Patents by Inventor Seiji Isogai
Seiji Isogai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180209924Abstract: The present invention provides an X-ray inspection device that detects a defect not on the basis of a change of an X-ray irradiation angle but on uniform determining criteria. As one embodiment for achieving the purpose, proposed below is an X-ray inspection device that is provided with: a detection element that detects a transmission X-ray, which has been emitted from an X-ray source and passed through a sample; and an arithmetic device, which forms a profile on the basis of output signals transmitted from the detection element, and which detects, using the profile, a defect included in the sample. The arithmetic device detects the defect on the basis of threshold setting corresponding to the visual field positions of the transmission X-ray.Type: ApplicationFiled: July 27, 2015Publication date: July 26, 2018Inventors: Hideaki SASAZAWA, Toshiyuki NAKAO, Seiji ISOGAI, Tatsumi HATTORI, Masanobu IEDA, Yasuko AOKI
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Patent number: 8995748Abstract: A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.Type: GrantFiled: June 1, 2010Date of Patent: March 31, 2015Assignee: Hitachi High-Technologies CorporationInventors: Tsunehiro Sakai, Shigeki Kurihara, Yutaka Tandai, Tamao Ishikawa, Yuichi Hamamura, Tomohiro Funakoshi, Seiji Isogai, Katsuhiko Ichinose
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Patent number: 8428336Abstract: A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.Type: GrantFiled: May 11, 2006Date of Patent: April 23, 2013Assignee: Hitachi, Ltd.Inventors: Yoko Ikeda, Junko Konishi, Hisafumi Iwata, Yuji Takagi, Kenji Obara, Ryo Nakagaki, Seiji Isogai, Yasuhiko Ozawa
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Publication number: 20120141011Abstract: A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.Type: ApplicationFiled: June 1, 2010Publication date: June 7, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Tsunehiro Sakai, Shigeki Kurihara, Yutaka Tandai, Tamao Ishikawa, Yuichi Hamamura, Tomohiro Funakoshi, Seiji Isogai, Katsuhiko Ichinose
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Patent number: 7558683Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: GrantFiled: October 19, 2007Date of Patent: July 7, 2009Assignee: Hitachi, Ltd.Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki
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Publication number: 20080187212Abstract: According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object.Type: ApplicationFiled: February 12, 2008Publication date: August 7, 2008Applicant: Hitachi, Ltd.Inventors: Kenji OBARA, Yuji TAKAGI, Ryo NAKAGAKI, Yasuhiro OZAWA, Toshiei KUROSAKI, Seiji ISOGAI
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Patent number: 7356177Abstract: According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object.Type: GrantFiled: August 17, 2006Date of Patent: April 8, 2008Assignee: Hitachi, Ltd.Inventors: Kenji Obara, Yuji Takagi, Ryo Nakagaki, Yasuhiko Ozawa, Toshiei Kurosaki, Seiji Isogai
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Patent number: 7352890Abstract: A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.Type: GrantFiled: February 17, 2006Date of Patent: April 1, 2008Assignee: Hitachi, Ltd.Inventors: Atsushi Shimoda, Ichirou Ishimaru, Yuji Takagi, Takuo Tamura, Yuichi Hamamura, Kenji Watanabe, Yasuhiko Ozawa, Seiji Isogai
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Publication number: 20080059083Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: ApplicationFiled: October 19, 2007Publication date: March 6, 2008Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki
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Patent number: 7307253Abstract: In a scanning electron microscope having the function of observing an attentional object on a specimen, an error in an in-focus position can be corrected at high speeds. When moving the field of view to an object to be observed on a specimen on which an electron beam is scanned, an error between an in-focus position indicated by a mechanism for measuring a height of surface of the specimen and an actual in-focus position is corrected on the basis of information concerning points which are among a plurality of measured points and are adjacent to the target observing point.Type: GrantFiled: August 26, 2005Date of Patent: December 11, 2007Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Seiji Isogai, Kazuo Aoki, Masashi Sakamoto
