Patents by Inventor Seiji Otani

Seiji Otani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9604298
    Abstract: The removal starting position (8S1) of a first removal process and the four removal starting positions (8S21-8S24) in a second removal process are established on an imaginary circle (7I) with a prescribed radius (R) that is inscribed in the apex (7C) of an incomplete thread part (7a). In each removal process, the tip of the screw thread cutting tool shaves off the apex (7C) of the incomplete thread part (7a) into respective recesses, contacting the imaginary inscribed circle (7I) from the outside (above). The multiple cutting surfaces of the apex (7C) are formed in parallel helices (that is, as mutually adjacent helical recesses) from the starting position to the ending position of the incomplete thread part. Points and burrs in the incomplete thread part can thereby be eliminated or reduced without loss of the ability to screw together with a partner threaded fastener (threaded portion).
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: March 28, 2017
    Assignee: RICOH ELEMEX CORPORATION
    Inventors: Toshiyuki Shimizu, Masao Kobayashi, Kenji Nishikawa, Seiji Otani, Takaya Nishikawa, Manabu Takeda
  • Publication number: 20140141896
    Abstract: The removal starting position (8S1) of a first removal process and the four removal starting positions (8S21-8S24) in a second removal process are established on an imaginary circle (7I) with a prescribed radius (R) that is inscribed in the apex (7C) of an incomplete thread part (7a). In each removal process, the tip of the screw thread cutting tool shaves off the apex (7C) of the incomplete thread part (7a) into respective recesses, contacting the imaginary inscribed circle (7I) from the outside (above). The multiple cutting surfaces of the apex (7C) are formed in parallel helices (that is, as mutually adjacent helical recesses) from the starting position to the ending position of the incomplete thread part. Points and burrs in the incomplete thread part can thereby be eliminated or reduced without loss of the ability to screw together with a partner threaded fastener (threaded portion).
    Type: Application
    Filed: July 27, 2012
    Publication date: May 22, 2014
    Applicant: Ricoh Elemex Corporation
    Inventors: Toshiyuki Shimizu, Masao Kobayashi, Kenji Nishikawa, Seiji Otani, Takaya Nishikawa, Manabu Takeda
  • Patent number: 8345233
    Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: January 1, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
  • Patent number: 8289507
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: October 16, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Publication number: 20120140212
    Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.
    Type: Application
    Filed: December 6, 2011
    Publication date: June 7, 2012
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
  • Patent number: 8154717
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: April 10, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiji Otani, Koichi Nagoya
  • Patent number: 8102522
    Abstract: A defect inspection apparatus enable to efficiently perform a temperature control without involving an enlarged size can be achieved. The parts constituting the defect inspection apparatus are classified into parts need temperature control and parts not to need temperature control; all the parts need temperature control are accommodated together into a temperature-controlled part accommodating section 604, and the parts not to need temperature control are arranged in a heat radiating unit 605. The temperature in the temperature-controlled part accommodating section 604 is measured by a temperature measuring instrument 603 and a control CPU 602 in a temperature control unit 601 carries out control according to the measured temperature so that the interior of the temperature-controlled part accommodating section 604 is kept at a fixed temperature.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: January 24, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
  • Publication number: 20110228258
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Application
    Filed: May 27, 2011
    Publication date: September 22, 2011
    Inventors: Akira HAMAMATSU, Minori NOGUCHI, Yoshimasa OHSHIMA, Sachio UTO, Taketo UENO, Hiroyuki NAKANO, Takahiro JINGU, Hisashi HATANO, Yukihisa MOHARA, Seiji OTANI, Takahiro TOGASHI
  • Patent number: 7952700
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: May 31, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Publication number: 20110032515
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Application
    Filed: October 19, 2010
    Publication date: February 10, 2011
    Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Publication number: 20100315626
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Application
    Filed: August 4, 2010
    Publication date: December 16, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Seiji OTANI, Koichi NAGOYA
  • Patent number: 7817261
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: October 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Patent number: 7787115
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Grant
    Filed: June 8, 2009
    Date of Patent: August 31, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiji Otani, Koichi Nagoya
  • Publication number: 20090262339
    Abstract: A defect inspection apparatus enable to efficiently perform a temperature control without involving an enlarged size can be achieved. The parts constituting the defect inspection apparatus are classified into parts need temperature control and parts not to need temperature control; all the parts need temperature control are accommodated together into a temperature-controlled part accommodating section 604, and the parts not to need temperature control are arranged in a heat radiating unit 605. The temperature in the temperature-controlled part accommodating section 604 is measured by a temperature measuring instrument 603 and a control CPU 602 in a temperature control unit 601 carries out control according to the measured temperature so that the interior of the temperature-controlled part accommodating section 604 is kept at a fixed temperature.
    Type: Application
    Filed: June 29, 2007
    Publication date: October 22, 2009
    Inventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
  • Publication number: 20090251690
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Application
    Filed: June 8, 2009
    Publication date: October 8, 2009
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Seiji Otani, Koichi Nagoya
  • Patent number: 7557913
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: July 7, 2009
    Assignee: Hitachi High-Technologies Coropration
    Inventors: Seiji Otani, Koichi Nagoya
  • Publication number: 20080204724
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Application
    Filed: May 2, 2008
    Publication date: August 28, 2008
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Patent number: 7369223
    Abstract: An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: May 6, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Publication number: 20080002195
    Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    Type: Application
    Filed: June 29, 2007
    Publication date: January 3, 2008
    Inventors: Seiji Otani, Koichi Nagoya
  • Publication number: 20050213086
    Abstract: An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 29, 2005
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi