Abstract: The application relates to a method for determining beam parameters of a charge carrier beam, a measuring device, and a charge carrier beam device. The charge carrier beam (4) from a charge carrier beam device (1) is guided, by means of a beam deflection unit (3), over a slit aperture arrangement which is provided in an aperture device (7) and which has one or more slit apertures (8). Measurement plane coordinates of the beam components that penetrate the slit aperture arrangement are determined. On the basis of the measurement plane coordinates, the aperture device automatically moves in such a way that a measuring aperture (9) arranged in the aperture device moves over a predefined measurement reference point. The beam parameter is measured by the measuring aperture. In a measuring device (5) suitable for carrying out said method, the slit aperture arrangement has at least two non-parallel slit aperture sections (12, 13, 15, 16) which can be part of a single continuous slit aperture.

Abstract: The application relates to a method for determining beam parameters of a charge carrier beam, a measuring device, and a charge carrier beam device. The charge carrier beam (4) from a charge carrier beam device (1) is guided, by means of a beam deflection unit (3), over a slit aperture arrangement which is provided in an aperture device (7) and which has one or more slit apertures (8). Measurement plane coordinates of the beam components that penetrate the slit aperture arrangement are determined. On the basis of the measurement plane coordinates, the aperture device automatically moves in such a way that a measuring aperture (9) arranged in the aperture device moves over a predefined measurement reference point. The beam parameter is measured by the measuring aperture. In a measuring device (5) suitable for carrying out said method, the slit aperture arrangement has at least two non-parallel slit aperture sections (12, 13, 15, 16) which can be part of a single continuous slit aperture.