Patents by Inventor Satosi Kisimoto

Satosi Kisimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum processing apparatus, and a film deposition apparatus and a film deposition method both using the vacuum processing apparatus
    Patent number: 6171641
    Abstract: A vacuum processing apparatus for performing various processes on a wafer in a vacuum chamber, and a film deposition method and a film deposition apparatus using this vacuum processing apparatus. The vacuum processing apparatus, the film deposition method and the film deposition apparatus using the vacuum processing apparatus according to this invention are characterized in that temperature control of the wafer is performed in a film deposition process, and particularly characterized in that after the emissivity calibration using a combination of a temperature calibration stage and a shutter is performed, the substrate is transferred to stages in a vacuum film deposition process chamber, and a film is deposited on the substrate by controlling the substrate temperature to a specified temperature.
    Type: Grant
    Filed: June 15, 1994
    Date of Patent: January 9, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Akira Okamoto, Shigeru Kobayashi, Hideaki Shimamura, Susumu Tsuzuku, Eisuke Nishitani, Satosi Kisimoto, Yuji Yoneoka
  • Vacuum processing device and film forming device and method using same
    Patent number: 5815396
    Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.
    Type: Grant
    Filed: May 9, 1995
    Date of Patent: September 29, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Shimamura, Yuji Yoneoka, Shigeru Kobayashi, Satosi Kisimoto, Sunao Matsubara, Hiroyuki Shida, Yukio Tanigaki, Masashi Yamamoto, Susumu Tsuzuku, Eisuke Nishitani, Tokio Kato, Akira Okamoto
  • Vacuum processing equipment, film coating equipment and deposition method
    Patent number: 5707500
    Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 13, 1998
    Assignee: Hitachi, Ltd
    Inventors: Hideaki Shimamura, Yuji Yoneoka, Shigeru Kobayashi, Satosi Kisimoto, Sunao Matsubara, Hiroyuki Shida, Yukio Tanigaki, Masashi Yamamoto, Susumu Tsuzuku, Eisuke Nishitani, Tokio Kato, Akira Okamoto