Patents by Inventor Satoshi Watanabe

Satoshi Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11874454
    Abstract: An optical scanning apparatus includes: a light source that emits light; a basic wavefront modulator that performs spatial light phase modulation on incident light on an optical path from the light source to an incident end surface of a fiber, to thereby generate light having a basic wavefront and emit the generated light, the light having the basic wavefront being to be incident on the incident end surface for obtaining, by light emitted from an emission end surface of the fiber, illumination light having a basic intensity distribution; and a two-dimensional intensity distribution control apparatus configured to change the basic intensity distribution by emitting light for causing light in which a phase distribution of the basic wavefront is controlled to be incident on the incident end surface of the fiber.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: January 16, 2024
    Assignee: Evident Corporation
    Inventor: Satoshi Watanabe
  • Publication number: 20230418158
    Abstract: The present invention is a sulfonium salt represented by the following formula (1), wherein “p” represents an integer of 1 to 3; R11 represents a hydrocarbyl group having 1 to 20 carbon atoms; Rf represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; “q” represents an integer of 1 to 4; RALU represents an acid-labile group; “r” represents an integer of 1 to 4; R12 represents a hydrocarbyl group having 1 to 20 carbon atoms; “s” represents an integer of 0 to 4; “t” represents an integer of 0 to 2; Rf and —O—RALU are bonded to adjacent carbon atoms; and X? represents a non-nucleophilic counterion having no polymerizable group.
    Type: Application
    Filed: May 12, 2023
    Publication date: December 28, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro FUKUSHIMA, Satoshi WATANABE, Jun HATAKEYAMA, Keiichi MASUNAGA, Masaaki KOTAKE, Yuta MATSUZAWA
  • Publication number: 20230419112
    Abstract: A data processing method includes an input step S1 of inputting measurement data into a neural network, an estimation step S2 of generating estimation data from the measurement data, a restoration step S3 of generating restoration data from the estimation data, and a calculation step S4 of calculating a confidence level of the estimation data, based on the measurement data and the restoration data. The neural network is a trained model, the measurement data is data obtained by measuring light transmitted through an object, the estimation data is data of a three-dimensional optical characteristic of the object estimated from the measurement data, and the three-dimensional optical characteristic is a refractive index distribution or an absorptance distribution.
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Applicant: Evident Corporation
    Inventors: Toshiro OKAMURA, Satoshi WATANABE
  • Publication number: 20230417664
    Abstract: An estimation system has a memory and a processor. The memory stores first wave front information and second wave front information. The first wave front information is information on the wave front that is obtained based on first illumination light that has passed through an object. The second wave front information is information on the wave front that is obtained based on second illumination light that has passed through the object. The wavelength at which the intensity of the second illumination light is highest is shorter than the wavelength at which the intensity of the first illumination light is highest. The processor performs an estimation process of estimating a three-dimensional optical property of the object. The three-dimensional optical property is a refractive index distribution or an absorbance distribution. The estimation process uses both the first wave front information and the second wave front information.
    Type: Application
    Filed: September 9, 2023
    Publication date: December 28, 2023
    Applicant: Evident Corporation
    Inventor: Satoshi WATANABE
  • Patent number: 11852974
    Abstract: An object of the present invention is to provide a conductive polymer composition which has good filterability and good film formability of a flat film on an electron beam resist and can be suitably used for an antistatic film for electron beam resist writing, showing excellent antistatic property in the electron beam writing process due to the property of low volume resistivity (?·cm), and, reducing an effect on lithography by making an effect of an acid diffused from the film minimum, and further having excellent peelability by H2O or an alkaline developer after writing.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: December 26, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Nagasawa, Keiichi Masunaga, Masaaki Kotake, Satoshi Watanabe
  • Publication number: 20230393466
    Abstract: A chemically amplified negative resist composition comprising (A) an acid generator in the form of a sulfonium salt having formula (A1) or iodonium salt having formula (A2) and (B) a base polymer containing a polymer comprising repeat units having formula (B1) is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with satisfactory LER and fidelity.
    Type: Application
    Filed: May 23, 2023
    Publication date: December 7, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
  • Publication number: 20230393461
    Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher in the form of a sulfonium salt of carboxylic acid having a nitrogen-bearing heterocycle and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, fidelity and dose margin.
