Patents by Inventor Scott Schuldenfrei

Scott Schuldenfrei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230116129
    Abstract: A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
    Type: Application
    Filed: December 6, 2022
    Publication date: April 13, 2023
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Patent number: 11532477
    Abstract: A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: December 20, 2022
    Assignee: Micron Technology, Inc.
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Publication number: 20180337035
    Abstract: A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
    Type: Application
    Filed: July 30, 2018
    Publication date: November 22, 2018
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Patent number: 10049874
    Abstract: A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: August 14, 2018
    Assignee: Micron Technology, Inc.
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Publication number: 20160042941
    Abstract: A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
    Type: Application
    Filed: October 22, 2015
    Publication date: February 11, 2016
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Patent number: 9177795
    Abstract: A method of forming nanostructures may include forming a block copolymer composition within a trench in a material on a substrate, wherein the block copolymer composition may comprise a block copolymer material and an activatable catalyst having a higher affinity for a first block of the block copolymer material compared to a second block of the block copolymer material; self-assembling the block copolymer composition into first domains comprising the first block and the activatable catalyst, and second domains comprising the second block; generating catalyst from the activatable catalyst in at least one portion of the first domains to produce a structure comprising catalyst-containing domains and the second domains, the catalyst-containing domains comprising the first block and the catalyst; and reacting a metal oxide precursor with the catalyst in the catalyst-containing domains to produce a metal oxide-containing structure comprising the first block and metal oxide.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: November 3, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei
  • Publication number: 20150091137
    Abstract: A method of forming nanostructures may include forming a block copolymer composition within a trench in a material on a substrate, wherein the block copolymer composition may comprise a block copolymer material and an activatable catalyst having a higher affinity for a first block of the block copolymer material compared to a second block of the block copolymer material; self-assembling the block copolymer composition into first domains comprising the first block and the activatable catalyst, and second domains comprising the second block; generating catalyst from the activatable catalyst in at least one portion of the first domains to produce a structure comprising catalyst-containing domains and the second domains, the catalyst-containing domains comprising the first block and the catalyst; and reacting a metal oxide precursor with the catalyst in the catalyst-containing domains to produce a metal oxide-containing structure comprising the first block and metal oxide.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 2, 2015
    Applicant: Micron Technology, Inc.
    Inventors: Nicholas Hendricks, Adam L. Olson, William R. Brown, Ho Seop Eom, Xue Chen, Kaveri Jain, Scott Schuldenfrei