Patents by Inventor Seitaro Ohno

Seitaro Ohno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for forming latent image, process for detecting latent image, process and device for exposure, exposure apparatus, resist and substrate
    Publication number: 20030064307
    Abstract: It is an object to make it possible to easily carry out alignment of an exposure apparatus. A process for forming a latent image, which comprises irradiating a master plate having a pattern with exposure light and irradiating a substrate coated with a resist with the exposure light transmitted through said master plate or reflected on said master plate via a projection optical system, thereby forming the image of the pattern on the substrate, wherein the image of said pattern is formed on said substrate by making use of a change in color of a predetermined substance, included in said resist, that changes color upon irradiation with said exposure light.
    Type: Application
    Filed: November 5, 2002
    Publication date: April 3, 2003
    Applicant: Nikon Corporation
    Inventors: Toru Nakamura, Seitaro Ohno