Patents by Inventor Satoshi Kakizaki

Satoshi Kakizaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020100417
    Abstract: A heating-type trap device for being fitted in between a film-deposition apparatus and an exhaust piping, and for removing residual film-deposition components from exhaust gases discharged through the exhaust piping from the film-deposition apparatus, includes a trap portion for receiving the exhaust gases, and a plurality of plate heaters disposed within the trap portion, to define a zigzag pathway for the exhaust gases passing therethrough.
    Type: Application
    Filed: June 18, 1999
    Publication date: August 1, 2002
    Inventors: JUN-ICHI SUZUKI, SATOSHI KAKIZAKI
  • Patent number: 5902103
    Abstract: A vertical furnace for use in a semiconductor manufacturing apparatus, which comprises a heater, an outer tube, an inner tube, all being disposed concentrically in a multi-layered fashion, a boat adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover disposed internally of the inner tube concentrically therewith. The boat cover is comprised of a boat cover body and an auxiliary cover plate connected to said boat cover body with a given gap therebetween, the boat cover body having a predetermined number of slit apertures extending in a generator direction thereof, the auxiliary cover plate being disposed to cover the slit apertures. The introduced reactive gas flows in branched streams, one flowing through the inside of the boat cover and the other flowing in past the boat cover, whereby the film deposited on the wafer is improved in uniformity and homogeneity.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: May 11, 1999
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Kiyohiko Maeda, Satoshi Kakizaki, Tomoshi Taniyama, Hidehiro Yanagawa, Ken-ichi Suzaki
  • Patent number: 5387265
    Abstract: In the semiconductor manufacturing apparatus according to the present invention, there are provided a cassette stocker for accommodating wafer cassettes loaded with wafers, a reaction furnace provided with heating means, a reaction gas introducing means for introducing reaction gas into the reaction furnace, a gas discharging means for discharging exhaust gas in the reaction furnace, a boat for supporting wafers, a buffer cassette stocker for storing unprocessed wafers, a boat elevating means for inserting the boat into and retrieving the boat from the reaction furnace, a wafer transfer means for transferring wafers between the boat and the wafer cassette accommodated on the cassette stocker, and a wafer cassette transfer means for transferring wafer cassettes between the buffer cassette stocker and the cassette stocker, and the buffer cassette stocker is enclosed to provide an antioxidation area to prevent natural oxidation of the wafers in standby status.
    Type: Grant
    Filed: October 26, 1992
    Date of Patent: February 7, 1995
    Assignee: Kokusai Electric Co., Ltd.
    Inventors: Satoshi Kakizaki, Toshikazu Karino, Shoichiro Izumi, Mikio Koizumi, Makoto Ozawa, Fumihide Ikeda, Tohru Yoshida, Ryoji Saito