Patents by Inventor Seiko Ueno

Seiko Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate heating method utilizing heating element control to achieve horizontal temperature gradient
    Patent number: 5239614
    Abstract: A heat-treating method comprising preparing a plurality of wafers parallel to one another in a process tube while keeping their surfaces to be treated substantially horizontal, arranging plural MoSi.sub.2 wire heaters along the longitudinal axis of the process tube so as to be placed around the process tube, adjusting the amount of current supplied to the heaters to form on the treated surface of each of the wafers temperature gradient extending from one side of the outer circumferential rim of each of the wafers to the other side thereof, and rotating the wafers in their surfaces.
    Type: Grant
    Filed: November 14, 1991
    Date of Patent: August 24, 1993
    Assignees: Tokyo Electron Sagami Limited, Kabushiki Kaisha Toshiba
    Inventors: Seiko Ueno, Ken Nakao, Kikuo Yamabe, Keitaro Imai