    Type: Application
    Filed: May 23, 2023
    Publication date: December 7, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
  • Publication number: 20230392036
    Abstract: Disclosed herein is a method for forming a multilayer coating film by sequentially coating an intermediate coating material composition, a base coating material composition and a clear coating material composition on a metal for a motor vehicle body or resin material and then thermally curing the compositions, where the clear coating material composition is obtained by mixing a main agent (A) and a curing agent (B).
    Type: Application
    Filed: October 13, 2021
    Publication date: December 7, 2023
    Inventors: Takeshi TSUNODA, Tomoyuki OKAMOTO, Satoshi WATANABE, Naoki KURIYAMA, Kouta FUTAMATA, Takeshi GOTOU, Chie MICHIURA
  • Publication number: 20230393470
    Abstract: A chemically amplified negative resist composition is provided comprising (A) a quencher in the form of a sulfonium salt of carboxylic acid having a nitrogen-bearing heterocycle and (B) a base polymer containing a specific polymer. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, fidelity and dose margin.
    Type: Application
    Filed: May 23, 2023
    Publication date: December 7, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
  • Publication number: 20230393465
    Abstract: A chemically amplified positive resist composition is provided comprising (A) an acid generator containing a specific sulfonium salt and/or a specific iodonium salt and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, rectangularity and fidelity.
    Type: Application
    Filed: May 19, 2023
    Publication date: December 7, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Masahiro Fukushima, Masaaki Kotake, Satoshi Watanabe
  • Publication number: 20230370570
    Abstract: A data transmission device includes a transmission processing unit that transmits sensing data of a detection target in response to occurrence of an event that satisfies a condition specified as an event related to the detection target, in which the sensing data is data including type information indicating a type of sensing data, in a case where whether or not the type of sensing data is a specific type is determined, and as a result, the type of sensing data is an unspecific type, the transmission processing unit performs processing of storing unspecific type information indicating that the type of sensing data is an unspecific type in the type information, and generating and transmitting the sensing data including text data in which detection result information indicating a detection result of the detection target by text and type information indicating a data type of the detection result information are stored.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 16, 2023
    Applicant: Sony Semiconductor Solutions Corporation
    Inventors: Yoshimi OGAWA, Munehiro SHIMOMURA, Hideki ANDO, Yoshifumi MITSUI, Hironori MIYOSHI, Yoshihiro KUMAGAI, Kota YONEZAWA, Satoshi WATANABE, Hirotaka ISHIKAWA
  • Publication number: 20230367213
    Abstract: A photomask blank has a resist film which is obtained by coating a chemically amplified positive resist composition comprising a polymer comprising phenolic hydroxy-containing repeat units and repeat units having a carboxy group which is protected with an acid labile group in the form of a tertiary hydrocarbyl group having an electron attractive moiety and/or hydroxy-substituted phenyl moiety bonded to the tertiary carbon, and an organic solvent. The resist film is processed to form a pattern with a high resolution, reduced LER, improved rectangularity, and pattern fidelity.
    Type: Application
    Filed: May 9, 2023
    Publication date: November 16, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Jun Hatakeyama, Satoshi Watanabe, Kenji Funatsu, Masahiro Fukushima, Masaaki Kotake
  • Publication number: 20230368049
    Abstract: Functions can be flexibly changed according to various use cases. An information processing system according to an embodiment includes a sensor data acquisition unit that acquires sensing data acquired by a sensor, a processing unit including an inference unit that executes inference using the sensing data as an input, and a switching unit that switches the inference unit according to a use case.
    Type: Application
    Filed: September 3, 2021
    Publication date: November 16, 2023
    Inventors: Munehiro Shimomura, Hironori Miyoshi, Yoshimi Ogawa, Yoshihiro Kumagai, Hideki Ando, Satoshi Watanabe
  • Publication number: 20230367214
    Abstract: A chemically amplified positive resist composition is provided comprising a polymer comprising units containing a phenolic hydroxy group and units containing a carboxy group protected with an acid labile group. A resist pattern with a high resolution, reduced LER, rectangularity, and minimized influence of develop loading can be formed.
