Patents by Inventor Seiji Noda

Seiji Noda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7965372
    Abstract: A photoresist film removing apparatus includes a reacting chamber, an ozonizer producing a gas supplied to the reacting chamber, and an exhaust system that exhausts the gas from the reacting chamber. A source of a photoresist film-remover is located opposite a stage carrying a substrate covered with photoresist. Photoresist film-remover and the gas are supplied to the substrate through apertures. An electric field may be generated between the source of the photoresist film-remover and the substrate. Alternatively, a centrally located feed tube supplies only one of the gas and the photoresist film-remover through a single aperture and a reservoir discharges the other through apertures. The reservoir surrounds and is sealed to the feed tube. The apparatus may include a container holding a liquid photoresist film-remover and a mixture of the gas and remover is supplied from outside the reacting chamber to the substrate.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: June 21, 2011
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Seiji Noda, Masaki Kuzumoto, Izumi Oya, Makoto Miyamoto
  • Publication number: 20070006904
    Abstract: A substrate cleaning system that cleans a glass substrate by supplying liquid and gas to spray nozzles and by spraying fluid, where the liquid and the gas are mixed in the spray nozzles, onto the substrate in order to effectively remove foreign objects attached on the end surface of substrate after performing mechanical cut-off or polishing treatment, the system has: liquid heating means for heating the liquid to be supplied to the spray nozzles to control the temperature of the liquid, in which the temperature of the liquid at the inlet of the spray nozzles is controlled at 40° C. to 100° C.
    Type: Application
    Filed: June 26, 2006
    Publication date: January 11, 2007
    Applicant: SPC ELECTRONICS CORPORATION
    Inventors: Takehiro Hagiwara, Tatsuo Kataoka, Seiji Noda, Takafumi Nakai
  • Publication number: 20060289362
    Abstract: A water treatment method sufficiently decomposes low-degradable organic substances while suppressing production of bromate ions and consumption of hydrogen peroxide. A water treatment method for purifying water using radicals includes injecting an electron-donating substance selected from the group consisting of saccharides, amino acids, lipids, humic acid, and mixtures thereof into water. The radicals are preferably produced using ozone and hydrogen peroxide in combination. Further, the electron-donating substance is preferably injected into the water in a concentration of 0.1 ?mol/L to 30 ?mol/L.
    Type: Application
    Filed: June 15, 2006
    Publication date: December 28, 2006
    Applicant: Mitsubishi Electric Corporation
    Inventors: Tokiko Yamauchi, Nozomu Yasunaga, Seiji Noda, Seiji Furukawa
  • Patent number: 6955178
    Abstract: A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: October 18, 2005
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masaki Kuzumoto, Seiji Noda, Izumi Oya, Makoto Miyamoto, Hideo Horibe, Tatsuo Kataoka, Tetsuji Oishi
  • Patent number: 6715944
    Abstract: An apparatus for removing a photoresist film includes a substrate cassette for fixing a substrate having a surface covered with a photoresist film, an ozone feed tube for supplying ozone, a liquid feed tube for supplying a liquid photoresist film removing solution, and a processing tank for recovering and processing at least one of ozone and the liquid photoresist film removing solution, wherein the liquid photoresist film removing solution is supplied through the liquid feed tube as a liquid or mist, at least one of ozone and the photoresist film removing solution being continuously supplied.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: April 6, 2004
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Shimada Rika Kougyo Kabushiki Kaisha
    Inventors: Izumi Oya, Seiji Noda, Makoto Miyamoto, Masaki Kuzumoto, Masashi Ohmori, Tatsuo Kataoka
  • Patent number: 6616773
    Abstract: A substrate treatment assembly for treating a work object on a surface of a substrate by supplying to the work object a wet ozone-containing gas wetted with a treatment solution includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, a supply device for supplying the wet ozone-containing gas to a work object on a surface of the substrate, a gas conduit connecting the wetting device to the supply device, and a heating device for heating the wet ozone-containing gas to a temperature approximately equal to or greater than the temperature of the substrate.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: September 9, 2003
    Assignees: Mitsubishi Denki Kabushiki Kaisha, SPC Electronics Corporation
    Inventors: Masaki Kuzumoto, Seiji Noda, Izumi Oya, Makoto Miyamoto, Hideo Horibe, Tatsuo Kataoka, Tetsuji Oishi
  • Publication number: 20030066549
    Abstract: There is provided a process for treating a substrate by removing organic pollutant on the surface of the substrate using mixed gas of wet ozone-containing gas and basic gas, wherein the introduction amount of basic gas is controlled, thereby achieving complete prevention of corrosion of metal wiring previously formed on the substrate, and an apparatus therefor.
