Patents by Inventor Se-Hyuk Im

Se-Hyuk Im has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240066786
    Abstract: A nanofabrication method comprises receiving information regarding in-plane distortion of a substrate, modeling target out-of-plane displacement as a summation of a plurality of geometric modes represented by a linear combination of basis functions, generating a first drop pattern of formable material based on the modeled out-of-plane displacement, generating a second drop pattern by merging the first drop pattern with a drop pattern based on a topography of the template and the substrate; dispensing drops of formable material onto the substrate according to the second drop pattern, and contacting the dispensed drops with the template to form a film. The plurality of geometric modes are modified using a plurality of unique predetermined correction coefficients. Each unique predetermined correction coefficient represents a relationship between an analytically determined amount of in-plane distortion and an empirically determined amount of in-plane distortion.
    Type: Application
    Filed: August 30, 2022
    Publication date: February 29, 2024
    Inventors: Se-Hyuk Im, Anshuman Cherala
  • Publication number: 20230335428
    Abstract: A chuck assembly for holding a plate comprises a member configured to hold the plate, the member including a flexible portion configured to have a central opening, and a first cavity formed by the flexible portion, wherein the plate is held by the flexible portion by reducing pressure in the first cavity, a light-transmitting member covering the central opening of the member, and a fluid path in communication with a second cavity defined by the member, the plate held by the member and the light-transmitting member for pressurizing the second cavity.
    Type: Application
    Filed: June 21, 2023
    Publication date: October 19, 2023
    Inventors: SETH J. BAMESBERGER, SE-HYUK IM, BYUNG-JIN CHOI
  • Patent number: 11728203
    Abstract: A chuck assembly for holding a plate comprises a member configured to hold the plate, the member including a flexible portion configured to have a central opening, and a first cavity formed by the flexible portion, wherein the plate is held by the flexible portion by reducing pressure in the first cavity, a light-transmitting member covering the central opening of the member, and a fluid path in communication with a second cavity defined by the member, the plate held by the member and the light-transmitting member for pressurizing the second cavity.
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: August 15, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Seth J. Bamesberger, Se-Hyuk Im, Byung-Jin Choi
  • Publication number: 20230061361
    Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.
    Type: Application
    Filed: November 10, 2022
    Publication date: March 2, 2023
    Inventors: Seth J. Bamesberger, Ozkan Ozturk, Christopher Ellis Jones, Se-Hyuk Im
  • Patent number: 11562924
    Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: January 24, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Seth J. Bamesberger, Ozkan Ozturk, Christopher Ellis Jones, Se-Hyuk Im
  • Publication number: 20220115259
    Abstract: A chuck assembly for holding a plate comprises a member configured to hold the plate, the member including a flexible portion configured to have a central opening, and a first cavity formed by the flexible portion, wherein the plate is held by the flexible portion by reducing pressure in the first cavity, a light-transmitting member covering the central opening of the member, and a fluid path in communication with a second cavity defined by the member, the plate held by the member and the light-transmitting member for pressurizing the second cavity.
    Type: Application
    Filed: October 13, 2020
    Publication date: April 14, 2022
    Inventors: SETH J. BAMESBERGER, SE-HYUK IM, BYUNG-JIN CHOI
  • Patent number: 11249405
    Abstract: A system and method of imprinting a formable material on a substrate includes a feature with a template. The substrate is initially held with a first back pressure. After which the template is brought into contact with the formable material. A template strain tensor above the feature may be greater than a strain threshold. The substrate is then held with a second back pressure less than the first back pressure, after which the substrate strain below the feature increases. After which the formable material is solidified.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: February 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Se-Hyuk Im
  • Patent number: 11145535
    Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: October 12, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Seth J. Bamesberger, Se-Hyuk Im
  • Publication number: 20210242073
    Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.
    Type: Application
    Filed: January 31, 2020
    Publication date: August 5, 2021
    Inventors: Seth J. Bamesberger, Ozkan Ozturk, Christopher Ellis Jones, Se-Hyuk Im
  • Patent number: 11020894
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 1, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20210050245
    Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.
    Type: Application
    Filed: August 15, 2019
    Publication date: February 18, 2021
    Inventors: Byung-Jin Choi, Seth J. Bamesberger, Se-Hyuk Im
  • Publication number: 20190332021
    Abstract: A system and method of imprinting a formable material on a substrate includes a feature with a template. The substrate is initially held with a first back pressure. After which the template is brought into contact with the formable material. A template strain tensor above the feature may be greater than a strain threshold. The substrate is then held with a second back pressure less than the first back pressure, after which the substrate strain below the feature increases. After which the formable material is solidified.
    Type: Application
    Filed: April 30, 2018
    Publication date: October 31, 2019
    Inventors: Byung-Jin Choi, Se-Hyuk Im
  • Publication number: 20190061228
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: October 30, 2018
    Publication date: February 28, 2019
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 9651862
    Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: May 16, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Edward Brian Fletcher, Gerard M. Schmid, Se-Hyuk Im, Niyaz Khusnatdinov, Yeshwanth Srinivasan, Weijun Liu, Frank Y. Xu
  • Publication number: 20150165671
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: February 26, 2015
    Publication date: June 18, 2015
    Inventors: Se-Hyuk Im, Mahadevan Ganapathisubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 8968620
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20150014877
    Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed, at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.
    Type: Application
    Filed: July 2, 2014
    Publication date: January 15, 2015
    Inventors: Keiji YAMASHITA, Yutaka WATANABE, Brian FLETCHER, Gerard SCHMID, Niyaz KHUSNATDINOV, Se-Hyuk IM, Takuya KONO, Masayuki HATANO, Ikuo YONEDA
  • Publication number: 20150017329
    Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
    Type: Application
    Filed: July 11, 2014
    Publication date: January 15, 2015
    Applicants: Toshiba Corporation, Canon Nanotechnologies, Inc.
    Inventors: Edward Brian Fletcher, Gerard M. Schmid, Se-Hyuk Im, Niyaz Khusnatdinov, Yeshwanth Srinivasan, Weijun Liu, Frank Y. Xu
  • Publication number: 20150014876
    Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.
    Type: Application
    Filed: June 20, 2014
    Publication date: January 15, 2015
    Inventors: Keiji Yamashita, Yutaka Watanabe, Brian Fletcher, Gerard Schmid, Niyaz Khusnatdinov, Se-Hyuk Im, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Publication number: 20110260361
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: April 27, 2011
    Publication date: October 27, 2011
    Applicant: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan