Patents by Inventor Satoshi Momose

Satoshi Momose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask and manufacturing method of an electronic device therewith
    Patent number: 6790564
    Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: September 14, 2004
    Assignee: Renesas Technology Corporation
    Inventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi
  • Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device
    Patent number: 6432790
    Abstract: The reliability of a photomask is improved. The planar shape of a mask substrate 1 of a resist shading mask having a shading pattern composed of a resist film is made circular.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: August 13, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Yoshihiko Okamoto, Masamichi Kobayashi, Satoshi Momose
  • Photomask and manufacturing method of an electronic device therewith
    Publication number: 20020086222
    Abstract: In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask for KrF excimer laser lithography in a short manufacturing time and at a reduced cost. Accordingly, the manufacturing time and the cost for semiconductor integrated circuit devices is reduced.
    Type: Application
    Filed: December 19, 2001
    Publication date: July 4, 2002
    Inventors: Sonoko Migitaka, Tadashi Arai, Tsutomu Araki, Satoshi Momose, Osamu Yamaguchi
  • Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device
    Publication number: 20020052088
    Abstract: The reliability of a photomask is improved. The planar shape of a mask substrate 1 of a resist shading mask having a shading pattern composed of a resist film is made circular.
    Type: Application
    Filed: August 31, 2001
    Publication date: May 2, 2002
    Inventors: Yoshihiko Okamoto, Masamichi Kobayashi, Satoshi Momose