    Type: Application
    Filed: May 1, 2002
    Publication date: April 10, 2003
    Inventors: Seiji Noda, Hideo Horibe, Makoto Miyamoto, Izumi Oya, Masaki Kuzumoto
  • Patent number: 6517999
    Abstract: A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: February 11, 2003
    Assignees: Shimada Rika Kougyo Kabushiki Kaisha, Mitsubishi Denki Kabushiki Kaisha
    Inventors: Izumi Oya, Seiji Noda, Makoto Miyamoto, Masaki Kuzumoto, Masashi Ohmori, Tatsuo Kataoka
  • Patent number: 6517998
    Abstract: A method of removing a photoresist film with high efficiency of removal and friendliness with the environment while reducing material consumption and cost for a ventilation facility, and an apparatus used for the method. The method of removing a photoresist film in a sealed system, includes supplying a photoresist film-removal mixture containing an ozonized gas and a photoresist film-remover to a photoresist film on a surface of a substrate through a photoresist film-remover supplier opposed to the photoresist film.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: February 11, 2003
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Seiji Noda, Masaki Kuzumoto, Izumi Oya, Makoto Miyamoto
  • Publication number: 20020137879
    Abstract: The present invention provides a catalyst or polyester production capable of producing a polyester with high catalytic activity and a process For producing a polyester using the catalyst. The catalyst for polyester production comprises a solid titanium compound which is obtained by dehydro-drying a hydrolyzate obtained by hydrolysis of a titanium halide and which has a molar ratio (OH/Ti) of a hydroxyl group (OH) to titanium (Ti) exceeding 0.09 and less than 4. The present invention also provides a method to obtain a polyester having a small increase of the acetaldehyde content during the molding. This method comprises bringing a polyester, which is obtained by the use of a titanium compound catalyst and in which the reaction has been completed, into contact with a phosphoric ester aqueous solution or the like having a concentration of not less than 10 ppm in terms of phosphorus atom.
    Type: Application
    Filed: December 21, 2001
    Publication date: September 26, 2002
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Takeshi Ohmatsuzawa, Fujito Ehara, Hideshi Hori, Kazuo Toyota, Kenzaburou Fukutani, Junichi Imuta, Akivoshi Shimizu, Takayuki Onogi, Seiji Noda, Sayuki Sakai, Shoji Hiraoka, Koji Nakamachi, Michio Tsugawa, Satoru Miyazoe
  • Patent number: 6451959
    Abstract: The present invention provides a catalyst for polyester production capable of producing a polyester with high catalytic activity, a process for producing a polyester using the catalyst and a polyester produced thereby. The catalyst comprises a solid titanium compound obtained by dehydro-drying a hydrolyzate obtained by hydrolysis of a titanium halide and which has a molar ratio (OH/Ti) of a hydroxyl group (OH) to titanium (Ti) exceeding 0.09 and less than 4. In the process, the polyester is obtained by polycondensing an aromatic dicarboxylic acid, or an ester-forming derivative thereof, and an aliphatic diol, or ester-forming derivative thereof, in the presence of the catalyst. The resulting polyester has excellent transparency and tint, a titanium content of 1 to 100 ppm, a magnesium content of 1 to 200 ppm and a magnesium to titanium weight ratio of not less than 0.01.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: September 17, 2002
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takeshi Ohmatsuzawa, Fujito Ehara, Hideshi Hori, Kazuo Toyota, Kenzaburou Fukutani, Junichi Imuta, Akivoshi Shimizu, Takayuki Onogi, Seiji Noda, Masayuki Sakai, Shoji Hiraoka, Koji Nakamachi, Michio Tsugawa, Satoru Miyazoe
  • Publication number: 20020115025
    Abstract: A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided. Particularly the present invention provides a method of removing a photoresist film by in a sealed system, evenly and continuously or intermittently supplying a photoresist film-removable mixture containing an ozonized gas and a photoresist film-remover to a photoresist film formed on a surface of a substrate through a photoresist film-remover supplier arranged as opposed to the photoresist film. The present invention also provides an apparatus used for the method.
    Type: Application
    Filed: April 30, 2002
    Publication date: August 22, 2002
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Seiji Noda, Masaki Kuzumoto, Izumi Oya, Makoto Miyamoto
  • Publication number: 20020115024
    Abstract: A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided.
