Patents by Inventor Seiichiro Yokohama

Seiichiro Yokohama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing hydrogenated amorphous silicon film
    Patent number: 4866006
    Abstract: A process for production of a hydrogenated amorphous silicon film of a silicon compound containing at least one element selected from the group consisting of hydrogen and halogens and having a photosensitivity of not less than 0.1 erg/cm.sup.2 at 780 nm, which comprisessupplying a gas selected from the group consisting of SiH.sub.4, SiF.sub.4 and Si.sub.2 H.sub.6 into a discharge space, andsubjecting the gas to glow discharge within the discharge space having a gradient discharge intensity.The present invention provides an a-SiH film which has a remarkable high sensitivity in a long wavelength region with maintaining a high photosensitivity in a visible light region, and has a remarkable less defect density, and the process for production of such film in a high deposition rate.
    Type: Grant
    Filed: September 28, 1988
    Date of Patent: September 12, 1989
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Osamu Imagawa, Masazumi Iwanishi, Seiichiro Yokohama