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Patent number: 7307254Abstract: This SEM has a capability of preventing shift of a view field of the foreign matters at a stage where no sufficient correction is carried out when obtaining the SEM coordinate values used for transforming the coordinate values of the foreign matters on the sample sent from another device into the SEM coordinate values. The SEM selects the foreign matters closer to the center of the sample at first and then the foreign matters spirally from the center of the sample to the outer periphery.Type: GrantFiled: April 12, 2005Date of Patent: December 11, 2007Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kazuo Aoki, Seiji Isogai, Masashi Sakamoto
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Patent number: 7305314Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: GrantFiled: December 14, 2005Date of Patent: December 4, 2007Assignee: Hitachi, Ltd.Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki
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Publication number: 20060274932Abstract: A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.Type: ApplicationFiled: May 11, 2006Publication date: December 7, 2006Inventors: Yoko Ikeda, Junko Konishi, Hisafumi Iwata, Yuji Takagi, Kenji Obara, Ryo Nakagaki, Seiji Isogai, Yasuhiko Ozawa
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Publication number: 20060274933Abstract: According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object.Type: ApplicationFiled: August 17, 2006Publication date: December 7, 2006Applicant: Hitachi, Ltd.Inventors: Kenji Obara, Yuji Takagi, Ryo Nakagaki, Yasuhiro Ozawa, Toshiei Kurosaki, Seiji Isogai
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Patent number: 7113628Abstract: According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object.Type: GrantFiled: November 17, 2000Date of Patent: September 26, 2006Assignee: HitachiInventors: Kenji Obara, Yuji Takagi, Ryo Nakagaki, Yasuhiro Ozawa, Toshiei Kurosaki, Seiji Isogai
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Publication number: 20060140472Abstract: A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.Type: ApplicationFiled: February 17, 2006Publication date: June 29, 2006Inventors: Atsushi Shimoda, Ichirou Ishimaru, Yuji Takagi, Takuo Tamura, Yuichi Hamamura, Kenji Watanabe, Yasuhiko Ozawa, Seiji Isogai
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Patent number: 7068834Abstract: The present invention has an analyzing unit including an image detection device for producing a plurality of images of a workpiece, a storage for storing detected images produced by the image detection device, and a display having a screen with a first area for displaying a plurality of detected images stored in the storage and a plurality of second areas for classifying the detected images according to features of the detected images, whereby the plurality of detected images are moved on the screen from the first area to selected second areas to classify the plurality of detected images in the second areas.Type: GrantFiled: December 1, 1999Date of Patent: June 27, 2006Assignee: Hitachi, Ltd.Inventors: Yoko Ikeda, Junko Konishi, Hisafumi Iwata, Yuji Takagi, Kenji Obara, Ryo Nakagaki, Seiji Isogai, Yasuhiko Ozawa
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Patent number: 7062081Abstract: In order to allow critical flaws in an inspected item to be determined early during a production process, the present invention includes the following steps: a step of detecting defects in a production process for the inspected item and storing defect positions; a step of collecting detailed defect information and storing the detailed information in association with defect positions; a step of storing positions at which flaws were generated based on a final inspection of the inspected item; a step of comparing defect positions with positions at which flaws were generated; and a step of classifying and displaying detailed information based on the comparison results.Type: GrantFiled: February 15, 2001Date of Patent: June 13, 2006Assignee: Hitachi, Ltd.Inventors: Atsushi Shimoda, Ichirou Ishimaru, Yuji Takagi, Takuo Tamura, Yuichi Hamamura, Kenji Watanabe, Yasuhiko Ozawa, Seiji Isogai
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Publication number: 20060100804Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: ApplicationFiled: December 14, 2005Publication date: May 11, 2006Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki
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Patent number: 7010447Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: GrantFiled: July 12, 2004Date of Patent: March 7, 2006Assignee: Hitachi, Ltd.Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki