Patents by Inventor Scott E. White

Scott E. White has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240159230
    Abstract: A compressor assembly having a high velocity muffler system which produces a particle-free compressor pump feed while reducing noise output from the compressor assembly during compressing operations. The high velocity muffler system is maintenance-free and comprises an inertia filter. The compressor assembly uses a method for producing a compressor pump feed and reducing noise during compressing operations by processing a gas through the high velocity muffler system which has an inertia filter and a muffler chamber to produce a compressor pump feed which can be compressed by a pump assembly.
    Type: Application
    Filed: October 13, 2023
    Publication date: May 16, 2024
    Applicant: Black & Decker Inc.
    Inventors: Mark W. Wood, Stephen J. Vos, Scott D. Craig, Gary D. White, Dalton E. McFarland
  • Patent number: 10998170
    Abstract: Plasma ion energy distribution for ions having different masses is controlled by controlling the relationship between a base RF frequency and a harmonic RF frequency. By the controlling the RF power frequencies, characteristics of the plasma process may be changed based on ion mass. The ions that dominate etching may be selectively based upon whether an ion is lighter or heavier than other ions. Similarly, atomic layer etch processes may be controlled such that the process may be switched between a layer modification step and a layer etch step though adjustment of the RF frequencies. Such switching is capable of being performed within the same gas phase of the plasma process. The control of the RF power includes controlling the phase difference and/or amplitude ratios between a base RF frequency and a harmonic frequency based upon the detection of one or more electrical characteristics within the plasma apparatus.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: May 4, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Yusuke Yoshida, Sergey Voronin, Alok Ranjan, David J. Coumou, Scott E. White
  • Publication number: 20190318916
    Abstract: Plasma ion energy distribution for ions having different masses is controlled by controlling the relationship between a base RF frequency and a harmonic RF frequency. By the controlling the RF power frequencies, characteristics of the plasma process may be changed based on ion mass. The ions that dominate etching may be selectively based upon whether an ion is lighter or heavier than other ions. Similarly, atomic layer etch processes may be controlled such that the process may be switched between a layer modification step and a layer etch step though adjustment of the RF frequencies. Such switching is capable of being performed within the same gas phase of the plasma process. The control of the RF power includes controlling the phase difference and/or amplitude ratios between a base RF frequency and a harmonic frequency based upon the detection of one or more electrical characteristics within the plasma apparatus.
    Type: Application
    Filed: April 8, 2019
    Publication date: October 17, 2019
    Inventors: Yusuke Yoshida, Sergey Voronin, Alok Ranjan, David J. Coumou, Scott E. White
  • Publication number: 20190318913
    Abstract: Multiple harmonic frequency components are used for plasma excitation in a plasma process. Relative amplitude and/or phase shift between the different frequency components is controlled so as to provide desired ion energy plasma properties. The relative amplitude and/or phase shift may be controlled without direct and/or manual ion energy measurements. Rather, the ion energy within the plasma may be dynamically controlled by monitoring one or more electrical characteristics within the plasma apparatus, such as for example, impedance levels, electrical signals in the radio frequency (RF) generator, electrical signals in a the matching networks, and electrical signals in other circuits of the plasma processing apparatus. The monitoring and control of the ion energy may be accomplished dynamically during the plasma process so as to maintain a desired ion energy distribution.
    Type: Application
    Filed: April 8, 2019
    Publication date: October 17, 2019
    Inventors: Yusuke Yoshida, Sergey Voronin, Alok Ranjan, David J. Coumou, Scott E. White
  • Patent number: 6216710
    Abstract: A method of removing liquid from pores contained in a permeable metal part is disclosed. The part has a tubular construction defining an interior surface and an exterior surface having an upper end opening and a lower end opening at an opposite end thereof. The method includes the step of sealing the upper end opening and the lower end opening of the permeable metal part so as to define an closed interior chamber. The method further includes the steps of injecting a cleaning fluid into the closed interior chamber. The method yet further includes the step of pressurizing the interior chamber with a gas at a pressure sufficient to cause the cleaning fluid to permeate through the pores from the interior surface to the exterior surface. The liquid is forced through the exterior surface and removed from the pores. An apparatus for removing quench oil from a permeable metal part is also disclosed.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: April 17, 2001
    Assignee: Caterpillar Inc.
    Inventors: Scott E. White, Harold E. Winkler