Patents by Inventor Satoshi Yawata
Satoshi Yawata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10851141Abstract: The present invention provides a mutant beetle luciferase and the like, having mutation in which the amino acid corresponding to valine at position 288 in the amino acid sequence of wild-type Photinus pyralis luciferase is isoleucine, leucine or phenylalanine, mutation in which the amino acid corresponding to leucine at position 376 in the aforementioned sequence is proline, mutation in which the amino acid corresponding to glutamic acid at position 455 in the aforementioned sequence is valine, alanine, serine, leucine, isoleucine or phenylalanine, or mutation in which the amino acid corresponding to glutamic acid at position 488 in the aforementioned sequence is valine, alanine, serine, leucine, isoleucine or phenylalanine, in the amino acid sequence encoding a wild-type beetle luciferase, and characterized in that a luminescence intensity due to a luciferin-luciferase luminescence reaction in a 0.9% by mass NaCl solution is 50% or more of that in a NaCl-free solution.Type: GrantFiled: June 19, 2017Date of Patent: December 1, 2020Assignee: DKK-TOA CorporationInventors: Kenichi Noda, Satoshi Yawata, Ai Shimomura
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Publication number: 20190352350Abstract: The present invention provides a mutant beetle luciferase and the like, having mutation in which the amino acid corresponding to valine at position 288 in the amino acid sequence of wild-type Photinus pyralis luciferase is isoleucine, leucine or phenylalanine, mutation in which the amino acid corresponding to leucine at position 376 in the aforementioned sequence is proline, mutation in which the amino acid corresponding to glutamic acid at position 455 in the aforementioned sequence is valine, alanine, serine, leucine, isoleucine or phenylalanine, or mutation in which the amino acid corresponding to glutamic acid at position 488 in the aforementioned sequence is valine, alanine, serine, leucine, isoleucine or phenylalanine, in the amino acid sequence encoding a wild-type beetle luciferase, and characterized in that a luminescence intensity due to a luciferin-luciferase luminescence reaction in a 0.9% by mass NaCl solution is 50% or more of that in a NaCl-free solution.Type: ApplicationFiled: June 19, 2017Publication date: November 21, 2019Applicant: DKK-TOA CorporationInventors: Kenichi Noda, Satoshi Yawata, Ai Shimomura
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Publication number: 20150225768Abstract: A quantification method includes a calibration curve preparing step to measure a standard solution, which has been prepared by adding sodium ions so that a sodium ion content of the standard solution is equaled to a sodium ion content of a sample to be measured with a method employing a reaction that activates a limulus reagent and/or a biochemical luminescent reaction caused by ATP, luciferin, and luciferase, and to prepare a calibration curve that represents a relation between a measurement value and an amount of a component to be measured; a sample measuring step to measure the sample to be measured with a method being the same as that used in the calibration curve preparing step; and a quantifying step to find, by using the calibration curve, an amount of the component to be measured in the sample to be measured from a measurement value in the sample measuring step.Type: ApplicationFiled: September 19, 2013Publication date: August 13, 2015Inventors: Satoshi Yawata, Hiromitsu Hachiya, Akio Kuroda, Kenichi Noda
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Patent number: 7905979Abstract: In a method of the present invention for holding a substrate in a vacuum, a glass substrate (5) is held by an adhesive pad (20) or an adhesive sheet, both of which are made from a material containing a diene based resin, whereby an adhesive agent is prevented from remaining on the substrate, and the adhesive sheet can be detached with ease from the substrate after assembling the substrates.Type: GrantFiled: October 25, 2007Date of Patent: March 15, 2011Assignee: Hitachi Plant Technologies, Ltd.Inventors: Naoto Yokoyama, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Satoshi Yawata
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Publication number: 20080099137Abstract: In a method of the present invention for holding a substrate in a vacuum, a glass substrate (5) is held by an adhesive pad (20) or an adhesive sheet, both of which are made from a material containing a diene based resin, whereby an adhesive agent is prevented from remaining on the substrate, and the adhesive sheet can be detached with ease from the substrate after assembling the substrates.Type: ApplicationFiled: October 25, 2007Publication date: May 1, 2008Applicant: HITACHI PLANT TECHNOLOGIES, LTD.Inventors: Naoto Yokoyama, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Satoshi Yawata
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Publication number: 20080060754Abstract: In a method of the present invention for holding a substrate in a vacuum, a glass substrate (5) is held by an adhesive pad (20) or an adhesive sheet, both of which are made from a material containing a diene based resin, whereby an adhesive agent is prevented from remaining on the substrate, and the adhesive sheet can be detached with ease from the substrate after assembling the substrates.Type: ApplicationFiled: October 26, 2007Publication date: March 13, 2008Applicant: HITACHI PLANT TECHNOLOGIES, LTD.Inventors: Naoto Yokoyama, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Satoshi Yawata
