Patents by Inventor Seiji Otani
Seiji Otani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9604298Abstract: The removal starting position (8S1) of a first removal process and the four removal starting positions (8S21-8S24) in a second removal process are established on an imaginary circle (7I) with a prescribed radius (R) that is inscribed in the apex (7C) of an incomplete thread part (7a). In each removal process, the tip of the screw thread cutting tool shaves off the apex (7C) of the incomplete thread part (7a) into respective recesses, contacting the imaginary inscribed circle (7I) from the outside (above). The multiple cutting surfaces of the apex (7C) are formed in parallel helices (that is, as mutually adjacent helical recesses) from the starting position to the ending position of the incomplete thread part. Points and burrs in the incomplete thread part can thereby be eliminated or reduced without loss of the ability to screw together with a partner threaded fastener (threaded portion).Type: GrantFiled: July 27, 2012Date of Patent: March 28, 2017Assignee: RICOH ELEMEX CORPORATIONInventors: Toshiyuki Shimizu, Masao Kobayashi, Kenji Nishikawa, Seiji Otani, Takaya Nishikawa, Manabu Takeda
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Publication number: 20140141896Abstract: The removal starting position (8S1) of a first removal process and the four removal starting positions (8S21-8S24) in a second removal process are established on an imaginary circle (7I) with a prescribed radius (R) that is inscribed in the apex (7C) of an incomplete thread part (7a). In each removal process, the tip of the screw thread cutting tool shaves off the apex (7C) of the incomplete thread part (7a) into respective recesses, contacting the imaginary inscribed circle (7I) from the outside (above). The multiple cutting surfaces of the apex (7C) are formed in parallel helices (that is, as mutually adjacent helical recesses) from the starting position to the ending position of the incomplete thread part. Points and burrs in the incomplete thread part can thereby be eliminated or reduced without loss of the ability to screw together with a partner threaded fastener (threaded portion).Type: ApplicationFiled: July 27, 2012Publication date: May 22, 2014Applicant: Ricoh Elemex CorporationInventors: Toshiyuki Shimizu, Masao Kobayashi, Kenji Nishikawa, Seiji Otani, Takaya Nishikawa, Manabu Takeda
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Patent number: 8345233Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.Type: GrantFiled: December 6, 2011Date of Patent: January 1, 2013Assignee: Hitachi High-Technologies CorporationInventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
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Patent number: 8289507Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: GrantFiled: May 27, 2011Date of Patent: October 16, 2012Assignee: Hitachi High-Technologies CorporationInventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Publication number: 20120140212Abstract: A defect inspection apparatus emits light to a test object, detects reflected of scattered light from the test object and detects a defect in the test object The apparatus comprises a temperature-controlled part accommodating section that accommodates parts having a need for controlling a temperature, which is out of a plurality of parts in the defect inspection apparatus. A first temperature measuring instrument measures a temperature in the temperature-controlled part accommodating section; and a temperature control unit controls a temperature of the interior of the temperature-controlled part accommodating section at a prescribed temperature according to the temperature measured by the first temperature measuring instrument. Accordingly, a defect inspection apparatus can efficiently perform temperature control without involving an enlarged size can be achieved.Type: ApplicationFiled: December 6, 2011Publication date: June 7, 2012Applicant: Hitachi High-Technologies CorporationInventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
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Patent number: 8154717Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: GrantFiled: August 4, 2010Date of Patent: April 10, 2012Assignee: Hitachi High-Technologies CorporationInventors: Seiji Otani, Koichi Nagoya
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Patent number: 8102522Abstract: A defect inspection apparatus enable to efficiently perform a temperature control without involving an enlarged size can be achieved. The parts constituting the defect inspection apparatus are classified into parts need temperature control and parts not to need temperature control; all the parts need temperature control are accommodated together into a temperature-controlled part accommodating section 604, and the parts not to need temperature control are arranged in a heat radiating unit 605. The temperature in the temperature-controlled part accommodating section 604 is measured by a temperature measuring instrument 603 and a control CPU 602 in a temperature control unit 601 carries out control according to the measured temperature so that the interior of the temperature-controlled part accommodating section 604 is kept at a fixed temperature.Type: GrantFiled: June 29, 2007Date of Patent: January 24, 2012Assignee: Hitachi High-Technologies CorporationInventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
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Publication number: 20110228258Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: ApplicationFiled: May 27, 2011Publication date: September 22, 2011Inventors: Akira HAMAMATSU, Minori NOGUCHI, Yoshimasa OHSHIMA, Sachio UTO, Taketo UENO, Hiroyuki NAKANO, Takahiro JINGU, Hisashi HATANO, Yukihisa MOHARA, Seiji OTANI, Takahiro TOGASHI
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Patent number: 7952700Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: GrantFiled: October 19, 2010Date of Patent: May 31, 2011Assignee: Hitachi High-Technologies CorporationInventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Publication number: 20110032515Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: ApplicationFiled: October 19, 2010Publication date: February 10, 2011Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Publication number: 20100315626Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: ApplicationFiled: August 4, 2010Publication date: December 16, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Seiji OTANI, Koichi NAGOYA
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Patent number: 7817261Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: GrantFiled: May 2, 2008Date of Patent: October 19, 2010Assignee: Hitachi High-Technologies CorporationInventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Patent number: 7787115Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: GrantFiled: June 8, 2009Date of Patent: August 31, 2010Assignee: Hitachi High-Technologies CorporationInventors: Seiji Otani, Koichi Nagoya
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Publication number: 20090262339Abstract: A defect inspection apparatus enable to efficiently perform a temperature control without involving an enlarged size can be achieved. The parts constituting the defect inspection apparatus are classified into parts need temperature control and parts not to need temperature control; all the parts need temperature control are accommodated together into a temperature-controlled part accommodating section 604, and the parts not to need temperature control are arranged in a heat radiating unit 605. The temperature in the temperature-controlled part accommodating section 604 is measured by a temperature measuring instrument 603 and a control CPU 602 in a temperature control unit 601 carries out control according to the measured temperature so that the interior of the temperature-controlled part accommodating section 604 is kept at a fixed temperature.Type: ApplicationFiled: June 29, 2007Publication date: October 22, 2009Inventors: Tadashi Suga, Shuichi Chikamatsu, Masayuki Ochi, Takahiko Suzuki, Seiji Otani
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Publication number: 20090251690Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: ApplicationFiled: June 8, 2009Publication date: October 8, 2009Applicant: Hitachi High-Technologies CorporationInventors: Seiji Otani, Koichi Nagoya
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Patent number: 7557913Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: GrantFiled: June 29, 2007Date of Patent: July 7, 2009Assignee: Hitachi High-Technologies CoroprationInventors: Seiji Otani, Koichi Nagoya
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Publication number: 20080204724Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.Type: ApplicationFiled: May 2, 2008Publication date: August 28, 2008Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Patent number: 7369223Abstract: An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.Type: GrantFiled: March 23, 2005Date of Patent: May 6, 2008Assignee: Hitachi High-Technologies CorporationInventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
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Publication number: 20080002195Abstract: An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.Type: ApplicationFiled: June 29, 2007Publication date: January 3, 2008Inventors: Seiji Otani, Koichi Nagoya
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Publication number: 20050213086Abstract: An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.Type: ApplicationFiled: March 23, 2005Publication date: September 29, 2005Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi