobe, Sadayuki Ishikura, Satoru Tani
  • Patent number: 4624047
    Abstract: A method for fabricating isolated regions for a dielectric isolated complementary integrated circuit which avoids the difficulty of mask alignment and patterning on a deeply etched uneven surface of the substrate by aligning the patterns before etching and thereby forming p-type and n-type islands at the same time. A poly-silicon layer is grown on the surface of the substrate covering the islands and the substrate is removed from its back surface, leaving the islands embedded in the poly-silicon layer which becomes a new substrate.
    Type: Grant
    Filed: October 11, 1984
    Date of Patent: November 25, 1986
    Assignee: Fujitsu Limited
    Inventor: Satoru Tani