Patents by Inventor Scott Jeffery Stevenot

Scott Jeffery Stevenot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal
    Patent number: 8735765
    Abstract: A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: May 27, 2014
    Assignee: Lam Research Corporation
    Inventors: James E. Tappan, Scott Jeffery Stevenot
  • ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL
    Publication number: 20130340938
    Abstract: A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
    Type: Application
    Filed: August 28, 2013
    Publication date: December 26, 2013
    Applicant: Lam Research Corporation
    Inventors: James E. Tappan, Scott Jeffery Stevenot
  • Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal
    Patent number: 8552334
    Abstract: A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
    Type: Grant
    Filed: February 9, 2009
    Date of Patent: October 8, 2013
    Assignee: Lam Research Corporation
    Inventors: James E. Tappan, Scott Jeffery Stevenot
  • ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL
    Publication number: 20090200268
    Abstract: A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
    Type: Application
    Filed: February 9, 2009
    Publication date: August 13, 2009
    Applicant: Lam Research Corporation
    Inventors: James E. Tappan, Scott Jeffery Stevenot