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Patent number: 7326457Abstract: In a method of the present invention for holding a substrate in a vacuum, a glass substrate (5) is held by an adhesive pad (20) or an adhesive sheet, both of which are made from a material containing a diene based resin, whereby an adhesive agent is prevented from remaining on the substrate, and the adhesive sheet can be detached with ease from the substrate after assembling the substrates.Type: GrantFiled: February 17, 2003Date of Patent: February 5, 2008Assignee: Hitachi Plant Technologies, Ltd.Inventors: Naoto Yokoyama, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Satoshi Yawata
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Publication number: 20050167036Abstract: In a method of the present invention for holding a substrate in a vacuum, a glass substrate (5) is held by an adhesive pad (20) or an adhesive sheet, both of which are made from a material containing a diene based resin, whereby an adhesive agent is prevented from remaining on the substrate, and the adhesive sheet can be detached with ease from the substrate after assembling the substrates.Type: ApplicationFiled: February 17, 2003Publication date: August 4, 2005Inventors: Naoto Yokoyama, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Satoshi Yawata
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Patent number: 6922229Abstract: One substrate is supported by an attracting and adsorbing operation and by an adhesive means provided inside a pressurizing plate; the other of substrate, on which a liquid crystal agent is dropped, is supported on a table by an attracting and adsorbing operation or by an adhesive means. Then, the pressure inside the chamber is reduced until a designated reduced pressure level is attained, and the pressure is increased after the substrates come firmly into contact with an adhesive agent that has been provided on the other of substrates, so that the individual substrates are attracted and adsorbed by the pressurizing plate and the table, whereby the substrates are laminated while positioning the substrates. Then, by retracting the adhesive means in the pressurizing plate or the table, the adhesive member is removed from the substrate surface, while or after twisting the adhesive member.Type: GrantFiled: March 14, 2003Date of Patent: July 26, 2005Assignees: Hitachi Industries Co., Ltd., Sharp Kabushiki KaishaInventors: Satoshi Yawata, Kiyoshi Imaizumi, Masatomo Endoh, Tatsuharu Yamamoto
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Publication number: 20030232561Abstract: One of substrates is supported by attracting and adsorbing operation and by an adhesive means provided inside the pressurizing plate; the other of substrate, on which a liquid crystal agent is dropped, is supported on the table by attracting and adsorbing operation or by an adhesive means, and the pressure inside the chamber is reduced until a designated reduced pressure level is attained, and then, the pressure is increased after contacting the substrates firmly to the adhesive agent on the other of substrates located downward, and the individual substrates are attracted and adsorbed by the pressurizing plate and the table, and the substrates are laminated while positioning the substrates, and then, when moving behind the adhesive means in the pressurizing plate or the table, the adhesive part is removed from the substrate surface while or after twisting the adhesive member.Type: ApplicationFiled: March 14, 2003Publication date: December 18, 2003Inventors: Satoshi Yawata, Kiyoshi Imaizumi, Masatomo Endoh, Tatsuharu Yamamoto
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Patent number: 5614024Abstract: An apparatus for applying a paste to a surface of a substrate by holding the substrate on a table and by moving a nozzle relative to the table to form a desired paste pattern on the substrate. The apparatus has a device for measuring the position of a paste ejection orifice of the nozzle, a processing unit for calculating, from a result of the measurement by the measuring device, a displacement of the position of the paste ejection orifice when the nozzle is changed, and a mechanism for positioning the substrate at a desired position with respect to the ejection orifice of the changed nozzle on the basis of a result of the operation of the processsing unit. With this arrangement, even if the position of the ejection orifice of the nozzle is changed when the nozzle is changed, the desired positional relationship between the nozzle and the substrate can be set with improved accuracy, whereby a paste pattern can be drawn accurately.Type: GrantFiled: July 27, 1994Date of Patent: March 25, 1997Assignee: Hitachi Techno Engineering Co., Ltd.Inventors: Shigeru Ishida, Satoshi Yawata, Tomio Yoneda, Haruo Mishina, Kiyoshi Imaizumi, Yukihiro Kawasumi
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Patent number: 5197384Abstract: A screen printer which has a cleaning device for cleaning a mask which is formed with at least a hole of a printing pattern. The cleaning device includes a spatula member and an airstream generating device. The spatula member is moved along the surface of the mask in contact therewith so as to scrape ink adhered to the mask surface. The airstream generating device generates an airstream passing through the hole of the mask so as to remove ink within the hole of the mask.Type: GrantFiled: May 24, 1991Date of Patent: March 30, 1993Assignee: Hitachi Techno Engineering Co., Ltd.Inventors: Satoshi Yawata, Haruo Mishina