    Type: Application
    Filed: April 30, 2002
    Publication date: August 22, 2002
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Izumi Oya, Seiji Noda, Makoto Miyamoto, Masaki Kuzumoto, Masashi Ohmori, Tatsuo Kataoka
  • Patent number: 6346070
    Abstract: The present invention provides a catalyst for polyester production capable of producing a polyester with high catalytic activity and a process for producing a polyester using the catalyst. The catalyst for polyester production comprises a solid titanium compound which is obtained by dehydro-drying a hydrolyzate obtained by hydrolysis of a titanium halide and which has a molar ratio (OH/Ti) of a hydroxyl group (OH) to titanium (Ti) exceeding 0.09 and less than 4. The present invention also provides a method to obtain a polyester having a small increase of the acetaldehyde content during the molding. This method comprises bringing a polyester, which is obtained by the use of a titanium compound catalyst and in which the reaction has been completed, into contact with a phosphoric ester aqueous solution or the like having a concentration of not less than 10 ppm in terms of phosphorus atom.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: February 12, 2002
    Assignee: Mitsui Chemicals Inc
    Inventors: Takeshi Ohmatsuzawa, Fujito Ehara, Hideshi Hori, Kazuo Toyota, Kenzaburou Fukutani, Junichi Imuta, Akiyoshi Shimizu, Takayuki Onogi, Seiji Noda, Masayuki Sakai, Shoji Hiraoka, Koji Nakamachi, Michio Tsugawa, Satoru Miyazoe
  • Patent number: 5519112
    Abstract: The invention provides a method of manufacturing polyesters which comprises an esterifying step wherein a dicarboxylic acid and a dihydroxyl compound are esterified and the next liquid phase polycondensation step wherein the resulting ester is subjected to liquid phase polycondensation in the presence of a polycondensation catalyst while a distillate which contains an reacted dihydroxyl compound and the polycondensation catalyst is distilled, wherein the distillate is subjected to a purification treatment comprising:(a) a distilling step;(b) a filtering step; and(c) a decoloring stepand then the thus purified distillate is recovered and supplied to the esterifying step. A further method comprises a purification treatment comprising:(a) a distilling step;(b) a depolymerizing step; and(c) a decoloring step.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: May 21, 1996
    Assignee: Mitsui Petrochemical Industries Ltd.
    Inventors: Hirofumi Harazoe, Masamitsu Matsuno, Seiji Noda
  • Patent number: 5380899
    Abstract: A cyclic amidine typically having the formula: ##STR1## wherein R.sup.1 represents an organic radical, X represents a direct bond or a divalent organic radical and A and B each represent hydrogen or an organic radical is prepared by a liquid phase reaction of a nitrile of the formula R.sup.1 CN where R.sup.1 has the same meaning as above, with a polyamine typically having the formula: ##STR2## where X, A and B have the same meaning as above, in the presence presence of a mixture of a titanium compound with water.
    Type: Grant
    Filed: January 21, 1994
    Date of Patent: January 10, 1995
    Assignee: Lion Akzo Co., Ltd.
    Inventors: Seiji Noda, Takeshi Tsuji
  • Patent number: RE40571
    Abstract: The present invention provides a catalyst for polyester production capable of producing a polyester with high catalytic activity, a process for producing a polyester using the catalyst and a polyester produced thereby. The catalyst comprises a solid titanium compound obtained by dehydro-drying a hydrolyzate obtained by hydrolysis of a titanium halide and which has a molar ratio (OH/Ti) of a hydroxyl group (OH) to titanium (Ti) exceeding 0.09 and less than 4. In the process, the polyester is obtained by polycondensing an aromatic dicarboxylic acid, or an ester-forming derivative thereof, and an aliphatic diol, or ester-forming derivative thereof, in the presence of the catalyst. The resulting polyester has excellent transparency and tint, a titanium content of 1 to 100 ppm, a magnesium content of 1 to 200 ppm and a magnesium to titanium weight ratio of not less than 0.01.
    Type: Grant
    Filed: September 16, 2004
    Date of Patent: November 11, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takeshi Ohmatsuzawa, Fujito Ehara, Hideshi Hori, Kazuo Toyota, Kenzaburou Fukutani, Junichi Imuta, Akiyoshi Shimizu, Takayuki Onogi, Seiji Noda, Masayuki Sakai, Shoji Hiraoka, Koji Nakamachi, Michio Tsugawa, Satoru Miyazoe