    Type: Application
    Filed: May 3, 2023
    Publication date: November 16, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Jun Hatakeyama, Satoshi Watanabe, Kenji Funatsu, Masahiro Fukushima, Masaaki Kotake
  • Patent number: 11808931
    Abstract: An image pickup apparatus includes a signal acquisition unit and a rotation unit. The signal acquisition unit includes an illumination unit including a light source and configured to irradiate a sample with a light beam, a photodetector including a plurality of light-receiving portions two-dimensionally arranged, and a detection optical system configured to guide light having been irradiated from the illumination unit to the sample and passed through the sample, to the photodetector. The rotation unit rotates the sample and the signal acquisition unit relative to each other, about a first axis intersecting an optical axis of the detection optical system in the sample. The illumination unit irradiates the sample with light beams at two or more incident angles in a plane including the optical axis and the first axis.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: November 7, 2023
    Assignee: Evident Corporation
    Inventors: Satoshi Watanabe, Mayumi Odaira
  • Patent number: 11806421
    Abstract: The porous-cellulose particles according to the present invention are constituted by gathered crystalline celluloses having a type I crystal form including a glucose molecule as a constitutional unit. That is, porous-cellulose particles having high sphericity have been achieved from a natural raw material. The porous-cellulose particles have an average particle diameter of 0.5 to less than 50 ?m, a specific surface area of 50 to 1000 m2/g, and a sphericity of 0.85 or more. Cosmetic products containing such porous-cellulose particles have excellent texture properties.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: November 7, 2023
    Assignee: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Satoshi Watanabe, Naoyuki Enomoto, Ikuko Shimazaki
  • Publication number: 20230341775
    Abstract: A chemically amplified positive resist composition is provided comprising (A) an acid diffusion-controlling agent in the form of an onium salt compound having a specific phenoxide anion, (B) a polymer comprising specific repeat units and adapted to be decomposed under the action of acid to increase its solubility in alkaline developer, and (C) a photoacid generator. A resist pattern with a high resolution, reduced LER, and improved CDU is formed. Because of minimal defects, the resist pattern can be inspected with light of short wavelength 300-400 nm.
    Type: Application
    Filed: April 20, 2023
    Publication date: October 26, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaaki Kotake, Satoshi Watanabe, Keiichi Masunaga, Masahiro Fukushima, Kenji Funatsu, Yuta Matsuzawa
  • Patent number: 11788191
    Abstract: A sliding member includes, on a surface of a metal substrate, a surface-treated layer including a zinc-electroplated layer, a chemical conversion-treated layer, and a topcoat layer sequentially stacked on the metal substrate. The chemical conversion-treated layer includes chromium and oxygen. The topcoat layer includes at least one material selected from the group consisting of a silica compound, acrylic resin, polyurethane resin, epoxy resin, phenol resin, and melamine resin. A method of manufacturing the sliding member includes a step of forming, on a surface of the chemical conversion-treated layer, the topcoat layer including at least one material selected from the group consisting of a silica compound, acrylic resin, polyurethane resin, epoxy resin, phenol resin, and melamine resin.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: October 17, 2023
    Assignee: NISSAN MOTOR CO., LTD.
    Inventors: Satoshi Watanabe, Soichiro Sugawara, Ikuo Konno
  • Publication number: 20230319397
    Abstract: The present technology relates to an information processing apparatus, an information processing method, and a program that enables appropriate sharing of processing in accordance with a remaining capacity of a battery. Provided is a mode switching unit that switches a mode depending on at least one of a remaining capacity of a battery or heat, the mode switching unit switching between a first mode in which a first device executes predetermined processing and a second mode in which a second device executes the predetermined processing. The predetermined processing is processing by an AI function. The present technology can be applied to, for example, a system including a surveillance camera and a server that distributes data from the surveillance camera.
    Type: Application
    Filed: June 17, 2021
    Publication date: October 5, 2023
    Applicant: Sony Semiconductor Solutions Corporation
    Inventors: Hirotaka ISHIKAWA, Satoshi WATANABE
  • Patent number: 11773059
    Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: October 3, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Ryosuke Taniguchi, Masahiro Fukushima