Patents by Inventor Seishiro Tobe

Seishiro Tobe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5470739
    Abstract: The invention discloses a cell culture support which provides for the adhesion and culturing of one or more adhesive cells using a photoresist in which to provide a particular patterned design on a surface of the support. The patterned design is provided by the photoresist which is partially removed by photolithography during the making of the support which in turn imparts a striped, checkerboard or dotted pattern on the surface of the support. Further, the cell culture support is produced by pretreating the support surface with a reagent to provide hydrophobicity to the support surface. Also a reagent can be added to pretreat the support surface in order to facilitate adhesion at the photoresist prior to applying the photoresist into the cell culture support. Collagen is applied in the form of a solution, containing in addition thereto albumin and a crosslinking agent, in order to form a film. Collagen specifically affects the cell adhesion rate or the morphology of the cells to be adhered to the support.
    Type: Grant
    Filed: December 22, 1992
    Date of Patent: November 28, 1995
    Assignee: NEC Corporation
    Inventors: Toshihiro Akaike, Seishiro Tobe, Shigeyuki Miyamoto, Akio Ohashi