Patents by Inventor Seema Agrawal

Seema Agrawal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative imaging method for providing a patterned metal layer having high conductivity
    Patent number: 7666567
    Abstract: Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: February 23, 2010
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Feng Gao, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Jeffrey Scott Meth, Kenneth George Sharp, Fredrick Claus Zumsteg, Jr., Seema Agrawal
  • NEGATIVE IMAGING METHOD FOR PROVIDING A PATTERNED METAL LAYER HAVING HIGH CONDUCTIVITY
    Publication number: 20090104557
    Abstract: Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
    Type: Application
    Filed: October 23, 2007
    Publication date: April 23, 2009
    Inventors: Feng Gao, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Jeffrey Scott Meth, Kenneth George Sharp, Fredrick Claus Zumsteg, JR., Seema Agrawal